公开(公告)号：US20160238636A1

公开(公告)日：2016-08-18

申请号：US15040532

申请日：2016-02-10

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： MASAYUKI ITO

IPC: G01R19/00 ,  H01J37/317

CPC classification number: G01R19/0061 ,  H01J37/243 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/06308 ,  H01J2237/24521 ,  H01J2237/24535 ,  H01J2237/24592 ,  H01J2237/31776

Abstract: A method for estimating a lifetime of a cathode in an electron beam lithography apparatus according to an embodiment, includes: calculating emittance of the cathode by using a lifetime reference value of the cathode; calculating an emitter lifetime diameter of the cathode by using the emittance; writing a pattern on a target object by using an electron beam emitted from the cathode; measuring emission current of the electron beam; calculating an emitter diameter by using the emission current; determining a regression formula of a change with time of the emitter diameter; and estimating the lifetime of the cathode by using the regression formula and the emitter lifetime diameter.

Abstract translation: 根据实施例的用于估计电子束光刻设备中的阴极的寿命的方法包括：通过使用阴极的寿命参考值来计算阴极的发射率; 通过使用发射率计算阴极的发射极寿命直径; 通过使用从阴极发射的电子束在目标物体上写入图案; 测量电子束的发射电流; 通过使用发射电流计算发射体直径; 确定发射体直径随时间变化的回归公式; 并通过使用回归公式和发射极寿命直径来估计阴极的寿命。