摘要:
A photoconductive layer formed of a Bi12MO20 sintered body is manufactured without being fused with a setter. An oxide material in which a content of silicon oxide is 1 wt %, and more preferably, 0.3 wt % or less, is used as a setter which mounts a Bi12MO20 molded body (where M is at least one of Ge, Si and Ti) thereon.
摘要翻译:制造由Bi 12 O 20 20烧结体形成的光电导层,而不与固化器熔合。 使用其中氧化硅含量为1重量%,更优选为0.3重量%以下的氧化物材料作为安装Bi 2 O 2 MO 20 / >其中M是至少一种Ge,Si和Ti的成型体。
摘要:
A photoconductive layer formed of a Bi12MO20 sintered body is manufactured without being fused with a setter. An oxide material in which a content of silicon oxide is 1 wt %, and more preferably, 0.3 wt % or less, is used as a setter which mounts a Bi12MO20 molded body (where M is at least one of Ge, Si and Ti) thereon.
摘要翻译:制造由Bi 12 O 20 20烧结体形成的光电导层,而不与固化器熔合。 使用其中氧化硅含量为1重量%,更优选为0.3重量%以下的氧化物材料作为安装Bi 2 O 2 MO 20 / >其中M是至少一种Ge,Si和Ti的成型体。
摘要:
A photo-conductor layer for constituting a radiation imaging panel, which photo-conductor layer is capable of recording radiation image information as an electrostatic latent image, is produced. The photo-conductor layer contains a Bi12MO20 sintered material, in which M represents at least one kind of element selected from the group consisting of Ge, Si, and Ti. Sintering processing for the formation of the Bi12MO20 sintered material is performed in an inert gas, atmosphere. Alternatively, the sintering processing is peiformed at a sintering temperature falling within the range of 800° C. to 900° C. and in an atmosphere, in which an oxygen partial pressure PO2 (Pa) satisfies the condition 10−3≦PO2≦10−1.
摘要:
A photo-conductor layer for constituting a radiation imaging panel, which photo-conductor layer is capable of recording radiation image information as an electrostatic latent image, is produced. The photo-conductor layer contains a Bi12MO20 sintered material, in which M represents at least one kind of element selected from the group consisting of Ge, Si, and Ti. Sintering processing for the formation of the Bi12MO20 sintered material is performed in an inert gas, atmosphere. Alternatively, the sintering processing is performed at a sintering temperature falling within the range of 800° C. to 900° C. and in an atmosphere, in which an oxygen partial pressure PO2 (Pa) satisfies the condition 10−3≦PO2≦10−1.
摘要:
A photoconductive layer for use in a radiation imaging panel which records an electrostatic latent image representing a radiographic image, formed of a bismuth-mixed metal oxide Bi12MO20 so as to exhibit a first light reflectance at a first wavelength of 750 nm and a second light reflectance at a second wavelength of 350 nm, where M is at least one of Ge, Si, and Ti, and the first light reflectance is seven or more times greater than the second light reflectance.
摘要翻译:一种用于辐射成像面板的光电导层,其记录表示由铋混合金属氧化物Bi 12 MO 20形成的放射线照相图像的静电潜像,以便 在750nm的第一波长的第一光反射率和350nm的第二波长的第二光反射率,其中M是Ge,Si和Ti中的至少一个,并且第一光反射率是七倍或更多倍 比第二光反射率。
摘要:
A photo-conductive layer for constituting a radiation imaging panel, which photo-conductive layer is capable of recording radiation image information as an electrostatic latent image, contains Bi4M3O12, in which M represents at least one kind of element selected from the group consisting of Ge, Si, and Ti. The photo-conductive layer may be formed with a coating technique or as a sintered film. The photo-conductive layer has a large effect of collecting formed electric charges and enhanced sensitivity, and is capable of yielding an image with good graininess characteristics.
摘要翻译:用于构成能够记录作为静电潜像的放射线图像信息的光导体层的放射线图像的光导体层包含Bi 3 O 3 O 3 其中M表示选自Ge,Si和Ti中的至少一种元素。 光导电层可以用涂覆技术或烧结膜形成。 光电导层具有收集形成的电荷和增强的灵敏度的大的效果,并且能够产生具有良好颗粒特性的图像。
摘要:
An image formation method is described, which comprises overlaying a silver halide light-sensitive material with a sheet after or during imagewise exposure, the light-sensitive material comprising a support having provided thereon at least a light-sensitive silver halide mainly comprising silver chloride, a hydrophilic binder, a reducing agent and a slightly water-soluble basic metal compound, the sheet comprising a support having provided thereon at least a compound forming a complex with a metal ion constituting said basic metal compound, a physical development nucleus, and a compound represented by the following formula (I) or a compound containing a sulfite ion; and heat-developing the material in the presence of water to form a silver image on at least one of the light-sensitive material and the sheet: ##STR1## wherein Q represents an atomic group necessary to form a 5- or 6-membered imide ring.
摘要:
A heat-developable photosensitive material includes an infrared-sensitive layer having a maximum spectral sensitivity at a wavelength of 700 nm or longer. A silver chlorobromide emulsion from which the infrared-sensitive layer is formed is prepared by adding an iodide at an intermediate stage during silver halide grain formation or later. The photosensitive material exhibits high sensitivity and low fog while the corresponding emulsion coating composition in solution form remains stable with time.
摘要:
A photoconductive layer included in a radiation imaging panel for recording radiation image information as an electrostatic latent image is a polycrystal made of Bi12MO20, where M is at least one of Ge, Si and Ti, the filling factor of Bi12MO20 composing the photoconductive layer is 70% or more, and the thickness of the photoconductive layer is between 50 μm and 600 μm inclusive.
摘要翻译:包含在用于记录作为静电潜像的放射线图像信息的放射线图像信息的辐射成像面板中的光电导层是由Bi 12 O 20 20制成的多晶体,其中M是至少一个 Ge,Si和Ti,构成光电导层的Bi 12 O 20 20的填充系数为70%以上,光电导层的厚度为50μm〜 包括600美元。
摘要:
The second silver halide photosensitive material comprises a substrate and at least one photosensitive silver halide emulsion layer formed thereon, the silver halide photosensitive material comprising at least two types of silver halide grains with different projected areas having photosensitivity in the same spectral range; silver halide grains having a larger projected area having a refractive index n1 and an average thickness a, and silver halide grains having a smaller projected area having a refractive index n2 and an average thickness b; and the silver halide grains satisfying the conditions defined by the following equation (1): n2≦n1, and a≦b×(n2/n1) (1).