公开(公告)号：US20240355581A1

公开(公告)日：2024-10-24

申请号：US18383422

申请日：2023-10-24

Applicant: Integrated Dynamic Electron Solutions, Inc. ,  The Provost, Fellows, Foundation Scholars, and the other members of Board, of the College of the Hol

Inventor： Bryan Walter REED ,  Lewys JONES

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/1477 ,  H01J37/222 ,  H01J37/244 ,  H01J2237/24495 ,  H01J2237/24535 ,  H01J2237/2802

Abstract: A method for measuring an electron signal or an electron induced signal may be provided. The method may include providing a threshold number of events or a threshold event rate for a pixel on a detector. The method may include collecting from the detector the threshold number of events or determining that the threshold event rate is achieved, wherein a signal at the detector is an electron signal or an electron induced signal from a sample. The method may include modulating an intensity of an electron source directed to the sample in response.

公开(公告)号：US20190139740A1

公开(公告)日：2019-05-09

申请号：US15803344

申请日：2017-11-03

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Eric D. Wilson ,  George M. Gammel ,  Sruthi Chennadi ,  Daniel Tieger ,  Shane Conley

IPC: H01J37/317 ,  H01J37/244

CPC classification number: H01J37/3171 ,  H01J37/244 ,  H01J2237/24405 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01J2237/30477 ,  H01J2237/31703

Abstract: An apparatus for monitoring of an ion beam. The apparatus may include a processor; and a memory unit coupled to the processor, including a display routine, where the display routine operative on the processor to manage monitoring of the ion beam. The display routine may include a measurement processor to receive a plurality of spot beam profiles of the ion beam, the spot beam profiles collected during a fast scan of the ion beam and a slow mechanical scan of a detector, conducted simultaneously with the fast scan. The fast scan may comprise a plurality of scan cycles having a frequency of 10 Hz or greater along a fast scan direction, and the slow mechanical scan being performed in a direction parallel to the fast scan direction. The measurement processor may also send a display signal to display at least one set of information, derived from the plurality of spot beam profiles.

公开(公告)号：US09852878B2

公开(公告)日：2017-12-26

申请号：US14747488

申请日：2015-06-23

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Kenichi Suematsu ,  Ryo Tajima ,  Kiwamu Tsukamoto ,  Kenji Terao ,  Shoji Yoshikawa

IPC: H01J37/20 ,  H01J37/22 ,  H01J37/305 ,  H01J37/30 ,  H01J37/302 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/226 ,  H01J37/3005 ,  H01J37/3023 ,  H01J37/3056 ,  H01J37/3177 ,  H01J2237/24535

Abstract: A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.

公开(公告)号：US09455123B2

公开(公告)日：2016-09-27

申请号：US14199110

申请日：2014-03-06

Applicant: NuFlare Technology, Inc.

Inventor： Kenichi Saito

IPC: H01J3/14 ,  H01J37/317 ,  H01J37/06 ,  H01J37/304

CPC classification number: H01J37/3177 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/06308 ,  H01J2237/0653 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01J2237/30477

Abstract: A current regulation method of multiple beams includes acquiring a current density distribution; selecting at least one beam whose current density is equal to or more than a threshold; measuring a current value of the at least one beam respectively by varying a voltage applied to the Wehnelt electrode and acquiring a correlation between the voltage and the current value; moving a stage to a position where the at least one beam is allowed to enter a current detector each time writing of a stripe region is completed; measuring, after moving the stage, a current value of the at least one beam while beams of the multiple beams whose current density is less than the threshold are blocked; operating a target voltage value applied to the Wehnelt electrode to cause the current value measured to be a target current value; and applying the target voltage value to the Wehnelt electrode.

