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1.发明申请公开(公告)号：US20180306669A1
公开(公告)日：2018-10-25
申请号：US15767881
申请日：2016-10-07
Applicant: NEC CORPORATION
Inventor： Ryota MASE , Katsuhiro OCHIAI
IPC: G01M7/02
CPC classification number: G01M7/025 , G01M5/0008 , G01M5/0066 , G01M7/022 , G01M99/00
Abstract: A structure abnormality detection system that detects an abnormality of at least one of structures classified into a plurality of groups in which a plurality of factors that may affect behavior of structures are substantially the same includes: means for storing a model that predicts, from a first inspection value acquired at a first inspection position, a second inspection value acquired at a second inspection position that is a position where a vibration intensity in vibration of a predetermined vibration mode at a natural frequency of the structure is substantially the same as at the first inspection position; and means for detecting an abnormality of the structure by evaluating fidelity of the first inspection value and the second inspection value acquired at a particular time to the model.
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2.发明申请公开(公告)号：US20180252694A1
公开(公告)日：2018-09-06
申请号：US15755620
申请日：2016-09-12
Applicant: NEC Corporation
Inventor： Ryota MASE , Katsuhiro OCHIAI
Abstract: In order to achieve highly accurate prediction across a wide area for disasters caused by rainfall, this disaster prediction system includes: soil moisture acquisition means that acquires amount of moisture in soil at a specified site, ground surface moisture acquisition means that acquires amount of moisture at a ground surface within a given range that includes the specified site, and estimation means estimates amount of moisture in soil at a freely-selected site in the given range or a parameter that indicates a property of soil at the freely-selected site in the given range, based on the amount of moisture in the soil at the specified site and the amount of moisture at the ground surface within the given range.
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3.发明申请公开(公告)号：US20190088022A1
公开(公告)日：2019-03-21
申请号：US16089847
申请日：2017-02-20
Applicant: NEC CORPORATION
Inventor： Katsuhiro OCHIAI
IPC: G06T19/00 , G05B19/418 , G06T7/00
Abstract: This invention is directed to a plant management system that presents a position to be measured by a sensor that performs measurement for inspection of a plant or the like when the measurement is executed, thereby preventing a measurement error. The plant management system includes a measurement position instructor that, when performing the measurement by the sensor on a work site, instructs the position to be measured by the sensor on a measurement target, and a presenter that, when the measurement is executed, performs presentation of an image representing the position to be measured by the sensor on the work site by superimposing the image on an image of the measurement target or projecting the image onto the measurement target. Here, the presenter includes a superimposition display that superimposes and displays the image representing the position to be measured by the sensor on the image of the measurement target using an augmented reality technology or a projection device that projects the image representing the position to be measured by the sensor in association with the measurement target.
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公开(公告)号：US20180306677A1
公开(公告)日：2018-10-25
申请号：US15767886
申请日：2016-10-07
Applicant: NEC CORPORATION
Inventor： Ryota MASE , Shinji KASAHARA , Katsuhiro OCHIAI
CPC classification number: G01M99/005 , G01B21/32 , G01H1/00 , G01M5/0008 , G01M5/0033 , G01M7/02 , G01M13/00
Abstract: A structure abnormality detection device that detects an abnormality of a structure includes means for storing a model that predicts, from a first inspection value acquired at a first inspection position, a second inspection value acquired at a second inspection position that is a position where a vibration intensity in vibration of a predetermined vibration mode at a natural frequency of the structure is substantially the same as at the first inspection position; and means for detecting an abnormality of the structure by evaluating fidelity of the first inspection value and the second inspection value acquired at a particular time to the model.
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公开(公告)号：US20180267522A1
公开(公告)日：2018-09-20
申请号：US15746052
申请日：2016-08-02
Applicant: NEC Corporation
Inventor： Takazumi KAWAI , Katsuhiro OCHIAI
IPC: G05B19/418
Abstract: Provided is a manufacturing process analysis device (30), comprising: a computation unit (31) which computes, in a process in which a manufactured object is manufactured, invariant compliance strengths for each shift time for manufacturing condition values (360) and quality values (361) which are measured in time series; a shift time specification unit (32) which derives, as a specified shift time, a shift time for which the invariant compliance strengths satisfy a baseline; and an analysis unit (33) which analyzes the state of the manufacturing process on the basis of the quality value and the manufacturing condition value for the time which is earlier by the specified shift time than the time at which the quality value is measured.
