Surface position detection apparatus, exposure apparatus, and exposure method
    1.
    发明授权
    Surface position detection apparatus, exposure apparatus, and exposure method 有权
    表面位置检测装置,曝光装置和曝光方法

    公开(公告)号:US09519223B2

    公开(公告)日:2016-12-13

    申请号:US14712504

    申请日:2015-05-14

    申请人: NIKON CORPORATION

    摘要: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

    摘要翻译: 一种表面位置检测装置,其能够高度精确地检测待检测表面的表面位置,而不会受到通过反射表面的光束中产生的偏振分量的相对位置偏移的影响。 在该装置中,投影系统具有具有第一反射面的突出侧棱镜部件,并且受光系统具有受光棱镜部件,该受光棱镜部件具有与突出侧棱镜部件对应地配置的第二反射面。 表面位置检测装置还具有用于补偿由于通过第一和第二反射面的光束的偏振分量引起的相对位移的构件。

    Exposure apparatus, exposure method, and method for producing device
    2.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权
    曝光装置,曝光方法和制造装置的方法

    公开(公告)号:US09383656B2

    公开(公告)日:2016-07-05

    申请号:US14693320

    申请日:2015-04-22

    申请人: NIKON CORPORATION

    IPC分类号: G03B27/42 G03F7/20 G03F9/00

    摘要: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

    摘要翻译: 液浸曝光装置包括投影系统,可移动台,对准系统和测量构件。 投影系统具有最后的光学元件,并通过浸没液将光束投射到基板上。 可移动台具有保持基板的保持架。 对准系统不是通过浸没液体来检测衬底上的对准标记。 测量构件设置在可移动台上,并且具有通过对准系统而不是通过浸没液体检测的参考标记。 测量构件具有形成参考标记的材料,该材料被透光材料覆盖。 可移动台可移动到使得测量构件在投影系统下方的位置,并且投影系统和测量构件之间的间隙被浸没液体填充。

    Surface position detection apparatus, exposure apparatus, and exposure method

    公开(公告)号:US09927713B2

    公开(公告)日:2018-03-27

    申请号:US15358837

    申请日:2016-11-22

    申请人: NIKON CORPORATION

    IPC分类号: G03B27/72 G03F7/20 G03F9/00

    摘要: A surface position detection apparatus capable of highly precisely detecting the surface position of a surface to be detected without substantially being affected by relative positional displacement due to a polarization component occurring in a light flux having passed through a reflective surface. In the apparatus, a projection system has a projection side prism member having first reflective surfaces, and a light receiving system has a light receiving prism member having second reflective surfaces arranged in correspondence with the projection side prism member. The surface position detection apparatus further has a member for compensating relative positional displacement due to a polarization component of a light flux having passed through the first and second reflective surfaces.

    Exposure apparatus, exposure method, and method for producing device

    公开(公告)号:US10209623B2

    公开(公告)日:2019-02-19

    申请号:US15199195

    申请日:2016-06-30

    申请人: NIKON CORPORATION

    IPC分类号: G03B27/42 G03F7/20 G03F9/00

    摘要: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.