-
公开(公告)号:US20240234222A9
公开(公告)日:2024-07-11
申请号:US18048972
申请日:2022-10-24
Applicant: NXP B.V.
Inventor: Kuan-Hsiang Mao , Zhiwei Gong , Neil Thomas Tracht
IPC: H01L23/04 , H01L21/56 , H01L23/00 , H01L23/31 , H01L23/538
CPC classification number: H01L23/041 , H01L21/56 , H01L23/3157 , H01L23/5383 , H01L24/16 , H01L2224/16227
Abstract: A method of forming a semiconductor device is provided. The method includes forming a first cavity at a first major surface of a first encapsulant. A first semiconductor die is affixed on the first major surface of the first encapsulant and a second semiconductor die is affixed on a bottom surface of the first cavity. A second encapsulant encapsulates the first semiconductor die, the second semiconductor die, and at least exposed portions of the first major surface of the first encapsulant. A package substrate is formed on a first major surface of the second encapsulant. The package substrate includes conductive traces interconnected to the first semiconductor die and the second semiconductor die.
-
公开(公告)号:US20240136238A1
公开(公告)日:2024-04-25
申请号:US18048972
申请日:2022-10-23
Applicant: NXP B.V.
Inventor: Kuan-Hsiang Mao , Zhiwei Gong , Neil Thomas Tracht
IPC: H01L23/04 , H01L21/56 , H01L23/00 , H01L23/31 , H01L23/538
CPC classification number: H01L23/041 , H01L21/56 , H01L23/3157 , H01L23/5383 , H01L24/16 , H01L2224/16227
Abstract: A method of forming a semiconductor device is provided. The method includes forming a first cavity at a first major surface of a first encapsulant. A first semiconductor die is affixed on the first major surface of the first encapsulant and a second semiconductor die is affixed on a bottom surface of the first cavity. A second encapsulant encapsulates the first semiconductor die, the second semiconductor die, and at least exposed portions of the first major surface of the first encapsulant. A package substrate is formed on a first major surface of the second encapsulant. The package substrate includes conductive traces interconnected to the first semiconductor die and the second semiconductor die.
-