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公开(公告)号：US08780327B2
公开(公告)日：2014-07-15
申请号：US13064867
申请日：2011-04-21
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.
摘要翻译： 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。 该装置还包括清洁构件的清洁系统。
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公开(公告)号：US08125612B2
公开(公告)日：2012-02-28
申请号：US11603078
申请日：2006-11-22
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。
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公开(公告)号：US07995187B2
公开(公告)日：2011-08-09
申请号：US11767425
申请日：2007-06-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.
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公开(公告)号：US20080231825A1
公开(公告)日：2008-09-25
申请号：US12153234
申请日：2008-05-15
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.
摘要翻译： 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。 该装置还包括清洁构件的清洁系统。
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公开(公告)号：US20060077367A1
公开(公告)日：2006-04-13
申请号：US11284187
申请日：2005-11-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
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公开(公告)号：US08130363B2
公开(公告)日：2012-03-06
申请号：US12153357
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
摘要翻译： 液浸曝光装置包括光学元件，在曝光操作中将图案化的光束投射到基板上，液体供应系统具有供给端口，供给端口具有曝光液体，以及具有不同表面的部件 从底物。 在曝光操作中，液体供应系统将曝光液体从供给口提供到光学元件和基板之间的空间。 在清洁操作中，构件移动到构件的表面面向光学元件的位置，并且液体供应系统将曝光液体从供给口提供到光学元件与构件表面之间的空间 。
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公开(公告)号：US08004653B2
公开(公告)日：2011-08-23
申请号：US12153357
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
摘要： A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
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公开(公告)号：US08174668B2
公开(公告)日：2012-05-08
申请号：US11767425
申请日：2007-06-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.
摘要翻译： 光刻设备包括：保持基板的基板台，将图案化的辐射束投射到基板上的投影系统，投影系统具有邻近基板的最终光学元件;液体供应系统， 投影系统和衬底台，以及清洁衬底台的清洁系统。
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公开(公告)号：US08072576B2
公开(公告)日：2011-12-06
申请号：US11808231
申请日：2007-06-07
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板 投影光学系统的像平面附近。
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公开(公告)号：US20080225250A1
公开(公告)日：2008-09-18
申请号：US12153357
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
摘要翻译： 液浸曝光装置包括光学元件，在曝光操作中将图案化的光束投射到基板上，液体供应系统具有供给端口，供给端口具有曝光液体，以及具有不同表面的部件 从底物。 在曝光操作中，液体供应系统将曝光液体从供给口提供到光学元件和基板之间的空间。 在清洁操作中，构件移动到构件的表面面向光学元件的位置，并且液体供应系统将曝光液体从供给口提供到光学元件与构件表面之间的空间 。
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