公开(公告)号：US07576934B2

公开(公告)日：2009-08-18

申请号：US11656878

申请日：2007-01-23

申请人： Michael Schottner ,  Hans-Jurgen Mann ,  Martin Lowisch

发明人： Michael Schottner ,  Hans-Jurgen Mann ,  Martin Lowisch

IPC分类号： G02B27/00

CPC分类号： G02B27/0043 ,  G02B17/0647 ,  G03F7/70233 ,  G03F7/70258 ,  Y10S359/90

摘要： An objective and method of fabricating an objective, particularly a projection objective for microlithography, comprising a plurality of optical elements. In one example, the method comprises acts of determining groups of optically similar optical elements or surfaces having at least two members, determining wave front deformations by the optical elements or surfaces, determining the necessary corrections for the optical elements or surfaces of a group, and performing the corrections for a group at a group member.

摘要翻译： 一种制造物镜的目的和方法，特别是用于微光刻的投影物镜，其包括多个光学元件。 在一个示例中，该方法包括确定具有至少两个构件的光学相似的光学元件或表面的组的动作，确定光学元件或表面的波前变形，确定组的光学元件或表面的必要校正，以及执行 一个团体成员的一个组的更正。

公开(公告)号：US20070195317A1

公开(公告)日：2007-08-23

申请号：US11656878

申请日：2007-01-23

申请人： Michael Schottner ,  Hans-Jurgen Mann ,  Martin Lowisch

发明人： Michael Schottner ,  Hans-Jurgen Mann ,  Martin Lowisch

IPC分类号： G01N21/00

CPC分类号： G02B27/0043 ,  G02B17/0647 ,  G03F7/70233 ,  G03F7/70258 ,  Y10S359/90

摘要： An objective and method of fabricating an objective, particularly a projection objective for microlithography, comprising a plurality of optical elements. In one example, the method comprises acts of determining groups of optically similar optical elements or surfaces having at least two members, determining wavefront deformations by the optical elements or surfaces, determining the necessary corrections for the optical elements or surfaces of a group, and performing the corrections for a group at a group member.

摘要翻译： 一种制造物镜的目的和方法，特别是用于微光刻的投影物镜，其包括多个光学元件。 在一个示例中，该方法包括确定具有至少两个构件的光学相似的光学元件或表面的组的动作，确定光学元件或表面的波前变形，确定组的光学元件或表面的必要校正，以及执行 一个团体成员的一个组的更正。

公开(公告)号：US06746121B2

公开(公告)日：2004-06-08

申请号：US09844930

申请日：2001-04-27

申请人： Denwood F. Ross ,  Michael Schottner ,  Bjorne Baschek ,  Josef Bille

发明人： Denwood F. Ross ,  Michael Schottner ,  Bjorne Baschek ,  Josef Bille

IPC分类号： A61B310

CPC分类号： A61B3/1015 ,  A61B3/103 ,  G02B27/0025

摘要： Defocus and astigmatism compensation methods and apparatuses for use in an aberration measurement system. The apparatuses including reflectors for altering the optical distance between a pair of lenses passing a wavefront without changing the physical distance between the lenses, thereby compensating for defocus in the wavefront; and cylindrical mirrors for adding and removing curvature from a curved wavefront, thereby compensating for astigmatism in the wavefront. The methods including passing a wavefront having defocus through a first lens on a first path, reflecting the wavefront from the first path to a second path, reflecting the wavefront from the second path to a third path, and passing the wavefront through a second lens as a defocus compensated wavefront; and passing a wavefront through first and second cylindrical lens, and orienting the first and second cylindrical lenses with respect to the wavefront and to one another to compensate for astigmatism in the wavefront.

摘要翻译： 用于像差测量系统的散焦和像散补偿方法和装置。 这些装置包括用于改变通过波前的一对透镜之间的光学距离的反射器，而不改变透镜之间的物理距离，从而补偿波前的散焦; 以及用于从弯曲波前添加和去除曲率的圆柱形反射镜，从而补偿波前的散光。 所述方法包括将具有散焦的波前通过第一透镜穿过第一路径，将波前从第一路径反射到第二路径，将波前从第二路径反射到第三路径，并将波前通过第二透镜，如 散焦补偿波前; 并且使波前通过第一和第二柱面透镜，并且使第一和第二柱面透镜相对于波前和彼此定向以补偿波前的像散。

