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公开(公告)号：US20080096756A1
公开(公告)日：2008-04-24
申请号：US11874373
申请日：2007-10-18
申请人： Masanobu Ezaki , Masashi Kobata , Sachiko Kato
发明人： Masanobu Ezaki , Masashi Kobata , Sachiko Kato
IPC分类号： C04B35/14
CPC分类号： B82Y40/00 , B82Y10/00 , C03C3/06 , C03C4/0085 , C03C2201/42 , G03F1/24 , G03F1/60
摘要： To provide titania-silica glass which is transparent glass of low thermal expansion, in particular, is of a low thermal expansion coefficient over a wide range of temperatures of 0 to 100° C. (an operating temperature range) when it is used as a photomask or a mirror material in extreme ultraviolet ray lithography, and which is excellent in homogeneity within the field and stability. Titania-silica glass is used which has 8 to 10% by weight of titania and 90 to 92% by weight of silica, where a Ti3+ concentration is 10 to 60 ppm by weight.
摘要翻译： 为了提供作为低热膨胀的透明玻璃的二氧化钛 - 二氧化硅玻璃，特别是在0〜100℃的宽的温度范围（工作温度范围）中作为 光掩模或极光紫外线光刻中的镜面材料，其在场内的均匀性和稳定性方面优异。 使用二氧化钛 - 二氧化硅玻璃，其具有8至10重量％的二氧化钛和90至92重量％的二氧化硅，其中Ti 3+浓度为10至60重量ppm。
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公开(公告)号：US07485593B2
公开(公告)日：2009-02-03
申请号：US11874373
申请日：2007-10-18
申请人： Masanobu Ezaki , Masashi Kobata , Sachiko Kato
发明人： Masanobu Ezaki , Masashi Kobata , Sachiko Kato
CPC分类号： B82Y40/00 , B82Y10/00 , C03C3/06 , C03C4/0085 , C03C2201/42 , G03F1/24 , G03F1/60
摘要： To provide titania-silica glass which is transparent glass of low thermal expansion, in particular, is of a low thermal expansion coefficient over a wide range of temperatures of 0 to 100° C. (an operating temperature range) when it is used as a photomask or a mirror material in extreme ultraviolet ray lithography, and which is excellent in homogeneity within the field and stability.Titania-silica glass is used which has 8 to 10% by weight of titania and 90 to 92% by weight of silica, where a Ti3+ concentration is 10 to 60 ppm by weight.
摘要翻译： 为了提供作为低热膨胀的透明玻璃的二氧化钛 - 二氧化硅玻璃，特别是在0〜100℃的宽的温度范围（工作温度范围）中作为 光掩模或极光紫外线光刻中的镜面材料，其在场内的均匀性和稳定性方面优异。 使用二氧化钛 - 二氧化硅玻璃，其具有8至10重量％的二氧化钛和90至92重量％的二氧化硅，其中Ti 3+浓度为10至60重量ppm。
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