Optical metrology for in-situ measurements

    公开(公告)号:US10197506B2

    公开(公告)日:2019-02-05

    申请号:US15915613

    申请日:2018-03-08

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

    OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS
    2.
    发明申请
    OPTICAL METROLOGY FOR IN-SITU MEASUREMENTS 有权
    用于实地测量的光学计量学

    公开(公告)号:US20150226680A1

    公开(公告)日:2015-08-13

    申请号:US14422190

    申请日:2013-08-15

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

    Abstract translation: 提出了一种方法和系统,用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括:在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据,并产生随时间测量的相应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括:处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据,以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分,以及确定表征应用于结构的所述过程的结构的至少一个参数,以及生成表示其的数据。

    Optical metrology for in-situ measurements

    公开(公告)号:US09915624B2

    公开(公告)日:2018-03-13

    申请号:US15385495

    申请日:2016-12-20

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

    Optical metrology for in-situ measurements
    4.
    发明授权
    Optical metrology for in-situ measurements 有权
    用于原位测量的光学测量

    公开(公告)号:US09528946B2

    公开(公告)日:2016-12-27

    申请号:US14422190

    申请日:2013-08-15

    Abstract: A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

    Abstract translation: 提出了一种方法和系统,用于控制应用于具有不同层叠叠层区域的图案化结构的工艺。 该方法包括:在预定处理时间内顺序地接收指示正在处理的结构的光学响应的​​测量数据,并产生随时间测量的相应的数据片段序列; 以及分析和处理所述数据段的序列并确定所述结构的至少一个主要参数。 分析和处理包括:处理所述数据片段的一部分并获得指示所述结构的一个或多个参数的数据; 利用表示所述结构的所述一个或多个参数的所述数据,以及描述所述结构的光学响应与所述结构的一个或多个参数之间的关系的最优化模型数据; 利用优化的模型数据来处理测量数据段的序列的至少一部分,以及确定表征应用于结构的所述过程的结构的至少一个参数,以及生成指示其的数据。

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