公开(公告)号：US20180362772A1

公开(公告)日：2018-12-20

申请号：US16060718

申请日：2015-12-18

申请人： ESSILOR INTERNATIONAL ,  NIKON CORPORATION

发明人： Akara ISHIKAWA ,  Ludovic FERRIGNO ,  Akiko MIYAKAWA

IPC分类号： C09D4/00 ,  C08F220/56 ,  C08K3/30 ,  C09D133/26 ,  C09D7/61 ,  C09D7/40 ,  G02B1/10

摘要： Disclosed is a liquid polymerizable composition including a chain-growth polymerization dispersing monomer, a step-growth polymerization monomer system and inorganic nanoparticles homogeneously dispersed in the monomers, as well as its use for the preparation of a transparent polymeric material having a high refractive index and low haze and its use in the optical field.

公开(公告)号：US20210087315A1

公开(公告)日：2021-03-25

申请号：US16634237

申请日：2017-07-28

申请人： NIKON CORPORATION ,  ESSILOR INTERNATIONAL

发明人： Akiko MIYAKAWA ,  Masafumi MIZUGUCHI

IPC分类号： C08F220/18 ,  B33Y70/00 ,  C08F222/10

摘要： A photocurable composition which can be used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other, from which the three-dimensional object having excellent transparency, a high glass transition temperature, and a high hardness can be formed, and which exhibits a high curing rate. The photocurable composition is a photocurable composition used to manufacture a three-dimensional object that is formed by stacking a plurality of layers on top of each other. The photocurable composition contains a monofunctional monomer having a polycyclic aliphatic group, a polyfunctional monomer, an alcohol, and an acylphosphine oxide photopolymerization initiator.

公开(公告)号：US20200180214A1

公开(公告)日：2020-06-11

申请号：US16627955

申请日：2017-07-28

申请人： NIKON CORPORATION ,  ESSILOR INTERNATIONAL

发明人： Christophe PROVIN ,  Akiko MIYAKAWA

IPC分类号： B29C64/129 ,  G03F7/00 ,  B33Y80/00

摘要： A photocurable composition for three-dimensional stereolithography which has a lower viscosity and from which a cured product having a high refractive index is obtained, and a three-dimensional object formed by using the composition. The composition is a photocurable composition for three-dimensional stereolithography containing a fluorene monomer, a carbazole monomer, a diluent monomer, and a photopolymerization initiator, the carbazole monomer being contained in an amount of less than 30 wt % with respect to the total amount of the fluorene monomer and the carbazole monomer, and the diluent monomer being contained in an amount of at least 20 wt % with respect to total solids.