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公开(公告)号：US09931728B2
公开(公告)日：2018-04-03
申请号：US14732497
申请日：2015-06-05
发明人： William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
CPC分类号： B24B37/24 , B24B37/16 , B24B37/205 , B24B37/22 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
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公开(公告)号：US09555518B2
公开(公告)日：2017-01-31
申请号：US14183894
申请日：2014-02-19
发明人： Ping Huang , Diane Scott , James P. LaCasse , William C. Allison
摘要： Polishing pads with multi-modal distributions of pore diameters are described. Methods of fabricating polishing pads with multi-modal distributions of pore diameters are also described.
摘要翻译： 描述了具有多孔分布孔径的抛光垫。 还描述了制造具有多孔分布的孔径的抛光垫的方法。
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公开(公告)号：US09931729B2
公开(公告)日：2018-04-03
申请号：US14727586
申请日：2015-06-01
摘要： Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of grooves disposed therein. A continuous polishing surface layer is attached to the pattern of grooves of the foundation layer. In another example, a polishing pad for polishing a substrate includes a foundation layer with a surface having a pattern of protrusions disposed thereon. Each protrusion has a top surface and sidewalls. A non-continuous polishing surface layer is attached to the foundation layer and includes discrete portions. Each discrete portion is attached to the top surface of a corresponding one of the protrusions of the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a grooved foundation layer are also described.
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