公开(公告)号：US20240003762A1

公开(公告)日：2024-01-04

申请号：US18034510

申请日：2021-10-25

Applicant: NITTO DENKO CORPORATION

Inventor： Satoshi YASUI ,  Katsunori SHIBUYA ,  Kazuhiro NAKAJIMA

IPC: G01L1/22 ,  C23C14/00 ,  C23C14/06 ,  C23C14/34

CPC classification number: G01L1/2287 ,  C23C14/34 ,  C23C14/0641 ,  C23C14/0036

Abstract: A functional film includes a strain resistance film provided on one principal surface of a flexible insulating base. The strain resistance film is a chromium nitride thin-film having a thickness of 150 nm or less. In an X-ray diffraction chart with a CuKα ray as an X-ray source, the strain resistance film has an intensity ratio I2/I1 of 0.001 or more, where the intensity ratio I2/I1 is a ratio of the intensity I2 of the second peak in a range in which 2θ is 60° to 65° to the intensity I1 of the first peak in a range in which 2θ is 43° to 45°. The strain resistance film is less liable to crack due to bending, and has a high gauge factor. The functional film is suitably used for a strain sensor.