公开(公告)号：US20240128048A1

公开(公告)日：2024-04-18

申请号：US18393170

申请日：2023-12-21

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Ingo Mueller ,  Nicolas Kaufmann ,  Michael Behnke ,  Hans Fritz

IPC: H01J37/24 ,  H01J37/12 ,  H01J37/26

CPC classification number: H01J37/243 ,  H01J37/12 ,  H01J37/261 ,  H01J2237/0435 ,  H01J2237/24564

Abstract: A method for operating a multi-beam particle microscope which operates using a plurality of individual charged particle beams, wherein the method includes the following steps: measuring the beam current; determining a deviation of the measured beam current from a nominal beam current; decomposing the determined deviation into a drift component and into a high-frequency component; and controlling the high-frequency component of the beam current via a first closed-loop beam current control mechanism and/or compensating an effect of the high-frequency component on a recording quality of the multi-beam particle microscope using different mechanism than a closed-loop beam current control mechanism. An electrostatic control lens arranged in the beam generating system between extractor and anode can be used as first closed-loop beam current control mechanism. Adapting an extractor voltage of the beam generating system can be avoided.

公开(公告)号：US20230411112A1

公开(公告)日：2023-12-21

申请号：US18201536

申请日：2023-05-24

Applicant: Integrated Dynamic Electron Solutions, Inc.

Inventor： Ruth Shewmon BLOOM ,  Bryan Walter REED ,  Daniel Joseph MASIEL ,  Sang Tae PARK

IPC: H01J37/24 ,  H01J37/29 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/243 ,  H01J37/292 ,  H01J37/28 ,  H01J37/147

Abstract: A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.

公开(公告)号：US11728128B2

公开(公告)日：2023-08-15

申请号：US17825261

申请日：2022-05-26

Applicant: Integrated Dynamic Electron Solutions, Inc.

Inventor： Ruth Shewmon Bloom ,  Bryan Walter Reed ,  Daniel Joseph Masiel ,  Sang Tae Park

IPC: H01J37/24 ,  H01J37/29 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/243 ,  H01J37/147 ,  H01J37/28 ,  H01J37/292

Abstract: A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.

公开(公告)号：US11646171B2

公开(公告)日：2023-05-09

申请号：US17536025

申请日：2021-11-27

Applicant: Plasma-Therm NES LLC

Inventor： Sarpangala Hariharakeshava Hegde ,  Vincent Lee

IPC: H01J37/147 ,  H01J37/32 ,  H01J37/24 ,  H01L21/3065

CPC classification number: H01J37/1474 ,  H01J37/243 ,  H01J37/32715 ,  H01L21/3065 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20228 ,  H01J2237/3323 ,  H01J2237/3341

Abstract: The present disclosure provides a method to adjust asymmetric velocity of a scan in a scanning ion beam etch process to correct asymmetry of etching between the inboard side and the outboard side of device structures on a wafer, while maintaining the overall uniformity of etch across the full wafer.

公开(公告)号：US09901751B1

公开(公告)日：2018-02-27

申请号：US15250012

申请日：2016-08-29

Applicant: Pyramid Technical Consultants Inc.

Inventor： Raymond P. Boisseau ,  John S. Gordon ,  Andrew Dart ,  Julia C. Nett

IPC: A61N5/10 ,  H05K5/02 ,  H05K5/00 ,  H05K5/04 ,  H05K9/00 ,  H01J37/24

CPC classification number: A61N5/1075 ,  A61N5/1048 ,  A61N2005/1034 ,  A61N2005/1087 ,  H01J37/243 ,  H05K5/0026 ,  H05K5/0247 ,  H05K5/04 ,  H05K9/0049

Abstract: A multi-layer charged particle beam characterization system is disclosed, and method for using the same. A typical embodiment includes a plurality of two-sided metal plates, arranged as a stack, each metal plate having an electrical contact tab extending from at least one common edge of the metal plate, and a plurality of insulator films disposed between adjacent metal plates, each insulator film sized to match its corresponding metal plate. The tabs are coupled to a printed circuit board and connected to an external electrical connector to register a number of metal plates and insulator layers through which a charged particle beam has penetrated.

公开(公告)号：US20170186582A1

公开(公告)日：2017-06-29

申请号：US14979583

申请日：2015-12-28

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： HERRE TJERK STEENSTRA

IPC: H01J37/24 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/243 ,  G03F7/2059 ,  G05B2219/45028 ,  G06F1/14 ,  G06F13/40 ,  H01J37/00 ,  H01J37/045 ,  H01J37/3174 ,  H04J3/0638 ,  H04L7/0008

Abstract: A method for initializing a first operation in a first module at a first start time value in a first time base, the method comprising generating a clock signal, generating a second time base in the first module based on the clock signal, determining a second sync value in the second time base, determining a first sync value in the first time base corresponding to a second sync value in the second time base, determining a start trigger value in the second time base based on the first sync value and the start time value in the first time base, and initializing the first operation in the first module based on the start trigger value and a current value of the second time base in the first module.

公开(公告)号：US20160238636A1

公开(公告)日：2016-08-18

申请号：US15040532

申请日：2016-02-10

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： MASAYUKI ITO

IPC: G01R19/00 ,  H01J37/317

CPC classification number: G01R19/0061 ,  H01J37/243 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/06308 ,  H01J2237/24521 ,  H01J2237/24535 ,  H01J2237/24592 ,  H01J2237/31776

Abstract: A method for estimating a lifetime of a cathode in an electron beam lithography apparatus according to an embodiment, includes: calculating emittance of the cathode by using a lifetime reference value of the cathode; calculating an emitter lifetime diameter of the cathode by using the emittance; writing a pattern on a target object by using an electron beam emitted from the cathode; measuring emission current of the electron beam; calculating an emitter diameter by using the emission current; determining a regression formula of a change with time of the emitter diameter; and estimating the lifetime of the cathode by using the regression formula and the emitter lifetime diameter.

