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    Regenerative amplifier, laser apparatus, and extreme ultraviolet light generation system
    1.
    发明授权
    Regenerative amplifier, laser apparatus, and extreme ultraviolet light generation system 有权

    公开(公告)号：US08625190B2

    公开(公告)日：2014-01-07

    申请号：US13121319

    申请日：2011-03-07

    申请人： Krysztof Nowak ,  Takashi Suganuma ,  Osamu Wakabayashi

    发明人： Krysztof Nowak ,  Takashi Suganuma ,  Osamu Wakabayashi

    IPC分类号： H01S3/05

    摘要： A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position.

    Extreme ultraviolet light source apparatus
    2.
    发明授权
    Extreme ultraviolet light source apparatus 有权
    极紫外光源设备

    公开(公告)号：US08450706B2

    公开(公告)日：2013-05-28

    申请号：US12453058

    申请日：2009-04-28

    申请人： Tamotsu Abe ,  Hiroshi Someya ,  Takashi Suganuma ,  Takayuki Yabu

    发明人： Tamotsu Abe ,  Hiroshi Someya ,  Takashi Suganuma ,  Takayuki Yabu

    IPC分类号： G21F5/02

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70941 ,  G03F7/7095 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.

    摘要翻译： 即使在从等离子体发射的快速离子体与真空室内的结构部件碰撞的情况下，仅将EuV光透射率高的粒子附着在EUV集光镜上的极紫外光源装置，其反射率也不易降解 。 该装置包括：真空室; 目标供给单元，用于将目标供给到真空室中的预定位置; 用于将激光束施加到靶以产生等离子体的驱动器激光器; 用于收集和输出从等离子体发射的极紫外光的收集镜; 用于支撑收集镜的收集镜支架; 以及由对于极紫外光具有高透射率的材料形成的屏蔽构件，用于将诸如集电镜支架的结构构件与从等离子体产生的离子相屏蔽。

    Extreme ultraviolet light source apparatus
    3.
    发明授权
    Extreme ultraviolet light source apparatus 有权
    极紫外光源设备

    公开(公告)号：US08294129B2

    公开(公告)日：2012-10-23

    申请号：US13081899

    申请日：2011-04-07

    申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

    发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

    IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

    CPC分类号： H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

    摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。 该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器 一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

    Extreme ultra violet light source apparatus
    6.
    发明授权
    Extreme ultra violet light source apparatus 有权
    极紫外光源装置

    公开(公告)号：US07880153B2

    公开(公告)日：2011-02-01

    申请号：US12073001

    申请日：2008-02-28

    申请人： Takashi Suganuma ,  Tamotsu Abe ,  Hiroshi Someya ,  Akira Sumitani

    发明人： Takashi Suganuma ,  Tamotsu Abe ,  Hiroshi Someya ,  Akira Sumitani

    IPC分类号： H05G2/00 ,  G01J1/42

    CPC分类号： G03F7/70916 ,  G03F7/70033

    摘要： An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which EUV light is generated; a target material supply unit for supplying a target material into the EUV light generation chamber; a laser source for applying a laser beam to the target material supplied into the EUV light generation chamber to generate plasma; collection optics for collecting EUV light radiated from the plasma; a filter for filtering the EUV light collected by the collection optics; and a filter protecting member provided between the plasma and the filter, for protecting the filter by blocking flying matter flying from the plasma toward the filter.

    摘要翻译： EUV光源装置，能够防止过滤EUV光的过滤器的劣化和/或破损。 EUV光源装置包括产生EUV光的EUV产生室; 目标材料供应单元，用于将目标材料供应到EUV光产生室中; 激光源，用于将激光束施加到提供到EUV光产生室中的目标材料以产生等离子体; 用于收集从等离子体辐射的EUV光的收集光学器件; 用于过滤由收集光学器件收集的EUV光的滤光器; 以及设置在等离子体和过滤器之间的过滤器保护构件，用于通过阻挡从等离子体飞向过滤器的飞散物质来保护过滤器。

