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1.发明申请MASK BLANK SUBSTRATE, MASK BLANK, EXPOSURE MASK, MASK BLANK SUBSTRATE MANUFACTURING METHOD, AND SEMICONDUCTOR MANUFACTURING METHOD 有权掩模空白基板，掩模布，曝光掩模，掩模基板制造方法和半导体制造方法公开(公告)号：US20100035164A1
公开(公告)日：2010-02-11
申请号：US12540405
申请日：2009-08-13
CPC分类号： G03F1/60 , G03F1/50 , Y10T428/31616
摘要： In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 μm or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
摘要翻译： 在通过曝光系统的掩模台夹持的掩模基板中，除了掩模基板的主面的外周端面外侧的2mm外侧的矩形平坦度测量区域的平坦度 被掩模台夹持的面积为0.6μm以下，平坦度测量区域的四个角部中的至少三个分别具有朝向外周侧上升的形状。
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2.发明授权Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method 有权掩模空白基板，掩模坯料，曝光掩模，掩模基板制造方法以及半导体制造方法公开(公告)号：US07892708B2
公开(公告)日：2011-02-22
申请号：US12797304
申请日：2010-06-09
IPC分类号： G03F1/00
CPC分类号： G03F1/60 , G03F1/50 , Y10T428/31616
摘要： In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 μm or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
摘要翻译： 在通过曝光系统的掩模台夹持的掩模基板中，除了掩模基板的主面的外周端面外侧的2mm外侧的矩形平坦度测量区域的平坦度 被掩模台夹持的面积为0.6μm以下，平坦度测量区域的四个角部中的至少三个角分别具有朝向外周侧上升的形状。
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3.发明授权Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method 有权掩模空白基板，掩模坯料，曝光掩模，掩模基板制造方法以及半导体制造方法公开(公告)号：US07592104B2
公开(公告)日：2009-09-22
申请号：US11237970
申请日：2005-09-29
IPC分类号： G03F1/00
CPC分类号： G03F1/60 , G03F1/50 , Y10T428/31616
摘要： In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 μm or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
摘要翻译： 在通过曝光系统的掩模台夹持的掩模基板中，除了掩模基板的主面的外周端面外侧的2mm外侧的矩形平坦度测量区域的平坦度 被掩模台夹持的面积为0.6μm以下，平坦度测量区域的四个角部中的至少三个分别具有朝向外周侧上升的形状。
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公开(公告)号：US20060068300A1
公开(公告)日：2006-03-30
申请号：US11237970
申请日：2005-09-29
CPC分类号： G03F1/60 , G03F1/50 , Y10T428/31616
摘要： In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 μm or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
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5.发明授权Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing method 有权掩模空白基板，掩模坯料，曝光掩模，掩模基板制造方法以及半导体制造方法公开(公告)号：US07745074B2
公开(公告)日：2010-06-29
申请号：US12540405
申请日：2009-08-13
IPC分类号： G03F1/00
CPC分类号： G03F1/60 , G03F1/50 , Y10T428/31616
摘要： In a mask blank substrate to be chucked by a mask stage of an exposure system, the flatness of a rectangular flatness measurement area excluding an area of 2 mm inward from an outer peripheral end surface on a main surface of the mask blank substrate on its side to be chucked by the mask stage is 0.6 μm or less, and at least three of four corner portions of the flatness measurement area each have a shape that rises toward the outer peripheral side.
摘要翻译： 在通过曝光系统的掩模台夹持的掩模基板中，除了掩模基板的主面的外周端面外侧的2mm外侧的矩形平坦度测量区域的平坦度 被掩模台夹持的面积为0.6μm以下，平坦度测量区域的四个角部中的至少三个角分别具有朝向外周侧上升的形状。
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6.发明申请公开(公告)号：US20080078675A1
公开(公告)日：2008-04-03
申请号：US11878887
申请日：2007-07-27
申请人： Akihiro Kawahara , Shigeo Nagaya , Hiroshi Seo
发明人： Akihiro Kawahara , Shigeo Nagaya , Hiroshi Seo
IPC分类号： B01D69/10
CPC分类号： B01D63/06 , B01D53/22 , B01D69/10 , B01D2313/04 , B01D2313/06 , C01B13/0255 , C01B2210/0046
摘要： A support for an oxygen separation membrane element to support a dense and cylindrical electrolytic membrane having oxygen ion permeability, comprises a base axially extending and having a cylindrical surface extending axially, and a plurality of ribs formed on the cylindrical surface of the base, radially projecting and axially extending, for supporting the electrolytic membrane at their ends being radially distant from the cylindrical surface of the base.
