公开(公告)号：US20190154594A1

公开(公告)日：2019-05-23

申请号：US16231718

申请日：2018-12-24

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： GILAD BARAK ,  DANNY GROSSMAN ,  DROR SHAFIR ,  YOAV BERLATZKY ,  YANIR HAINICK

IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

公开(公告)号：US20200025693A1

公开(公告)日：2020-01-23

申请号：US16524296

申请日：2019-07-29

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： GILAD BARAK ,  DROR SHAFIR ,  YANIR HAINICK ,  SHAHAR GOV

IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

公开(公告)号：US20210247699A1

公开(公告)日：2021-08-12

申请号：US17254357

申请日：2019-07-18

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： GILAD BARAK ,  MICHAEL CHEMAMA ,  SMADAR FERBER ,  YAIR HAINICK ,  BORIS LEVANT ,  ZE'EV LINDENFELD ,  DROR SHAFIR ,  YURI SHIRMAN ,  ELAD SCHLEIFER

IPC: G03F7/20 ,  G01B11/06

Abstract: Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.