OPTICAL SYSTEM AND METHOD FOR MEASURING PARAMETERS OF PATTERNED STRUCTURES IN MICRO-ELECTRONIC DEVICES

    公开(公告)号:US20190339068A1

    公开(公告)日:2019-11-07

    申请号:US16462247

    申请日:2016-11-23

    Abstract: An optical system and method are presented for use in measurements on an upper surface of a layered sample when located in a measurement plane. The optical system is configured as a normal-incidence system having an illumination channel and a collection channel, and comprises an objective lens unit and a light propagation affecting device. The objective lens unit is accommodated in the illumination and collection channels, thereby defining a common optical path for propagation of illuminating light from the illumination channel toward an illuminating region in the measurement plane and for propagation of light returned from measurement plane to the collection channel. The light propagation affecting device comprises an apertured structure located in at least one of the illumination and collection channels, and configured to provide angular obscuration of light propagation path for blocking angular segments associated with light propagation from regions outside the illuminated region.

    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM
    2.
    发明申请

    公开(公告)号:US20190154594A1

    公开(公告)日:2019-05-23

    申请号:US16231718

    申请日:2018-12-24

    Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

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