摘要翻译： 支撑氧分离膜元件以支撑具有氧离子渗透性的致密且圆柱形的电解膜，包括轴向延伸并具有轴向延伸的圆柱形表面的基部和形成在基部的圆柱形表面上的多个肋，径向突出 并且轴向延伸，用于在它们的端部处支撑电解膜，所述端部沿径向远离基座的圆柱形表面。
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公开(公告)号：US20060057474A1
公开(公告)日：2006-03-16
申请号：US11224087
申请日：2005-09-13
申请人： Kesahiro Koike , Osamu Suzuki , Akihiro Kawahara
发明人： Kesahiro Koike , Osamu Suzuki , Akihiro Kawahara
CPC分类号： G03F1/38 , G03F1/32 , G03F1/60 , Y10T428/31616
摘要： In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate.
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8.发明授权公开(公告)号：US06917402B2
公开(公告)日：2005-07-12
申请号：US10255931
申请日：2002-09-27
申请人： Keiji Hosoda , Akihiro Kawahara
发明人： Keiji Hosoda , Akihiro Kawahara
IPC分类号： G02F1/1335 , G02F1/1333
CPC分类号： G02F1/133512 , G02F1/133526
摘要： Upon fabricating an opposite substrate, a concave portion having a predetermined depth is formed on the surface of a transparent substrate. Then, a light-shielding film is formed in the concave portion, and further, the surface of the light-shielding film and the surface of the transparent substrate are polished so as to form the same plane. Accordingly, an orientation film formed over the transparent substrate can be flattened to realize uniformity of a rubbing treatment.
摘要翻译： 在制造相对的基板时，在透明基板的表面上形成具有预定深度的凹部。 然后，在凹部中形成遮光膜，进一步对遮光膜的表面和透明基板的表面进行研磨，形成同一平面。 因此，可以使形成在透明基板上的取向膜变平，以实现摩擦处理的均匀性。
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公开(公告)号：US08462167B2
公开(公告)日：2013-06-11
申请号：US12608322
申请日：2009-10-29
申请人： Akihiro Kawahara , Makoto Adachi , Kouji Nishikawa , Masayuki Nakamura , Motonobu Mamiya , Kae Yamashita
发明人： Akihiro Kawahara , Makoto Adachi , Kouji Nishikawa , Masayuki Nakamura , Motonobu Mamiya , Kae Yamashita
IPC分类号： G06T1/60
摘要： A memory access control circuit includes a first internal register, an address transmitting unit that sets a state of the first internal register to a first state to transmit a first address and sets a state of the first internal register to a second state to transmit a second address, a second internal register, a data receiving unit that sets a state of the second internal register to a third state to receive first data corresponding to the first address, performs data processing on the first data without delay, sets a state of the second internal register to a fourth state to receive second data corresponding to the second address, and performs data processing on the second data after delaying the second data by a given delay time, a first backup unit and a second backup unit.
摘要翻译： 存储器访问控制电路包括第一内部寄存器，地址发送单元，其将第一内部寄存器的状态设置为第一状态以发送第一地址，并将第一内部寄存器的状态设置为第二状态，以发送第二内部寄存器 地址，第二内部寄存器，数据接收单元，其将第二内部寄存器的状态设置为第三状态，以接收对应于第一地址的第一数据，对延迟的第一数据执行数据处理，设置第二内部寄存器的状态 内部寄存器到第四状态以接收对应于第二地址的第二数据，并且在延迟给定延迟时间的第二数据之后对第二数据执行数据处理，第一备份单元和第二备份单元。
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公开(公告)号：US07635544B2
公开(公告)日：2009-12-22
申请号：US11224087
申请日：2005-09-13
申请人： Kesahiro Koike , Osamu Suzuki , Akihiro Kawahara
发明人： Kesahiro Koike , Osamu Suzuki , Akihiro Kawahara
IPC分类号： G03F1/00
CPC分类号： G03F1/38 , G03F1/32 , G03F1/60 , Y10T428/31616
摘要： In a transparent substrate for a mask blank, which is required to have a predetermined optical characteristic, a substrate mark is formed by cutting off a predetermined corner portion into an oblique section. The shape of the mark is determined in accordance with the optical characteristic of he substrate.
摘要翻译： 在需要具有预定光学特性的用于掩模板的透明基板中，通过将预定角部切割成倾斜部分而形成基板标记。 根据其衬底的光学特性来确定标记的形状。
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