Substrate for liquid-crystal display device and fabrication method thereof
    1.
    发明申请
    Substrate for liquid-crystal display device and fabrication method thereof 有权
    液晶显示装置用基板及其制造方法

    公开(公告)号:US20040046912A1

    公开(公告)日:2004-03-11

    申请号:US10638000

    申请日:2003-08-08

    Inventor: Takayuki Ishino

    CPC classification number: G02F1/136227 G02F2001/136222

    Abstract: A substrate for a LCD device improves the flatness of the outermost substrate surface in the contact region for interconnecting an electrode of a switching element (e.g., a TFT) and a pixel electrode to each other in each pixel. Switching elements for respective pixels are formed on a transparent plate. Protrusions for the respective pixels are formed on the plate to protrude to a vicinity of an outermost surface of the substrate. Each protrusion raises an electrode of a corresponding switching element to the vicinity of the outermost surface in the corresponding pixel. A planarization layer forming the outermost surface is formed to cover the switching elements, the protrusions, and the electrodes of the elements in all the pixels. Pixel electrodes for the respective pixels are formed on the outermost surface. Each pixel electrode contacts the corresponding electrode of the element in the vicinity of the outermost surface.

    Abstract translation: 用于LCD器件的衬底提高了用于将开关元件(例如,TFT)的电极和像素电极互相连接在每个像素中的接触区域中的最外侧衬底表面的平坦度。 用于各个像素的开关元件形成在透明板上。 各个像素的突起形成在板上以突出到基板的最外表面附近。 每个突起将相应的开关元件的电极提升到相应像素中的最外表面附近。 形成最外表面的平坦化层形成为覆盖所有像素中的元件的开关元件,突起和电极。 各个像素的像素电极形成在最外表面上。 每个像素电极在最外表面附近与元件的相应电极接触。

    Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same
    3.
    发明申请
    Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same 有权
    用于曝光的掩模和用于制造使用该液晶显示装置的方法

    公开(公告)号:US20040069757A1

    公开(公告)日:2004-04-15

    申请号:US10676132

    申请日:2003-10-02

    Abstract: Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.

    Abstract translation: 单个光罩中的曝光区域103和遮光区域104在纵向和横向方向彼此交替地排列。 通过使用该掩模版的多畴光曝光将基板曝光,使得光掩模的各个区域暴露于相应的照射A至B,B至C。 。 。 在分隔板的边界部分中,N到M彼此不相邻,用于执行各个镜头,从而缓和各镜头之间的照度差和镜头边界部分的完成差异,这些差异变成 在显示液晶显示装置时人眼难以察觉。

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