公开(公告)号：US09109154B2

公开(公告)日：2015-08-18

申请号：US13289693

申请日：2011-11-04

申请人： Myeong Ho Noh ,  Choo Ho Kim ,  Song Ho Jeong ,  Dong Hee Lim

发明人： Myeong Ho Noh ,  Choo Ho Kim ,  Song Ho Jeong ,  Dong Hee Lim

IPC分类号： B01F3/08 ,  B01F15/02 ,  C09K11/02 ,  B01F13/10 ,  B01F15/04

CPC分类号： C09K11/02 ,  B01F13/1069 ,  B01F13/1072 ,  B01F15/0445 ,  C09K11/08

摘要： An apparatus and method for automatically mixing a phosphor are provided, which are capable of automatically supplying accurate quantities of a phosphor and silicon to a mixing container using a phosphor supply unit and a silicon supply unit.

摘要翻译： 提供一种用于自动混合荧光体的装置和方法，其能够使用磷光体供应单元和硅供应单元自动地向混合容器供应准确量的磷光体和硅。

公开(公告)号：US08922643B2

公开(公告)日：2014-12-30

申请号：US13412197

申请日：2012-03-05

申请人： Won Soo Ji ,  Oh Seok Kwon ,  Choo Ho Kim

发明人： Won Soo Ji ,  Oh Seok Kwon ,  Choo Ho Kim

IPC分类号： H04N7/18 ,  G01N21/00 ,  G01N21/88 ,  G01N21/956

CPC分类号： G01N21/8806 ,  G01N21/956 ,  G01N2021/8845

摘要： A light emitting diode (LED) inspection apparatus includes at least one LED including a phosphor applied on an emission surface, a first lighting unit to emit visible light to the LED, a second lighting unit to emit ultraviolet (UV) light to the LED, a photographing unit to generate at least one first image data by photographing the visible light reflected from the LED and to generate at least one second image data by photographing the UV light reflected from the LED, and a determination unit to determine a defect in appearance and emission characteristics of the LED using the at least one first image data and second image data.

摘要翻译： 发光二极管（LED）检查装置包括至少一个LED，其包括施加在发射表面上的荧光体，向LED发射可见光的第一照明单元，向LED发射紫外线（UV）光的第二照明单元， 拍摄单元，通过拍摄从LED反射的可见光来生成至少一个第一图像数据，并且通过拍摄从LED反射的UV光来生成至少一个第二图像数据;以及确定单元，用于确定外观缺陷，以及 使用所述至少一个第一图像数据和第二图像数据的LED的发射特性。

公开(公告)号：US08927302B2

公开(公告)日：2015-01-06

申请号：US13824349

申请日：2011-12-20

申请人： Jun Woo Kim ,  Takeya Motonobu ,  In Hoe Hur ,  Choo Ho Kim ,  Jae Bong Lee

发明人： Jun Woo Kim ,  Takeya Motonobu ,  In Hoe Hur ,  Choo Ho Kim ,  Jae Bong Lee

IPC分类号： H01L21/00 ,  C23C16/455 ,  H01L33/48 ,  C23C16/30 ,  C30B25/14 ,  C23C16/44 ,  C23C16/458 ,  C30B25/12 ,  C30B29/40 ,  H01L33/00

CPC分类号： C23C16/45502 ,  C23C16/303 ,  C23C16/4401 ,  C23C16/45508 ,  C23C16/45519 ,  C23C16/4584 ,  C30B25/12 ,  C30B25/14 ,  C30B29/406 ,  H01L33/007 ,  H01L33/48 ,  H01L2224/48091 ,  H01L2224/49107 ,  H01L2224/73265 ,  H01L2924/00014

摘要： Provided are a CVD apparatus and a method of manufacturing a light emitting device using the same. The CVD apparatus includes a chamber body including a susceptor having at least one pocket part having a wafer stably mounted therein; a chamber cover provided with the chamber body to open or close the chamber body and having a reaction space between the susceptor and the chamber cover; a reactive gas supplier supplying the reactive gas into the reaction space to allow the reactive gas to flow across a surface of the susceptor; and a non-reactive gas supplier supplying a non-reactive gas into the reaction space to allow the non-reactive gas to flow across a surface of the chamber cover between the susceptor and the chamber cover so as to prevent the reactive gas from contacting the surface of the chamber cover.

摘要翻译： 提供一种CVD装置和使用其的发光装置的制造方法。 CVD装置包括：腔体，其包括具有至少一个具有稳定安装在其中的晶片的口袋部的基座; 设置有室主体以打开或关闭室主体并且在基座和室盖之间具有反作用空间的室盖; 反应性气体供应器将反应性气体供应到反应空间中，以使反应性气体流过基座的表面; 以及非反应性气体供应器，将非反应性气体供应到反应空间中，以使非反应性气体流过基座和腔室盖之间的腔室盖的表面，以防止反应气体接触 腔室盖的表面。

公开(公告)号：US20130260488A1

公开(公告)日：2013-10-03

申请号：US13824349

申请日：2011-12-20

申请人： Jun Woo Kim ,  Takeya Motonobu ,  In Hoe Hur ,  Choo Ho Kim ,  Jae Bong Lee

发明人： Jun Woo Kim ,  Takeya Motonobu ,  In Hoe Hur ,  Choo Ho Kim ,  Jae Bong Lee

IPC分类号： C23C16/455 ,  H01L33/48

CPC分类号： C23C16/45502 ,  C23C16/303 ,  C23C16/4401 ,  C23C16/45508 ,  C23C16/45519 ,  C23C16/4584 ,  C30B25/12 ,  C30B25/14 ,  C30B29/406 ,  H01L33/007 ,  H01L33/48 ,  H01L2224/48091 ,  H01L2224/49107 ,  H01L2224/73265 ,  H01L2924/00014

摘要： Provided are a CVD apparatus and a method of manufacturing a light emitting device using the same. The CVD apparatus includes a chamber body including a susceptor having at least one pocket part having a wafer stably mounted therein; a chamber cover provided with the chamber body to open or close the chamber body and having a reaction space between the susceptor and the chamber cover; a reactive gas supplier supplying the reactive gas into the reaction space to allow the reactive gas to flow across a surface of the susceptor; and a non-reactive gas supplier supplying a non-reactive gas into the reaction space to allow the non-reactive gas to flow across a surface of the chamber cover between the susceptor and the chamber cover so as to prevent the reactive gas from contacting the surface of the chamber cover.

摘要翻译： 提供一种CVD装置和使用其的发光装置的制造方法。 CVD装置包括：腔体，其包括具有至少一个具有稳定安装在其中的晶片的口袋部的基座; 设置有室主体以打开或关闭室主体并且在基座和室盖之间具有反作用空间的室盖; 反应性气体供应器将反应性气体供应到反应空间中，以使反应性气体流过基座的表面; 以及非反应性气体供应器，将非反应性气体供应到反应空间中，以使非反应性气体流过基座和腔室盖之间的腔室盖的表面，以防止反应气体接触 腔室盖的表面。