Method for forming optically encoded thin films and particles with grey scale spectra
    3.
    发明授权
    Method for forming optically encoded thin films and particles with grey scale spectra 有权
    用于形成具有灰度光谱的光学编码的薄膜和颗粒的方法

    公开(公告)号:US08308066B2

    公开(公告)日:2012-11-13

    申请号:US10589741

    申请日:2004-12-21

    IPC分类号: G06K7/10 G06K7/14

    摘要: The invention concerns a method of making a thin film and/or particle having a grey scale code embedded in its physical structure by refractive index changes between different regions of the thin film or particle, as well as thin films and particles made by the method. In a preferred method for encoding a thin film, a semiconductor or insulator substrate is etched to form a thin film including pores. The etching conditions are controlled to vary porosity in the thin film according to a pattern that will generate an optical signature in the reflectivity spectrum in response to illumination such that the optical signature will including a grey scale code. The etching waveform is formed by the addition of at least two separate sine components in accordance with the following equations (1)An=(Anmax−Anmin)/2; (2) kn=frequency=1/period; (3) yn=An[sin(knt−Φ)+1]+Anmin (4) ycomp=[y1+ . . . +yn]/n wherein equation (1) defines the amplitude of sine component n, which results in the spectral peak height, or grey scale of a bit; Equation (2) defines the frequency of the each sine component, which results in the spectral position of a peak, or identification of a bit (1st bit, 2nd bit, etc. . . );. Equation (3) defines sine component n and Equation (4) defines the composite waveform used to drive the electrochemical etch. The film can be removed and diced into particles.

    摘要翻译: 本发明涉及通过薄膜或颗粒的不同区域之间的折射率变化以及通过该方法制成的薄膜和颗粒来制造具有嵌入其物理结构中的灰度代码的薄膜和/或颗粒的方法。 在用于编码薄膜的优选方法中,蚀刻半导体或绝缘体衬底以形成包括孔的薄膜。 控制蚀刻条件以根据在反射光谱中响应于照明而产生光学特征的图案来改变薄膜中的孔隙率,使得光学特征将包括灰度代码。 通过根据以下等式(1)An =(Anmax-Anmin)/ 2添加至少两个分离的正弦分量来形成蚀刻波形。 (2)kn = frequency = 1 / period; (3)yn = An [sin(knt-Φ)+1] + Anmin(4)ycomp = [y1 + 。 。 + yn] / n其中等式(1)定义正弦分量n的幅度,其导致频谱峰高度或位的灰度级; 等式(2)定义每个正弦分量的频率,其导致峰的频谱位置或位的识别(第1位,第2位等)。 公式(3)定义了正弦分量n,等式(4)定义了用于驱动电化学蚀刻的复合波形。 可以将膜去除并切成颗粒。