公开(公告)号：US5886786A

公开(公告)日：1999-03-23

申请号：US942638

申请日：1997-10-02

申请人： Motonori Kanaya ,  Kazuyoshi Yamasaki ,  Toshikazu Akaogi

发明人： Motonori Kanaya ,  Kazuyoshi Yamasaki ,  Toshikazu Akaogi

IPC分类号： G01B9/02

CPC分类号： G01B9/0209 ,  G01B11/2441 ,  G01B9/02064

摘要： A subject positioning device for an interferometer includes a positioning mechanism for positioning a test surface within an axial extent of interference positions in the object beam path, which is less than double of a thickness of the subject, and at least one positioning lens placed between a beam splitter and the axial extent of interference positions in the object beam path with a focal point located within the axial extent of interference positions.

摘要翻译： 用于干涉仪的被摄体定位装置包括定位机构，用于将物体光束路径内的干涉位置的轴向范围内的测试表面定位，所述干涉位置小于被检体的厚度的两倍，并且至少一个位于 分束器和目标光束路径中的干涉位置的轴向范围，其中焦点位于干涉位置的轴向范围内。

公开(公告)号：US5995222A

公开(公告)日：1999-11-30

申请号：US775193

申请日：1996-12-30

申请人： Motonori Kanaya ,  Kazuyoshi Yamasaki ,  Toshikazu Akaogi

发明人： Motonori Kanaya ,  Kazuyoshi Yamasaki ,  Toshikazu Akaogi

IPC分类号： G01B9/02

CPC分类号： G01B9/0209 ,  G01B11/2441 ,  G01B9/02064

摘要： A subject positioning device for an interferometer includes a positioning mechanism for positioning a test surface within an axial extent of interference positions in the object beam path, which is less than double of a thickness of the subject, and at least one positioning lens placed between a beam splitter and the axial extent of interference positions in the object beam path with a focal point located within the axial extent of interference positions.

公开(公告)号：US5471305A

公开(公告)日：1995-11-28

申请号：US278842

申请日：1994-07-22

申请人： Masami Yoneda ,  Toshikazu Akaogi

发明人： Masami Yoneda ,  Toshikazu Akaogi

IPC分类号： G01B9/02 ,  G01B11/30

CPC分类号： G01B11/306 ,  G01B9/02072

摘要： An alignment verification system for adjusting the posture of a test piece on a support table into alignment with a reference plate on an interferometer containing a light source to irradiate the test piece and reference plate, the verification system including: a bi-axial adjustment means for tilting the support table in the directions of perpendicularly intersecting X- and Y-axis; spot image forming means arranged to converge light reflections from a master surface of the reference plate and an inspecting surface of the test piece into spot images of a predetermined diameter at a predetermined spot image-forming plane; a line sensor located at the spot image-forming plane across the spot image of the reference plate and having a linear light receiving face switchable through 90.degree. between an X-axis position and a Y-axis position corresponding to the directions of the X- and Y-axes of the bi-axial adjustment means, for detecting the spot image of the test piece in relation with tilting adjustments of the support table by the bi-axial adjustment mechanism in each of the X- and Y-axis positions; and a sensor drive mechanism adapted to switch the light receiving face of the line sensor from the X-axis position to the Y-axis position or vice versa upon detecting the spot image of the test piece in one of the X- and Y-axis positions.

摘要翻译： 一种对准验证系统，用于将支撑台上的测试件的姿势调整为与包含用于照射测试件和参考板的光源的干涉仪上的参考板对准，所述验证系统包括：双轴调节装置， 在X轴和Y轴垂直相交的方向倾斜支撑台; 点图像形成装置，被布置成将来自参考板的主表面的光反射和测试片的检查表面在预定的点成像平面处聚焦成预定直径的点图像; 线传感器位于参考板的点图像上的光点图像形成平面处，并且具有线性光接收面，其能够在对应于X射线的X轴位置和Y轴位置之间切换90°， 和Y轴，用于通过所述双轴调节机构在所述X轴和Y轴位置中的每一个中检测与所述支撑台的倾斜调整相关的所述测试件的点图像; 以及传感器驱动机构，其适于在X轴和Y轴中的一个检测到测试片的斑点图像时将线传感器的光接收面从X轴位置切换到Y轴位置，反之亦然 职位

公开(公告)号：US06760114B2

公开(公告)日：2004-07-06

申请号：US10156027

申请日：2002-05-29

申请人： Toshikazu Akaogi ,  Hiroshi Shibamoto

发明人： Toshikazu Akaogi ,  Hiroshi Shibamoto

IPC分类号： G01B902

CPC分类号： G01B9/02049

摘要： A support apparatus for an optical wave interferometer reference plate comprises a support member for supporting an outer peripheral face of the reference plate. The support member is bonded to the outer peripheral face of the reference plate at a plurality of positions spaced from each other along the circumferential direction of the outer peripheral face and adapted to deform elastically in a circumferential/diametric direction of the reference plate but less in the optical axis direction of the reference plate than in the circumferential/diametric direction.

摘要翻译： 用于光波干涉仪参考板的支撑装置包括用于支撑参考板的外周面的支撑构件。 所述支撑部件沿着所述外周面的圆周方向在彼此间隔开的多个位置处结合到所述基准板的外周面，并且适于沿所述基准板的周向/直径方向弹性变形， 参考板的光轴方向比圆周/直径方向。