Systems and methods for rotor angle measurement in an electrical generator
    1.
    发明授权
    Systems and methods for rotor angle measurement in an electrical generator 有权
    发电机转子角度测量的系统和方法

    公开(公告)号:US08912792B2

    公开(公告)日:2014-12-16

    申请号:US13594269

    申请日:2012-08-24

    摘要: Disclosed herein are systems and methods for rotor angle measurement in an electrical generator. According to one embodiment, an intelligent electronic device may comprise control logic configured to generate a reference signal and to generate a rotational position signal based upon an indicator of a rotational position of a rotor in an electrical generator. The control logic may further be configured to detect a relative shift between the reference signal and the rotational position signal and to determine the rotational position of the rotor based upon the relative shift. A power angle of the electrical generator may be calculated based upon the rotational position of the rotor. According to certain embodiments, the control logic may further be configured to generate a control instruction to reduce the power angle in response to determining that the power angle exceeds a threshold.

    摘要翻译: 这里公开了用于发电机中的转子角度测量的系统和方法。 根据一个实施例,智能电子设备可以包括被配置为产生参考信号并且基于发电机中的转子的旋转位置的指示器产生旋转位置信号的控制逻辑。 控制逻辑还可以被配置为检测参考信号和旋转位置信号之间的相对移动,并且基于相对偏移来确定转子的旋转位置。 可以基于转子的旋转位置来计算发电机的功率角。 根据某些实施例,控制逻辑还可以被配置为响应于确定功率角超过阈值而产生控制指令以减小功率角。

    SYSTEMS AND METHODS FOR ROTOR ANGLE MEASUREMENT IN AN ELECTRICAL GENERATOR
    2.
    发明申请
    SYSTEMS AND METHODS FOR ROTOR ANGLE MEASUREMENT IN AN ELECTRICAL GENERATOR 有权
    电力发电机转子角度测量的系统和方法

    公开(公告)号:US20140055126A1

    公开(公告)日:2014-02-27

    申请号:US13594269

    申请日:2012-08-24

    IPC分类号: G01R21/00 G01B7/30

    摘要: Disclosed herein are systems and methods for rotor angle measurement in an electrical generator. According to one embodiment, an intelligent electronic device may comprise control logic configured to generate a reference signal and to generate a rotational position signal based upon an indicator of a rotational position of a rotor in an electrical generator. The control logic may further be configured to detect a relative shift between the reference signal and the rotational position signal and to determine the rotational position of the rotor based upon the relative shift. A power angle of the electrical generator may be calculated based upon the rotational position of the rotor. According to certain embodiments, the control logic may further be configured to generate a control instruction to reduce the power angle in response to determining that the power angle exceeds a threshold.

    摘要翻译: 这里公开了用于发电机中的转子角度测量的系统和方法。 根据一个实施例,智能电子设备可以包括被配置为产生参考信号并且基于发电机中的转子的旋转位置的指示器产生旋转位置信号的控制逻辑。 控制逻辑还可以被配置为检测参考信号和旋转位置信号之间的相对移动,并且基于相对偏移来确定转子的旋转位置。 可以基于转子的旋转位置来计算发电机的功率角。 根据某些实施例,控制逻辑还可以被配置为响应于确定功率角超过阈值而产生控制指令以减小功率角。

    Method and system for loading wafers
    3.
    发明授权
    Method and system for loading wafers 失效
    加载晶圆的方法和系统

    公开(公告)号:US4886412A

    公开(公告)日:1989-12-12

    申请号:US924075

    申请日:1986-10-28

    IPC分类号: H01L21/677

    摘要: A wafer transport system includes a mobile frame, a wafer cassette conveyor, a wafer support table, and a wafer transfer assembly. The wafer cassette conveyor carries a plurality of wafer cassettes and presents them successively to a transfer location. The wafer transport assembly, including a robotic arm and a vacuum pickup element, is then able to transport individual wafers from the cassettes to the support table. By rotating the support table, a plurality of wafers can be placed in a desired order. The wafer support table may then be moved to a location proximate a processing chamber, such as a chemical vapor deposition reactor, and processed and unprocessed wafers efficiently exchanged by the transport assembly.

    摘要翻译: 晶片输送系统包括移动框架,晶片盒式输送机,晶片支撑台和晶片转移组件。 晶片盒式输送机承载多个晶片盒并将它们连续呈现给转印位置。 包括机器臂和真空拾取元件的晶片传送组件然后能够将单个晶片从盒带传送到支撑台。 通过旋转支撑台,可以以期望的顺序放置多个晶片。 然后可以将晶片支撑台移动到靠近处理室的位置,例如化学气相沉积反应器,以及由运输组件有效交换的经处理和未处理的晶片。

    Reactor apparatus for semiconductor wafer processing
    4.
    发明授权
    Reactor apparatus for semiconductor wafer processing 失效
    用于半导体晶片处理的反应器装置

    公开(公告)号:US4694779A

    公开(公告)日:1987-09-22

    申请号:US662879

    申请日:1984-10-19

    CPC分类号: C23C16/54

    摘要: A basic cell for a carrier of semiconductor wafers to permit high-volume, cold wall chemical vapor deposition, including plasma-enhanced CVD. The basic cell has two surfaces, each bearing a wafer or wafers facing and tapering toward each other. Process gases are passed from the wider gap to the narrower gap between the surfaces. Basic cells may be arranged to form a circular carrier with process gases flowing inward to the center of the carrier for a high volume CVD reactor. The basic cell may also be used for plasma etching reactors.

    摘要翻译: 用于半导体晶片的载体的基本电池,以允许大容量的冷壁化学气相沉积,包括等离子体增强的CVD。 基本单元具有两个表面,每个表面具有朝向彼此面向和逐渐变细的晶片或晶片。 工艺气体从更宽的间隙传递到表面之间较窄的间隙。 基本单元可以被布置成形成圆形载体,其中工艺气体向内流动到用于大体积CVD反应器的载体的中心。 碱性电池也可用于等离子体蚀刻反应器。