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Patent Agency Ranking
公开(公告)号：US20190271680A1
公开(公告)日：2019-09-05
申请号：US16417890
申请日：2019-05-21
Applicant: NEC Corporation
Inventor： Ryota MASE , Katsuhiro OCHIAI
Abstract: Moisture content information in soil at a specified site, and moisture content information at a ground surface within a given range that includes the specified site, are acquired. A point where there is a risk of natural disaster within the given range is determined and highlighted, based on the moisture content information in soil at the specified site and the moisture content information at the ground surface within the given range.
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7.发明申请公开(公告)号：US20190170903A1
公开(公告)日：2019-06-06
申请号：US16323292
申请日：2017-08-23
Applicant: NEC Corporation
Inventor： Yuya YAMAKAWA , Katsuhiro OCHIAI
Abstract: A rainfall amount prediction device includes: a first prediction unit creating a first prediction pattern, and calculating a first total rainfall amount that is the total rainfall amount in the first period according to the first prediction pattern; a second prediction unit determining a second total rainfall amount that is the total rainfall amount in a second period by subtracting the first total rainfall amount from the entire total rainfall amount, and creating, under the limitations of the second total rainfall amount, and a pattern creation unit creating a plurality of rainfall prediction patterns for the entirety of the prediction period by combining, on a time axis, the first prediction pattern and the plurality of second prediction patterns.
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8.发明申请公开(公告)号：US20190086903A1
公开(公告)日：2019-03-21
申请号：US16089893
申请日：2017-02-20
Applicant: NEC CORPORATION
Inventor： Katsuhiro OCHIAI
IPC: G05B19/418
Abstract: The present invention is directed to a plant management system that actively incorporates the sense or experience of an operator who observes or inspects a plant on work site in plant management processing. The plant management system includes an acquirer that acquires at least a position in which an abnormality suspicious event suspected to be abnormal by an operator on work site has occurred, a sensor specifier that specifies a sensor associated with the abnormality suspicious event based on the at least a position in which the abnormality suspicious event has occurred, and a setter that sets an information collection method in accordance with the specified sensor. In addition, at least one of a type of the abnormality suspicious event and an occurrence time of the abnormality suspicious event may be taken into consideration to specify the sensor.
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公开(公告)号：US20160266072A1
公开(公告)日：2016-09-15
申请号：US15030960
申请日：2013-11-12
Applicant: NEC Corporation
Inventor： Katsuhiro OCHIAI
CPC classification number: G01N29/46 , G01H1/00 , G01H3/00 , G01H3/04 , G01M7/00 , G01N29/14 , G01N33/24 , G01N2291/023 , G01N2291/0289 , G01W1/14
Abstract: An analysis device 101 includes: a first sensor 102 for acquiring waveform data generated from an object; a second sensor 103 for acquiring time-series data of an element that affects a change in state of the object; frequency transform means 105 for acquiring a frequency of the waveform data; feature value calculation means 107 for calculating a feature value based on the frequency; time-series arrangement means 108 for assigning a time corresponding to the time-series data, to the feature value; and correlation check means 113 for checking a correlation between the feature value and the time-series data.
Abstract translation: 分析装置101包括：第一传感器102，用于获取从对象生成的波形数据; 第二传感器103，用于获取影响对象状态变化的元素的时间序列数据; 用于获取波形数据的频率的频率变换装置105; 特征量计算装置107，用于基于频率计算特征值; 用于将对应于时间序列数据的时间分配给特征值的时间序列排列装置108; 以及相关检查装置113，用于检查特征值与时间序列数据之间的相关性。
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公开(公告)号：US20200050718A1
公开(公告)日：2020-02-13
申请号：US16343032
申请日：2016-10-31
Applicant: NEC Corporation
Inventor： Yuya YAMAKAWA , Katsuhiro OCHIAI
Abstract: A simulation apparatus, a simulation method, and a storage medium that can implement a water flow simulation with higher accuracy compared to the conventional water flow simulator are provided. The simulation apparatus has an estimated value acquisition unit that calculates an estimated value of soil water content in a target region, a determination unit that determines a parameter in consideration of an error between the estimated value of the soil water content in the target region and an actual measurement value of the soil water content in the target region, and a simulator unit that performs a simulation of a water flow in the target region by using the parameter.
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