Abstract translation: 根据实施例的用于估计电子束光刻设备中的阴极的寿命的方法包括：通过使用阴极的寿命参考值来计算阴极的发射率; 通过使用发射率计算阴极的发射极寿命直径; 通过使用从阴极发射的电子束在目标物体上写入图案; 测量电子束的发射电流; 通过使用发射电流计算发射体直径; 确定发射体直径随时间变化的回归公式; 并通过使用回归公式和发射极寿命直径来估计阴极的寿命。

公开(公告)号：US20160211114A1

公开(公告)日：2016-07-21

申请号：US15001717

申请日：2016-01-20

Applicant: NuFlare Technology, Inc.

Inventor： Hideyuki IWATA

IPC: H01J37/24 ,  G01R19/00 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/243 ,  G01R19/0061 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/2443 ,  H01J2237/24535

Abstract: A current quantity measuring method of multi-beams irradiates with a charged particle beam, amplifies an electric signal corresponding to multi-beams passed through a plurality of aperture holes of an aperture member having the plurality of aperture holes to form multi-beams by irradiation with the charged particle beam, receives the electric signal amplified in the minute current measurement unit and counting the number of electrons in the multi-beams, calculates a current quantity of the multi-beams passed through the plurality of aperture holes by using a product of the calculated number of electrons in the multi-beams and elementary charge, and corrects irradiation time of the charged particle beam of each of the plurality of aperture holes on the basis of the calculated current quantity.

Abstract translation: 利用带电粒子束照射的多光束的电流量测量方法，放大与通过具有多个孔眼的孔部件的多个孔径对应的多光束的电信号，以通过照射而形成多光束 带电粒子束接收在微电流测量单元中放大的电信号并对多光束中的电子数进行计数，通过使用该多光束的乘积来计算通过多个孔眼的多光束的电流量 计算多光束和基本电荷中的电子数，并且基于计算的电流量校正多个孔径中的每一个的带电粒子束的照射时间。

公开(公告)号：US09383208B2

公开(公告)日：2016-07-05

申请号：US13650442

申请日：2012-10-12

Applicant: Analog Devices, Inc.

Inventor： Pritiraj Mohanty

IPC: G04C3/10 ,  G01C21/16 ,  H03B5/30 ,  G01R33/028 ,  G01P15/097 ,  H01J37/24 ,  H01J37/147 ,  G01R33/07 ,  G01C17/28

CPC classification number: G01C21/165 ,  G01C17/28 ,  G01P15/097 ,  G01R33/0286 ,  G01R33/072 ,  H01J37/147 ,  H01J37/243 ,  H03B5/30

Abstract: A system that incorporates the subject disclosure may include, for example, a method for producing an electrical signal from an apparatus comprising an induction coil coupled to a mechanical resonator, wherein the electrical signal has an operating frequency proportional to a mechanical resonating frequency of the mechanical resonator and proportional to a change in a magnetic flux resulting from a change in orientation in the apparatus, detecting with a detection circuit a change in the electrical signal resulting from a change in the magnetic flux caused by the change in orientation in the apparatus, and determining a direction of the apparatus according to the change in the electrical signal. Other embodiments are disclosed.

Abstract translation: 结合本公开的系统可以包括例如从包括耦合到机械谐振器的感应线圈的装置产生电信号的方法，其中电信号具有与机械谐振频率成比例的工作频率 谐振器，并且与装置中的取向变化产生的磁通量的变化成比例，用检测电路检测由于装置中的取向的变化引起的磁通量的变化而导致的电信号的变化，以及 根据电信号的变化确定装置的方向。 公开了其他实施例。

公开(公告)号：US20160111249A1

公开(公告)日：2016-04-21

申请号：US14882297

申请日：2015-10-13

Applicant: Gatan, Inc.

Inventor： John Andrew Hunt ,  Steven Thomas Coyle ,  Michael Patrick Hassel-Shearer ,  Thijs C. Hosman

IPC: H01J37/24 ,  G01N1/44 ,  H01J37/317 ,  H01J37/305 ,  H01J37/08 ,  H01J37/304

CPC classification number: H01J37/243 ,  G01N1/44 ,  H01J37/08 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/081 ,  H01J2237/24514 ,  H01J2237/24535 ,  H01J2237/30483 ,  H01J2237/31 ,  H01J2237/3151 ,  H01J2237/316

Abstract: Disclosed are embodiments of an ion beam sample preparation and coating apparatus and methods. A sample may be prepared in one or more ion beams and then a coating may be sputtered onto the prepared sample within the same apparatus. A vacuum transfer device may be used with the apparatus in order to transfer a sample into and out of the apparatus while in a controlled environment. Various methods to improve preparation and coating uniformity are disclosed including: rotating the sample retention stage; modulating the sample retention stage; variable tilt ion beam irradiating means, more than one ion beam irradiating means, coating thickness monitoring, selective shielding of the sample, and modulating the coating donor holder.

Abstract translation: 公开了离子束样品制备和涂布装置和方法的实施方案。 可以在一个或多个离子束中制备样品，然后在相同的装置内将涂层溅射到制备的样品上。 真空转移装置可以与该装置一起使用，以便在受控环境中将样品转入和移出装置。 公开了改善制备和涂布均匀性的各种方法，包括：旋转样品保留阶段; 调节样品保留期; 可变倾斜离子束照射装置，多于一个离子束照射装置，涂层厚度监测，样品的选择性屏蔽以及调节涂层供体保持器。