公开(公告)号：US06827442B2

公开(公告)日：2004-12-07

申请号：US09950916

申请日：2001-09-12

申请人： Denwood F. Ross ,  Josef Bille ,  Michael Schottner ,  Frank Mueller

发明人： Denwood F. Ross ,  Josef Bille ,  Michael Schottner ,  Frank Mueller

IPC分类号： A61B300

CPC分类号： A61B3/103

摘要： Apparatuses and methods for improving aberration determination capabilities, providing corrective prescription verification, and allowing binocular vision correction in ophthalmic wavefront measuring devices. (1) Improved aberration determination capabilities are achieved through input beam modification which includes sensing an image in a wavefront emanating from an eye in response to an input beam with a sensor and then modifying the input beam with an adaptive optical device based on the sensed information. (2) Corrective prescription verification includes modifying an image with an adaptive optical element to produce a corrected image at the patients eye. (3) Binocular vision correction for a pair of eyes includes measuring the aberrations of one eye with a first ophthalmic wavefront measuring device and measuring the aberration produced by the other eye with a second ophthalmic wavefront measuring device substantially simultaneously.

摘要翻译： 用于改善像差确定能力的装置和方法，提供校正处方验证，并允许眼科波前测量装置中的双目视觉矫正。 （1）通过输入光束修改实现改进的像差确定能力，其包括响应于具有传感器的输入光束感测从眼睛发出的波前的图像，然后基于所感测的信息，用自适应光学装置修改输入光束 。 （2）纠正处方验证包括用自适应光学元件修改图像以在患者眼睛处产生校正图像。 （3）一对眼睛的双眼视力矫正包括用第一眼科波前测量装置测量一只眼睛的像差，并且基本上同时用第二眼科波前测量装置测量由另一只眼睛产生的像差。

公开(公告)号：US20050094100A1

公开(公告)日：2005-05-05

申请号：US10940372

申请日：2004-09-14

申请人： Denwood Ross ,  Josef Bille ,  Michael Schottner ,  Frank Mueller

发明人： Denwood Ross ,  Josef Bille ,  Michael Schottner ,  Frank Mueller

IPC分类号： G01M11/02 ,  A61B3/028 ,  A61B3/10 ,  A61B3/103 ,  G06T1/00

CPC分类号： A61B3/103

摘要： Apparatuses and methods for improving aberration determination capabilities, providing corrective prescription verification, and allowing binocular vision correction in ophthalmic wavefront measuring devices. (1) Improved aberration determination capabilities are achieved through input beam modification which includes sensing an image in a wavefront emanating from an eye in response to an input beam with a sensor and then modifying the input beam with an adaptive optical device based on the sensed information. (2) Corrective prescription verification includes modifying an image with an adaptive optical element to produce a corrected image at the patients eye. (3) Binocular vision correction for a pair of eyes includes measuring the aberrations of one eye with a first ophthalmic wavefront measuring device and measuring the aberration produced by the other eye with a second ophthalmic wavefront measuring device substantially simultaneously.

摘要翻译： 用于改善像差确定能力的装置和方法，提供校正处方验证，并允许眼科波前测量装置中的双目视觉矫正。 （1）通过输入光束修改实现改进的像差确定能力，其包括响应于具有传感器的输入光束感测从眼睛发出的波前的图像，然后基于所感测的信息，用自适应光学装置修改输入光束 。 （2）纠正处方验证包括用自适应光学元件修改图像以在患者眼睛处产生校正图像。 （3）一对眼睛的双眼视力矫正包括用第一眼科波前测量装置测量一只眼睛的像差，并且基本上同时用第二眼科波前测量装置测量由另一只眼睛产生的像差。

公开(公告)号：US06688745B2

公开(公告)日：2004-02-10

申请号：US10032836

申请日：2001-10-25

申请人： Denwood F. Ross ,  Josef Bille ,  Michael Schottner ,  Frank Mueller

发明人： Denwood F. Ross ,  Josef Bille ,  Michael Schottner ,  Frank Mueller

IPC分类号： A61B314

CPC分类号： A61B3/1015 ,  A61B3/0025 ,  A61B3/103

摘要： Apparatus and method for subjectively refining a corrective prescription based on feedback from a patient. Subjective refinement of a corrective prescription is accomplished by measuring aberrations of a wavefront emanating from the eye, computing a proposed corrective prescription based on the measured aberrations presenting to the patient an image reflecting the proposed corrective prescription, and varying the proposed corrective prescription based on feedback from the patient through an input device coupled to the processor to obtain the preferred corrective prescription.

摘要翻译： 基于来自患者的反馈主观地矫正矫正处方的装置和方法。 校正处方的主观改进是通过测量从眼睛发出的波前的像差来实现的，基于向患者呈现反映所提出的校正处方的图像的测量的像差来计算所提出的校正处方，并且基于反馈来改变所提出的校正处方 从患者通过耦合到处理器的输入设备获得优选的校正处方。