公开(公告)号：US20040134788A1

公开(公告)日：2004-07-15

申请号：US10677498

申请日：2003-10-01

Applicant: Microfabrica Inc.

Inventor： Adam L. Cohen ,  Dennis R. Smalley ,  Gang Zhang

IPC: C25D005/02 ,  C25D005/48

CPC classification number: C25D5/022 ,  B33Y10/00 ,  C25D1/08 ,  C25D5/10

Abstract: Multilayer structures are electrochemically fabricated via depositions of one or more materials in a plurality of overlaying and adhered layers. Selectivity of deposition is obtained via a multi-cell controllable mask. Alternatively, net selective deposition is obtained via a blanket deposition and a selective removal of material via a multi-cell mask. Individual cells of the mask may contain electrodes comprising depositable material or electrodes capable of receiving etched material from a substrate. Alternatively, individual cells may include passages that allow or inhibit ion flow between a substrate and an external electrode and that include electrodes or other control elements that can be used to selectively allow or inhibit ion flow and thus inhibit significant deposition or etching. Single cell masks having a cell size that is smaller or equal to the desired deposition resolution may also be used to form structures.

Abstract translation: 多层结构通过在多个覆盖层和粘附层中的一种或多种材料的沉积进行电化学制造。 沉积的选择性通过多单元可控掩模获得。 或者，通过覆盖沉积和通过多细胞掩模选择性去除材料获得净选择性沉积。 掩模的各个单元可以包含包含可沉积材料的电极或能够从基底接受蚀刻材料的电极。 或者，单个电池可以包括允许或抑制衬底和外部电极之间的离子流动并且包括电极或其它控制元件的通道，其可以用于选择性地允许或抑制离子流动，从而抑制显着的沉积或蚀刻。 具有小于或等于所需沉积分辨率的单元尺寸的单细胞掩模也可用于形成结构。