SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
    3.
    发明申请
    SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20130020647A1

    公开(公告)日:2013-01-24

    申请号:US13540799

    申请日:2012-07-03

    IPC分类号: H01L29/78 H01L23/498

    摘要: Semiconductor devices are provided. The semiconductor device includes conductive patterns vertically stacked on a substrate to be spaced apart from each other, and pad patterns electrically connected to respective ones of the conductive patterns. Each of the pad patterns includes a flat portion extending from an end of the conductive pattern in a first direction parallel with the substrate and a landing sidewall portion upwardly extending from an end of the flat portion. A width of a portion of the landing sidewall portion in a second direction parallel with the substrate and perpendicular to the first direction is less than a width of the flat portion in the second direction. The related methods are also provided.

    摘要翻译: 提供半导体器件。 半导体器件包括垂直堆叠在基板上以彼此间隔开的导电图案,以及电连接到相应导电图案的焊盘图案。 每个焊盘图案包括从平行于基板的第一方向从导电图案的端部延伸的平坦部分和从平坦部分的端部向上延伸的着陆侧壁部分。 着陆侧壁部的与基板平行且垂直于第一方向的第二方向的一部分的宽度小于第二方向上的平坦部的宽度。 还提供了相关方法。

    SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES
    4.
    发明申请
    SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING SEMICONDUCTOR DEVICES 有权
    半导体器件和制造半导体器件的方法

    公开(公告)号:US20140197542A1

    公开(公告)日:2014-07-17

    申请号:US14155649

    申请日:2014-01-15

    IPC分类号: H01L23/528

    摘要: Semiconductor devices are provided. A semiconductor device may include a substrate and a plurality of lines on the substrate. The semiconductor device may include a dielectric layer on the substrate and adjacent the plurality of lines. The semiconductor device may include a connection element in the dielectric layer. In some embodiments, the semiconductor device may include a plurality of contacts on the connection element, and a conductive interconnection on one of the plurality of contacts that are on the connection element and on a contact that is spaced apart from the connection element.

    摘要翻译: 提供半导体器件。 半导体器件可以包括衬底和衬底上的多条线。 半导体器件可以包括在衬底上并与多条线相邻的电介质层。 该半导体器件可以包括介电层中的连接元件。 在一些实施例中,半导体器件可以包括连接元件上的多个触点,以及在连接元件上的多个触点中的一个触点上以及与连接元件间隔开的触点上的导电互连。

    Semiconductor devices and methods of fabricating semiconductor devices
    5.
    发明授权
    Semiconductor devices and methods of fabricating semiconductor devices 有权
    半导体器件和制造半导体器件的方法

    公开(公告)号:US09184174B2

    公开(公告)日:2015-11-10

    申请号:US14155649

    申请日:2014-01-15

    摘要: Semiconductor devices are provided. A semiconductor device may include a substrate and a plurality of lines on the substrate. The semiconductor device may include a dielectric layer on the substrate and adjacent the plurality of lines. The semiconductor device may include a connection element in the dielectric layer. In some embodiments, the semiconductor device may include a plurality of contacts on the connection element, and a conductive interconnection on one of the plurality of contacts that are on the connection element and on a contact that is spaced apart from the connection element.

    摘要翻译: 提供半导体器件。 半导体器件可以包括衬底和衬底上的多条线。 半导体器件可以包括在衬底上并与多条线相邻的电介质层。 该半导体器件可以包括介电层中的连接元件。 在一些实施例中,半导体器件可以包括连接元件上的多个触点,以及在连接元件上的多个触点中的一个触点上以及与连接元件间隔开的触点上的导电互连。