公开(公告)号：US20240125752A1

公开(公告)日：2024-04-18

申请号：US18502017

申请日：2023-11-05

Applicant: Maytronics Ltd.

Inventor： Shimry HAVIV ,  Doron TZUR

IPC: G01N33/18 ,  E04H4/12

CPC classification number: G01N33/182 ,  E04H4/1281 ,  G01N33/1826 ,  G01N33/1893

Abstract: Systems, units and methods for monitoring water of at least one swimming pool (SP) by: obtaining non-manipulation data of the SP water or one or more samples thereof before/without applying any manipulation to water of the SP sample(s) thereof; applying at least one manipulation over the SP water or one or more samples thereof; obtaining manipulation data of the SP water indicative of responsivity of the SP water or one or more samples thereof to each manipulation applied thereto, using one or more sensors; and analyzing the non-manipulation and manipulation data to determine one or more characteristics of the SP water including for example concentration of one or more substances in the SP water. In some embodiments, at least one manipulation may include dechlorination of the SP water.

公开(公告)号：US20230176027A1

公开(公告)日：2023-06-08

申请号：US18062023

申请日：2022-12-06

Applicant: Maytronics Ltd.

Inventor： Doron TZUR

IPC: G01N33/18 ,  G01N35/10 ,  G01N21/33 ,  G01N29/02

CPC classification number: G01N33/1826 ,  G01N35/1097 ,  G01N35/1004 ,  G01N33/1853 ,  G01N21/33 ,  G01N29/02 ,  G01N2291/0228

Abstract: Methods, systems and apparatuses using: (i) a flow control unit including: piping inlets and outlets for connecting thereby to different parts located at different locations of a water facility (WF) and of the apparatuses themselves and multiple controllable valves, each being deployed at a different inlet or outlet of the multiple piping inlets and outlets; (ii) a detection unit including at least one sensor for sensing characteristics of the WF in various locations and/or states of the WF; and a controller, configured to control operation of the valves, for measuring one or more characteristics of a selected detection location or state of the WF or of water manipulated within the apparatuses. The methods, systems and apparatuses may further be configured to apply manipulations over a water sample, sampled from the WF and/or over water from the WF and measure responses to the applied manipulation(s).