公开(公告)号：US11978642B2

公开(公告)日：2024-05-07

申请号：US17486057

申请日：2021-09-27

申请人： NALUX CO., LTD.

发明人： Kenji Tanibe ,  Kazuya Yamamoto

IPC分类号： H01L21/3213 ,  B29C33/42 ,  B29C59/14 ,  G02B1/04 ,  G02B1/11 ,  G02B1/118 ,  G02B1/12 ,  H01J37/32 ,  H01L21/3065

CPC分类号： H01L21/32138 ,  B29C33/424 ,  B29C59/14 ,  G02B1/04 ,  G02B1/11 ,  G02B1/118 ,  G02B1/12 ,  H01J37/32394 ,  H01L21/3065 ,  B29K2995/0072 ,  B29K2995/0093

摘要： A method for producing a plastic element provided with fine surface roughness is provided. In the method, etching of a surface of the plastic element is performed separately in a first step and in a second step, in the first step, fine roughness having a predetermined average value of pitch in the range from 0.05 to 1 micrometer is generated on the surface through reactive ion etching in an atmosphere of a first gas; and in the second step, an average value of depth of the fine roughness generated in the first step is adjusted to a predetermined value in the range from 0.15 to 1.5 micrometers while the predetermined average value of pitch is substantially maintained through reactive ion etching in an atmosphere of a second gas, reactivity to the plastic element of the second gas being lower than reactivity to the plastic element of the first gas.