Abstract:
An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A pair of reflectors are mounted within the processing space of the microwave chamber. The reflectors are capable of reflecting a significant portion of the ultraviolet radiation to irradiate the backside of the substrate in a surrounding and uniform fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.
Abstract:
An exhaust system for use with a microwave excited ultraviolet lamp system is provided to receive cooling air emitted from the lamp system and to contain and direct the cooling air so as not to contact a substrate being irradiated with ultraviolet light. A lens, such as a quartz lens, is supported by the exhaust duct to transmit the ultraviolet light emitted from the lamp system toward the substrate.
Abstract:
A microwave excited ultraviolet lamp system having a single electrical cable that supplies operating voltages from a power supply to a lamp head. The single electrical cable may provide high voltage to a magnetron of the lamp head and a lesser voltage to an internal blower of the lamp head. The electrical cable may incorporate conductors for transferring communications signals between the power supply and sensors associated with the lamp head.