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    Dynamic multi-purpose composition for the removal of photoresists and method for its use
    1.
    发明申请
    Dynamic multi-purpose composition for the removal of photoresists and method for its use 有权
    用于去除光致抗蚀剂的动态多用途组合物及其使用方法

    公开(公告)号：US20070099805A1

    公开(公告)日：2007-05-03

    申请号：US11260912

    申请日：2005-10-28

    申请人： Michael Phenis ,  Lauri Kirkpatrick ,  Raymond Chan ,  Diane Scheele ,  Kimberly Pollard

    发明人： Michael Phenis ,  Lauri Kirkpatrick ,  Raymond Chan ,  Diane Scheele ,  Kimberly Pollard

    IPC分类号： C11D7/32

    CPC分类号： C11D11/0047 ,  C11D1/004 ,  C11D3/30 ,  C11D3/43 ,  C11D7/3209 ,  C11D7/3218 ,  C11D7/5009

    摘要： Improved stripper solutions for removing photoresists from substrates are provided that typically have freezing points below about +15° C. and high loading capacities. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulation can additionally contain a secondary solvent. Methods for use of the stripping solutions are additionally provided.

    摘要翻译： 提供了用于从基底去除光致抗蚀剂的改进的剥离剂溶液，其通常具有低于约+ 15℃的冰点和高负载能力。 汽提溶液包括二甲基亚砜，季铵氢氧化物和具有至少两个碳原子的链烷醇胺，至少一个氨基取代基和至少一个羟基取代基，氨基和羟基取代基连接到两个不同的碳原子上。 一些制剂可另外含有二次溶剂。 另外提供使用剥离溶液的方法。

    DYNAMIC MULTI-PURPOSE COMPOSITION FOR THE REMOVAL OF PHOTORESISTS AND METHOD FOR ITS USE
    5.
    发明申请
    DYNAMIC MULTI-PURPOSE COMPOSITION FOR THE REMOVAL OF PHOTORESISTS AND METHOD FOR ITS USE 审中-公开
    用于去除光电的动态多用途组合物及其使用方法

    公开(公告)号：US20070243773A1

    公开(公告)日：2007-10-18

    申请号：US11697047

    申请日：2007-04-05

    申请人： Michael Phenis ,  Raymond Chan ,  Kimberly Pollard

    发明人： Michael Phenis ,  Raymond Chan ,  Kimberly Pollard

    IPC分类号： H01B13/00 ,  H01R13/46

    CPC分类号： C11D1/004 ,  C11D3/26 ,  C11D3/30 ,  C11D3/43 ,  C11D7/32 ,  C11D7/3218 ,  C11D7/5009 ,  C11D11/0047 ,  G03F7/425 ,  G03F7/426

    摘要： Improved dry stripper solutions for removing one, two or more photoresist layers from substrates are provided. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine, an optional secondary solvent and less than about 3 wt. % water and/or a dryness coefficient of at least about 1. Methods for the preparation and use of the improved dry stripping solutions are additionally provided. Advantageous solution methods are provided for the use of the novel stripper solutions to prepare an electronic interconnect structure by removing a plurality of resist layers to expose an underlying dielectric and related substrate without imparting damage to any of the underlying structure.

    摘要翻译： 提供了用于从基底去除一个，两个或更多个光致抗蚀剂层的改进的干燥剥离剂溶液。 汽提器溶液包括二甲亚砜，季铵氢氧化物和链烷醇胺，任选的二级溶剂和小于约3wt。 ％水和/或至少约1的干燥系数。另外提供了制备和使用改进的干燥剥离溶液的方法。 提供了有利的解决方案，用于使用新颖的剥离剂溶液来通过去除多个抗蚀剂层以暴露下面的电介质和相关的衬底来制备电子互连结构，而不会对任何下面的结构造成损害。