Abstract translation: 多光束的电流调节方法包括获取电流密度分布; 选择电流密度等于或大于阈值的至少一个光束; 通过改变施加到Wehnelt电极的电压并获得电压和电流值之间的相关性，分别测量至少一个光束的电流值; 每次完成条纹区域的写入时，将舞台移动到允许至少一个光束进入电流检测器的位置; 在移动所述台后，测量所述至少一个光束的电流值，同时阻止所述多个光束的电流密度小于所述阈值的光束; 操作施加到所述Wehnelt电极的目标电压值，以将所测量的电流值作为目标电流值; 并将目标电压值施加到Wehnelt电极。

公开(公告)号：US09299534B2

公开(公告)日：2016-03-29

申请号：US14169488

申请日：2014-01-31

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： David Timberlake ,  Mark R. Amato ,  Nathan Roth

IPC: G21K1/00 ,  H01J37/317 ,  H01J37/244

CPC classification number: H01J37/3171 ,  H01J37/244 ,  H01J2237/0213 ,  H01J2237/24495 ,  H01J2237/24535

Abstract: A defining aperture plate having at least two differently sized apertures is used in conjunction with at least two charge collectors. Because of the difference in aperture width, the two charge collectors receive different amounts of ions, where the amount is proportional to the associated aperture width. By monitoring the ratio of the charge collected by the first charge collector to the charge collected by the second collector, the amount of erosion can be monitored and optionally compensated for.

Abstract translation: 具有至少两个不同尺寸的孔的限定孔板与至少两个电荷收集器结合使用。 由于孔径宽度的差异，两个电荷收集器接收不同量的离子，其中量与相关的孔径宽度成比例。 通过监测由第一收集器收集的电荷与由第二收集器收集的电荷的比率，可以监测和可选地补偿侵蚀量。

公开(公告)号：US09269532B2

公开(公告)日：2016-02-23

申请号：US14709200

申请日：2015-05-11

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hironori Mizoguchi ,  Hideo Inoue

IPC: G21K5/04 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/24514 ,  H01J2237/24535 ,  H01J2237/31776

Abstract: A charged particle beam writing apparatus includes a first limiting aperture member, in which a first opening is formed, to block a charged particle beam having been blanking-controlled to be beam “off”, and to let a part of the charged particle beam having been blanking-controlled to be beam “on” pass through the first opening, a first detector to detect a first electron amount irradiating the first limiting aperture member, in a state where beam “on” and beam “off” are repeated, a first integration processing unit to generate a first integrated signal by integrating components in a band sufficiently lower than a band of a repetition cycle of beam “on” and beam “off”, in a first detected signal detected for obtaining the first electron amount, and a first irregularity detection unit to detect irregularity in a dose amount of the charged particle beam by using the first integrated signal.

Abstract translation: 一种带电粒子束写入装置包括：第一限制孔径构件，其中形成有第一开口，以阻挡被消隐控制的带电粒子束以使其“离开”，并且使带电粒子束的一部分具有 被消隐控制为通过第一开口的光束“开”，在重复“光束”和光束“关”的状态下检测照射第一限制光圈部件的第一电子量的第一检测器，第一 积分处理单元，用于通过在被检测以获得第一电子量的第一检测信号中积分足够低于波束“开”的重复周期的波段和波束“截止”的波段的分量的分量来产生第一积分信号，以及 第一不规则检测单元，通过使用第一积分信号来检测带电粒子束的剂量的不均匀性。

公开(公告)号：US09263231B2

公开(公告)日：2016-02-16

申请号：US14050952

申请日：2013-10-10

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang

IPC: H01J37/20 ,  H01L21/26 ,  H01J37/244 ,  H01L21/265 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/24405 ,  H01J2237/24535 ,  H01J2237/30455 ,  H01J2237/30483 ,  H01L21/265

Abstract: An ion implant apparatus and moveable ion beam current sensor are described. Various examples provide moving the ion beam current sensor during an ion implant process such that a distance between the ion beam current sensor and a substrate is maintained during scanning of the ion beam toward the substrate. The ion beam current sensor is disposed on a moveable support configured to move the ion beam current sensor in a first direction corresponding to the scanning of the ion beam while the substrate is moved in a second direction.

Abstract translation: 描述了离子注入装置和可动离子束电流传感器。 各种示例提供了在离子注入过程期间移动离子束电流传感器，使得在离子束朝向衬底的扫描期间保持离子束电流传感器和衬底之间的距离。 离子束电流传感器设置在可移动支撑件上，可移动支撑件构造成在离子束扫描的第一方向上移动离子束电流传感器，同时衬底沿第二方向移动。

公开(公告)号：US20150235807A1

公开(公告)日：2015-08-20

申请号：US14700418

申请日：2015-04-30

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/20 ,  H01J37/304 ,  H01J2237/24535

Abstract: A multi charged particle beam writing apparatus of the present invention includes an aperture member to form multiple beams, a plurality of first deflectors to respectively perform blanking deflection of a corresponding beam, a second deflector to collectively deflect the multiple beams having passed through the plurality of openings of the aperture member so that the multiple beams do not reach the target object, a blanking aperture member to block each beam that has been deflected to be in the off state by the plurality of first deflectors, and a current detector, arranged at the blanking aperture member, to detect a current value of all beams in the on state in the multiple beams that have been deflected by the second deflector.

