公开(公告)号：US20030172772A1

公开(公告)日：2003-09-18

申请号：US10384586

申请日：2003-03-11

Applicant: Materials Modification, Inc.

Inventor： Krupashankara M. Sethuram ,  Raja Kalyanaraman

IPC: C22B004/08 ,  C22B009/22

CPC classification number: H05B6/806 ,  B01J19/126 ,  B01J2219/00094 ,  B01J2219/0883 ,  B01J2219/0894 ,  B01J2219/1227 ,  B01J2219/1269 ,  B22F1/0018 ,  B22F3/105 ,  B22F9/305 ,  B22F2999/00 ,  B82Y30/00 ,  C01B13/28 ,  C01B21/06 ,  C01B21/0724 ,  C01B32/90 ,  C01G23/07 ,  C01P2004/50 ,  C01P2004/51 ,  C01P2004/62 ,  C01P2004/64 ,  H01J37/32192 ,  H01J37/3244 ,  H01J2237/339 ,  H05B6/70 ,  H05H1/46 ,  H05H2001/463 ,  B22F2202/13

Abstract: The present invention relates to the production of ultrafine powders using a microwave plasma apparatus and chemical synthesis technique. Microwaves generated by a magnetron (1) are passed through waveguides (2) before they arrive at the head of a plasmatron (3). These high energy microwaves ionize a plasma gas, thus releasing large amounts of energy. The energy thus released is utilized to initiate and sustain chemical reactions between the desired elements being pumped in a spiral pattern into the plasmatron (3). The reaction products are quenched rapidly in a reactor column (4) into ultrafine powders.

公开(公告)号：US20020112794A1

公开(公告)日：2002-08-22

申请号：US10114993

申请日：2002-04-04

Applicant: Materials Modification, Inc.

Inventor： Krupashankara M. Sethuram ,  Raja Kalyanaraman

IPC: C22B009/00

CPC classification number: H05B6/806 ,  B01J19/126 ,  B01J2219/00094 ,  B01J2219/0883 ,  B01J2219/0894 ,  B01J2219/1227 ,  B01J2219/1269 ,  B22F1/0018 ,  B22F3/105 ,  B22F9/305 ,  B22F2999/00 ,  B82Y30/00 ,  C01B13/28 ,  C01B21/06 ,  C01B21/0724 ,  C01B32/90 ,  C01G23/07 ,  C01P2004/50 ,  C01P2004/51 ,  C01P2004/62 ,  C01P2004/64 ,  H01J37/32192 ,  H01J37/3244 ,  H01J2237/339 ,  H05B6/70 ,  H05H1/46 ,  H05H2001/463 ,  B22F2202/13

Abstract: The present invention relates to the production of ultrafine powders using a microwave plasma apparatus and chemical synthesis technique. Microwaves generated by a magnetron (1) are passed through waveguides (2) before they arrive at the head of a plasmatron (3). These high energy microwaves ionize a plasma gas, thus releasing large amounts of energy. The energy thus released is utilized to initiate and sustain chemical reactions between the desired elements being pumped in a spiral pattern into the plasmatron (3). The reaction products are quenched rapidly in a reactor column (4) into ultrafine powders.