公开(公告)号：US20110180734A1

公开(公告)日：2011-07-28

申请号：US13081899

申请日：2011-04-07

申请人： Masato MORIYA ,  Tamotsu ABE ,  Takashi SUGANUMA ,  Hiroshi SOMEYA ,  Takayuki YABU ,  Akira SUMITANI ,  Osamu WAKABAYASHI

发明人： Masato MORIYA ,  Tamotsu ABE ,  Takashi SUGANUMA ,  Hiroshi SOMEYA ,  Takayuki YABU ,  Akira SUMITANI ,  Osamu WAKABAYASHI

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。 该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器 一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

公开(公告)号：US20090261242A1

公开(公告)日：2009-10-22

申请号：US12406388

申请日：2009-03-18

申请人： Yoshifumi UENO ,  Osamu WAKABAYASHI ,  Tamotsu ABE ,  Akira SUMITANI ,  Hideo HOSHINO ,  Akira ENDO ,  Georg SOUMAGNE

发明人： Yoshifumi UENO ,  Osamu WAKABAYASHI ,  Tamotsu ABE ,  Akira SUMITANI ,  Hideo HOSHINO ,  Akira ENDO ,  Georg SOUMAGNE

IPC分类号： B01D59/44 ,  H01J49/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US20120217414A1

公开(公告)日：2012-08-30

申请号：US13465108

申请日：2012-05-07

申请人： Yoshifumi UENO ,  Osamu WAKABAYASHI ,  Tamotsu ABE ,  Akira SUMITANI ,  Hideo HOSHINO ,  Akira ENDO ,  Georg SOUMAGNE

发明人： Yoshifumi UENO ,  Osamu WAKABAYASHI ,  Tamotsu ABE ,  Akira SUMITANI ,  Hideo HOSHINO ,  Akira ENDO ,  Georg SOUMAGNE

IPC分类号： H01J1/50

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US20080087840A1

公开(公告)日：2008-04-17

申请号：US11870020

申请日：2007-10-10

申请人： Yoshifumi UENO ,  Georg SOUMAGNE ,  Akira SUMITANI ,  Osamu WAKABAYASHI

发明人： Yoshifumi UENO ,  Georg SOUMAGNE ,  Akira SUMITANI ,  Osamu WAKABAYASHI

IPC分类号： H05G2/00

CPC分类号： H05G2/001 ,  B82Y10/00 ,  G03F7/70033

摘要： An extreme ultra violet light source apparatus having relatively high output for exposure, in which debris are suppressed to be produced as much as possible in stead of disposing debris that has been once produced. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply unit for supplying solid tin or lithium as a target to a predetermined position within the chamber; a CO2 laser for applying a laser beam based on pulse operation to the target supplied by the target supply unit so as to generate plasma; and a collector mirror having a multilayer film on a reflecting surface thereof, for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.

摘要翻译： 具有相对高的曝光输出的极紫外光源装置，其中尽可能多地抑制碎屑被产生以代替已经生产的碎屑。 极紫外光源装置包括：产生极紫外光的室; 用于将固体锡或锂作为目标供应到所述室内的预定位置的目标供应单元; 用于将基于脉冲操作的激光束施加到由目标供给单元提供的目标以产生等离子体的CO 2激光器; 以及在其反射表面上具有多层膜的收集器反射镜，用于收集从等离子体辐射的极紫外光以输出极紫外光。