公开(公告)号：US09970089B2

公开(公告)日：2018-05-15

申请号：US14105246

申请日：2013-12-13

Applicant: Metglas, Inc.

Inventor： William Coughlan ,  Eric Theisen

IPC: C22C45/04 ,  B32B15/01 ,  B23K1/00 ,  B23K35/30 ,  B23K35/02 ,  B23K1/008 ,  B23K1/19 ,  B23K101/14 ,  B23K103/04

CPC classification number: C22C45/04 ,  B23K1/0012 ,  B23K1/008 ,  B23K1/19 ,  B23K35/0222 ,  B23K35/0233 ,  B23K35/3033 ,  B23K35/304 ,  B23K2101/14 ,  B23K2103/05 ,  B32B15/01 ,  Y10T428/12944

Abstract: Disclosed is the semi-amorphous, ductile brazing foil with composition consisting essentially of NibalCraBbPcSidMoeFef with approximately 24 atomic percent≤a≤approximately 31 atomic percent; b≤approximately 3 atomic percent; approximately 9 atomic percent≤c≤approximately 11 atomic percent; approximately 2 atomic percent≤d≤approximately 4 atomic percent; e≤approximately 2 atomic percent; f≤approximately 1 atomic percent; and the balance being Ni and other impurities; where b+c+d

公开(公告)号：US20150168088A1

公开(公告)日：2015-06-18

申请号：US14105246

申请日：2013-12-13

Applicant: Metglas, Inc.

Inventor： William COUGHLAN ,  Eric Theisen

IPC: F28F21/08 ,  C22C45/04 ,  B23K35/30 ,  B23K35/02 ,  B32B15/01 ,  B23K1/00

CPC classification number: C22C45/04 ,  B23K1/0012 ,  B23K1/008 ,  B23K1/19 ,  B23K35/0222 ,  B23K35/0233 ,  B23K35/3033 ,  B23K35/304 ,  B23K2101/14 ,  B23K2103/05 ,  B32B15/01 ,  Y10T428/12944

Abstract: Disclosed is the semi-amorphous, ductile brazing foil with composition consisting essentially of NibalCraBbPcSidMoeFef with approximately 24 atomic percent≦a≦approximately 31 atomic percent; b≦approximately 3 atomic percent; approximately 9 atomic percent≦c≦approximately 11 atomic percent; approximately 2 atomic percent≦d≦approximately 4 atomic percent; e≦approximately 2 atomic percent; f≦approximately 1 atomic percent; and the balance being Ni and other impurities; where b+c+d

Abstract translation: 公开了半无定形的韧性钎焊箔，其组成基本上由NibalCraBbPcSidMoeFef组成，其具有约24原子百分比＆amp; A1; a＆amp; NE;约31原子百分比; b＆nlE;约3原子％; 约9原子百分比＆nlE; c＆nlE;约11原子百分比; 约2原子百分比＆nlE; d＆nlE;约4原子百分比; 约2原子％; 约1原子％; 余量为Ni和其他杂质; 其中b + c + d <约16原子％。

公开(公告)号：US10566127B2

公开(公告)日：2020-02-18

申请号：US15534381

申请日：2015-12-08

Applicant: METGLAS, INC. ,  HITACHI METALS, LTD.

Inventor： Eric Theisen ,  Yuichi Ogawa ,  Daichi Azuma

IPC: H01F27/25 ,  H01F1/153 ,  C22C38/02 ,  C22C38/00 ,  C22C45/02 ,  C22C45/00

Abstract: An Fe—Si—B—C-based amorphous alloy ribbon as thick as 20-30 μm having a composition comprising 80.0-80.7 atomic % of Fe, 6.1-7.99 atomic % of Si, and 11.5-13.2 atomic % of B, the total amount of Fe, Si and B being 100 atomic %, and further comprising 0.2-0.45 atomic % of C per 100 atomic % of the total amount of Fe, Si and B, except for inevitable impurities has a stress relief degree of 92% or more.

公开(公告)号：US10022824B2

公开(公告)日：2018-07-17

申请号：US14218452

申请日：2014-03-18

Applicant: Metglas, Inc.

Inventor： William Coughlan ,  Eric Theisen

IPC: B21C37/00 ,  B23K35/30 ,  B23K1/00 ,  B23K1/008 ,  B23K35/02 ,  C22C19/05 ,  C22C30/00 ,  F28F21/08 ,  C22C45/00

Abstract: Disclosed is a semi-amorphous, ductile brazing foil with a composition consisting essentially of NibalFeaCrbPcSidBeMof with approximately 30 atomic percent≤a≤approximately 38 atomic percent; approximately 10 atomic percent≤b≤approximately 20 atomic percent; approximately 7 atomic percent≤c≤approximately 20 atomic percent; approximately 2 atomic percent≤d≤approximately 4 atomic percent; e≤approximately 2 atomic percent; f≤approximately 5 atomic percent; and the balance being Ni and other impurities; where c+d+e

公开(公告)号：US10046420B2

公开(公告)日：2018-08-14

申请号：US14656263

申请日：2015-03-12

Applicant: Metglas, Inc.

Inventor： William Coughlan ,  Eric Theisen

IPC: B21C37/00 ,  B23K35/30 ,  B32B15/01 ,  B23K1/00 ,  B23K1/008 ,  C22C19/05 ,  C22C30/00 ,  C22C45/00 ,  B32B9/04

Abstract: Disclosed is a semi-amorphous, ductile brazing foil with a composition consisting essentially of NibalFeaCrbPcSidBeMof with approximately 30 atomic percent ≤a≤approximately 70 atomic percent; approximately 0 atomic percent ≤b≤approximately 20 atomic percent; approximately 9 atomic percent ≤c≤approximately 16 atomic percent; approximately 0 atomic percent ≤d≤approximately 4 atomic percent; e≤approximately 2 atomic percent; f≤approximately 5 atomic percent; and the balance being Ni and other impurities; where c+d+e