Head-up display apparatus
    1.
    发明授权
    Head-up display apparatus 失效
    平视显示装置

    公开(公告)号:US5162928A

    公开(公告)日:1992-11-10

    申请号:US737806

    申请日:1991-07-29

    IPC分类号: G02B27/00 G02B27/01

    摘要: A method of observing information includes the steps of converting a radiation beam into a visible harmonic beam conforming to the information and observing the information by the harmonic beam. An apparatus for observing information therethrough includes a source for producing a radiation beam conforming to the information, and a converter for converting the radiation beam into a visible harmonic beam, with the information being observed with the aid of the harmonic beam. In addition, a head-up display apparatus includes a source for producing a radiation beam conforming to information to be displayed, a converter for converting the radiation beam into a visible harmonic beam, and a beam combiner for receiving the harmonic beam and directing it in a predetermined direction to effect the display of the information by the harmonic beam.

    摘要翻译: 观察信息的方法包括以下步骤:将辐射束转换为符合信息的可见谐波光束,并通过谐波束观察信息。 用于观察信息的装置包括用于产生符合该信息的辐射束的源和用于将辐射束转换成可见谐波束的转换器,借助于谐波束观察信息。 此外,平视显示装置包括用于产生符合要显示的信息的辐射束的源,用于将辐射束转换成可见谐波束的转换器,以及用于接收谐波束并将其引导的光束组合器 预定的方向来实现由谐波束显示的信息。

    Diffraction device
    3.
    发明授权
    Diffraction device 失效
    衍射装置

    公开(公告)号:US5363220A

    公开(公告)日:1994-11-08

    申请号:US1405

    申请日:1993-01-07

    CPC分类号: G02B5/1857

    摘要: The present invention provides a diffraction device having a high diffraction efficiency with respect to a wide-band radiation beam. A diffraction device comprises a substrate and a diffraction grating formed on the substrate, wherein the diffraction grating is formed so that a full-width of wavelength at half maximum of a diffraction efficiency of a beam diffracted by the diffraction grating is not less than about 8% of a value of a center wavelength of the diffracted beam.

    摘要翻译: 本发明提供了相对于宽带辐射束具有高衍射效率的衍射装置。 衍射装置包括基板和形成在基板上的衍射光栅,其中衍射光栅被形成为使得由衍射光栅衍射的光束的衍射效率的最大波长的全宽不小于约8 衍射光束的中心波长的值的%。

    Display apparatus
    6.
    发明授权
    Display apparatus 失效
    显示装置

    公开(公告)号:US5035473A

    公开(公告)日:1991-07-30

    申请号:US355347

    申请日:1989-05-23

    IPC分类号: G02B27/01 G02B27/42 G09F9/00

    CPC分类号: G02B27/0103

    摘要: a display apparatus comprises, a display unit, a first diffraction grating for diffracting the light from the display unit, and a second diffraction grating for diffracting the diffracted light from the first diffraction grating, the apparatus being constructed in such a manner that the optical path length between the display unit and the first diffraction grating is shorter than that between the first and second diffraction gratings.

    摘要翻译: 显示装置包括显示单元,用于衍射来自显示单元的光的第一衍射光栅和用于衍射来自第一衍射光栅的衍射光的第二衍射光栅,该装置被构造成使得光路 显示单元和第一衍射光栅之间的长度比第一和第二衍射光栅之间的长度短。

    Photosensitive resin composition and method of preparing volume type
phase hologram member using same
    10.
    发明授权
    Photosensitive resin composition and method of preparing volume type phase hologram member using same 失效
    光敏树脂组合物及使用其制备体积型相位全息元件的方法

    公开(公告)号:US5418113A

    公开(公告)日:1995-05-23

    申请号:US25816

    申请日:1993-03-03

    CPC分类号: G03F7/001 G03F7/038

    摘要: A photosensitive resin composition comprises (a) a polyvinylcarbazole type polymer, (b) a halogen-containing compound and (c) or least one compound selected from the group consisting of a triarylhydrazyl, a triarylcarbonium type coloring matter having at least one carbazolyl group, and a reaction product of a styryl base with a halogenated carbon. A method of preparing a volume type hologram member comprises the steps of: subjecting a photosensitive material having a photosensitive layer comprising the photosensitive resin composition to exposure using a laser beam to form an interference pattern; and subjecting the photosensitive material thus exposed to light to development processing using a solvent.

    摘要翻译: 感光性树脂组合物包含(a)聚乙烯基咔唑型聚合物,(b)含卤素化合物和(c)或至少一种选自三芳基腙,具有至少一个咔唑基的三芳基碳鎓型着色剂的化合物, 和苯乙烯基与卤代碳的反应产物。 一种制备体积型全息图件的方法包括以下步骤:使用激光束对包含感光性树脂组合物的感光层的感光材料进行曝光,形成干涉图案; 并使用溶剂对曝光的光敏材料进行显影处理。