Abstract translation: 本发明的多带电粒子束写入装置包括一个用于形成多个光束的孔径部件，多个第一偏转器，分别对应于相应的光束进行消隐偏转;第二偏转器，共同偏转已经穿过多个光束的多个光束; 孔径构件的开口，使得多个光束不到达目标物体;消隐孔径构件，用于阻挡由多个第一偏转器偏转到处于关闭状态的每个光束;以及电流检测器，布置在 消除孔径构件，以检测由第二偏转器偏转的多个光束中的处于导通状态的所有光束的当前值。

公开(公告)号：US09111717B2

公开(公告)日：2015-08-18

申请号：US13845582

申请日：2013-03-18

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya Asahata ,  Yasuhiko Sugiyama ,  Hiroshi Oba

IPC: H01J37/10 ,  H01J37/302 ,  H01J37/305

CPC classification number: H01J37/10 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/0206 ,  H01J2237/04924 ,  H01J2237/216 ,  H01J2237/24535 ,  H01J2237/31749

Abstract: An ion beam apparatus includes an ion source configured to emit an ion beam, a condenser lens electrode that condenses the ion beam, and a condenser lens power source configured to apply a voltage to the condenser lens electrode. A storage portion stores a first voltage value, a second voltage value, a third voltage value, and a fourth voltage value. A control portion retrieves the third voltage value from the storage portion and sets the retrieved third voltage value to the condenser lens power source when an observation mode is switched to a wide-range observation mode, and retrieves the fourth voltage value from the storage portion and sets the retrieved fourth voltage value to the condenser lens power source when a processing mode is switched to the wide-range observation mode.

Abstract translation: 离子束装置包括被配置为发射离子束的离子源，冷凝离子束的聚光透镜电极和被配置为向聚光透镜电极施加电压的聚光透镜电源。 存储部分存储第一电压值，第二电压值，第三电压值和第四电压值。 当观察模式切换到大范围观察模式时，控制部分从存储部分检索第三电压值，并将获取的第三电压值设置为聚光透镜电源，并从存储部分检索第四电压值， 当处理模式切换到大范围观察模式时，将检索到的第四电压值设置为聚光透镜电源。

公开(公告)号：US08692216B2

公开(公告)日：2014-04-08

申请号：US13839753

申请日：2013-03-15

Applicant: Sen Corporation

Inventor： Hiroyuki Kariya ,  Masaki Ishikawa ,  Yoshiaki Inda ,  Takeshi Kurose ,  Takanori Yagita ,  Toshio Yumiyama

IPC: H01J37/147 ,  H01L21/265 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/147 ,  H01J37/304 ,  H01J2237/24521 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01L21/265 ,  H01L21/67213

Abstract: A vertical profile, a horizontal profile, and an integrated current value of an ion beam are measured by a plurality of stationary beam measuring instruments and a movable or stationary beam measuring device. At a beam current adjustment stage before ion implantation, a control device simultaneously performs at least one of adjustment of a beam current to a preset value of the beam current, adjustment of a horizontal beam size that is necessary to secure uniformity of the horizontal ion beam density, and adjustment of a vertical beam size that is necessary to secure the uniformity of the vertical ion implantation distribution on the basis of a measurement value of the stationary beam measuring instruments and the movable or stationary beam measuring device.

Abstract translation: 通过多个静止光束测量仪器和可移动或静止的光束测量装置测量离子束的垂直分布，水平分布和积分电流值。 在离子注入之前的光束电流调节阶段，控制装置同时执行将束电流调节到束电流的预设值中的至少一个，调整水平射束尺寸，以确保水平离子束的均匀性 基于静止光束测量仪器和可动或静止光束测量装置的测量值确保垂直离子注入分布的均匀性所必需的垂直光束尺寸的密度和密度和调整。