    SLAB TYPE LASER APPARATUS
    7.
    发明申请
    SLAB TYPE LASER APPARATUS 有权
    SLAB型激光装置

    公开(公告)号：US20090316746A1

    公开(公告)日：2009-12-24

    申请号：US12482824

    申请日：2009-06-11

    申请人： Krzysztof NOWAK ,  Takashi Suganuma ,  Osamu Wakabayashi ,  Akira Endo

    发明人： Krzysztof NOWAK ,  Takashi Suganuma ,  Osamu Wakabayashi ,  Akira Endo

    IPC分类号： H01S3/22 ,  H01S3/08

    CPC分类号： H01S3/076 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0971 ,  H01S3/115 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/141 ,  H01S5/4087

    摘要： A slab type laser apparatus has a slab type gas laser medium part formed in a region defined by a pair of electrode flat plates oppositely disposed in parallel with each other in a space to be filled with a gas laser medium which is excited by high-frequency electric power. The apparatus includes an oscillator part including a pair of resonator mirrors oppositely disposed with a part of the gas laser medium part in between, and for amplifying a laser beam to have predetermined light intensity to emit the laser beam, and the amplifier part including a plurality of return mirrors oppositely disposed with a part of the gas laser medium part in between. The incident laser beam goes and returns plural times between the return mirrors, and the laser beam is amplified to have predetermined power.

    摘要翻译： 平板型激光装置具有板状气体激光介质部，该平板型气体激光介质部形成在由一对电极平板限定的区域中，该对电极平板彼此平行配置，以填充由高频激发的气体激光介质 电力。 该装置包括：振荡器部分，包括一对谐振器反射镜，该谐振器反射镜与气体激光介质部分的一部分相对设置，并且用于放大激光束以具有预定的光强度以发射激光束，并且放大器部件包括多个 的反射镜与气体激光介质部分的一部分相对设置。 入射激光束在返回镜之间返回多次，激光束被放大成具有预定的功率。

    Emission spectroscopic analyzer
    10.
    发明授权
    Emission spectroscopic analyzer 失效
    发射光谱分析仪

    公开(公告)号：US4789239A

    公开(公告)日：1988-12-06

    申请号：US901679

    申请日：1986-08-29

    申请人： Koichi Onishi ,  Yoshifusa Ouchi ,  Takashi Suganuma ,  Atsushi Utsumi ,  Takao Kuroiwa

    发明人： Koichi Onishi ,  Yoshifusa Ouchi ,  Takashi Suganuma ,  Atsushi Utsumi ,  Takao Kuroiwa

    IPC分类号： G01N21/62 ,  G01N21/67 ,  G01N21/73 ,  G01J3/443

    CPC分类号： G01N21/62 ,  G01N21/73 ,  G01N21/67 ,  G01N2201/084

    摘要： Radioactive materials can be safely analyzed by an emission spectroscopic analyzer comprising an exciting device for exciting a radioactive material to be analyzed to emit light. The exciting device is enclosed in a radiation shielding wall. A detecting device detects the emitted light. The detecting device is located outside the radiation shielding wall. A light-transmitting device is provided between the exciting device and the detecting device such that the emitted light impinging on a first end of the light-transmitting device will be received at the detecting device as light having been transmitted through the light-transmitting device and emitted from a second end of the light-transmitting device. The light-transmitting device penetrates a hole made in the radiation shielding wall which has a sealing structure to prevent radiation leakage. The light-transmitting device penetrates the hole with a curvature. A lens system is attached to the second end of the light-transmitting device to permit visual observation of the emitted light therethrough. A fine adjustment device adjusts the position of the first end of the light-transmitting device in relation to the emitted light from the material to be analyzed.

    摘要翻译： 可以通过发射光谱分析仪安全地分析放射性物质，所述发射光谱分析仪包括用于激发待分析的放射性物质发光的激发装置。 激励装置封装在辐射屏蔽壁中。 检测装置检测发射的光。 检测装置位于辐射屏蔽壁的外侧。 在激励装置和检测装置之间设置有发光装置，使得入射在光发射装置的第一端上的发射光将作为已经通过透光装置传输的光而被接收在检测装置处， 从发光装置的第二端发射。 透光装置穿透在辐射屏蔽壁上制成的孔，其具有密封结构以防止辐射泄漏。 透光装置以曲率穿透孔。 透镜系统附接到透光装置的第二端，以允许目视观察通过其发射的光。 微调装置相对于待分析材料的发射光调节透光装置的第一端的位置。