WAFER PLACEMENT TABLE
    1.
    发明公开

    公开(公告)号:US20230402306A1

    公开(公告)日:2023-12-14

    申请号:US18298404

    申请日:2023-04-11

    CPC classification number: H01L21/67778 H01L21/683

    Abstract: A wafer placement table includes: a ceramic substrate having a wafer placement surface and incorporating an electrode; a conductive embedded member electrically connected to the electrode; a conductive terminal with a female thread, the conductive terminal being electrically connected to the conductive embedded member, having a projection projecting from a surface, on an opposite side to the wafer placement surface, of the ceramic substrate, having the female thread at an end face of the projection; a conductive adapter that is mounted on the end face of the projection of the conductive terminal with the female thread, has a communication hole that communicates with the female thread, and is non-rotatable relative to the conductive terminal with the female thread; and a conductive connection member with a male thread, the conductive connection member having the male thread screwed into the female thread through the communication hole, and being integrated with the adapter.

    CERAMIC HEATER AND THERMOCOUPLE GUIDE

    公开(公告)号:US20210243847A1

    公开(公告)日:2021-08-05

    申请号:US17159363

    申请日:2021-01-27

    Abstract: A ceramic heater includes a ceramic plate having a wafer placement surface, a tubular shaft having one end that is bonded to a rear surface of the ceramic plate on an opposite side to the wafer placement surface, a within-shaft region of the rear surface of the ceramic plate, an elongate hole extending from a start point in an outer peripheral portion of the within-shaft region to a terminal end position in the outer peripheral portion of the ceramic plate, and a thermocouple guide that guides a tip end of an outer-peripheral-side thermocouple to come into the start point of the elongate hole. A portion of the thermocouple guide, the portion extending from the other end (lower end) of the tubular shaft to the start point of the elongate hole, is formed in a shape following an inner wall of the tubular shaft.

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