公开(公告)号：US20060125755A1

公开(公告)日：2006-06-15

申请号：US11353952

申请日：2006-02-15

申请人： Noboru Noguchi ,  Hisashi Nagata ,  Toshihiro Matsumoto ,  Kazuhiko Tsuda ,  Makoto Kanbe ,  Akihiko Kojima

发明人： Noboru Noguchi ,  Hisashi Nagata ,  Toshihiro Matsumoto ,  Kazuhiko Tsuda ,  Makoto Kanbe ,  Akihiko Kojima

IPC分类号： G09G3/36

CPC分类号： G09G3/3614 ,  G09G3/3648 ,  G09G2300/0456 ,  G09G2320/0247

摘要： A liquid crystal display device includes: pixel electrodes arranged in columns and rows, each including a reflective electrode region; scanning lines; and signal lines. The device sequentially supplies a scanning signal voltage to one of the scanning lines after another to select one group of pixel electrodes, connected to the same one of the scanning lines, after another, and then supplies display signal voltages to the selected group of pixel electrodes by way of the signal lines, thereby displaying an image thereon. The pixel electrodes are arranged such that the polarity of a voltage to be applied to a liquid crystal layer is inverted for every predetermined number of pixel electrodes in each of the rows and in each of the columns. The display signal voltage to be supplied to each pixel electrode is updated at a frequency of 45 Hz or less.

公开(公告)号：US07843533B2

公开(公告)日：2010-11-30

申请号：US11353952

申请日：2006-02-15

申请人： Noboru Noguchi ,  Hisashi Nagata ,  Toshihiro Matsumoto ,  Kazuhiko Tsuda ,  Makoto Kanbe ,  Akihiko Kojima

发明人： Noboru Noguchi ,  Hisashi Nagata ,  Toshihiro Matsumoto ,  Kazuhiko Tsuda ,  Makoto Kanbe ,  Akihiko Kojima

IPC分类号： G02F1/1335 ,  G02F1/1343

CPC分类号： G09G3/3614 ,  G09G3/3648 ,  G09G2300/0456 ,  G09G2320/0247

摘要： A liquid crystal display device includes: pixel electrodes arranged in columns and rows, each including a reflective electrode region; scanning lines; and signal lines. The device sequentially supplies a scanning signal voltage to one of the scanning lines after another to select one group of pixel electrodes, connected to the same one of the scanning lines, after another, and then supplies display signal voltages to the selected group of pixel electrodes by way of the signal lines, thereby displaying an image thereon. The pixel electrodes are arranged such that the polarity of a voltage to be applied to a liquid crystal layer is inverted for every predetermined number of pixel electrodes in each of the rows and in each of the columns. The display signal voltage to be supplied to each pixel electrode is updated at a frequency of 45 Hz or less.

摘要翻译： 液晶显示装置包括：排列成行和列的像素电极，每个包括反射电极区域; 扫描线 和信号线。 该装置依次向扫描线之一依次提供扫描信号电压，以选择一组连续扫描线上的一组像素电极，然后将显示信号电压提供给所选择的像素电极组 通过信号线，从而在其上显示图像。 像素电极被布置为使得要施加到液晶层的电压的极性针对每行中的每一列中的每个预定数量的像素电极反转。 要提供给每个像素电极的显示信号电压以45Hz或更小的频率被更新。

公开(公告)号：US07084849B2

公开(公告)日：2006-08-01

申请号：US10244820

申请日：2002-09-17

申请人： Noboru Noguchi ,  Hisashi Nagata ,  Toshihiro Matsumoto ,  Kazuhiko Tsuda ,  Makoto Kanbe ,  Akihiko Kojima

发明人： Noboru Noguchi ,  Hisashi Nagata ,  Toshihiro Matsumoto ,  Kazuhiko Tsuda ,  Makoto Kanbe ,  Akihiko Kojima

IPC分类号： G09G3/36

CPC分类号： G09G3/3614 ,  G09G3/3648 ,  G09G2300/0456 ,  G09G2320/0247

摘要： A liquid crystal display device includes: pixel electrodes arranged in columns and rows, each including a reflective electrode region; scanning lines; and signal lines. The device sequentially supplies a scanning signal voltage to one of the scanning lines after another to select one group of pixel electrodes, connected to the same one of the scanning lines, after another, and then supplies display signal voltages to the selected group of pixel electrodes by way of the signal lines, thereby displaying an image thereon. The pixel electrodes are arranged such that the polarity of a voltage to be applied to a liquid crystal layer is inverted for every predetermined number of pixel electrodes in each of the rows and in each of the columns. The display signal voltage to be supplied to each pixel electrode is updated at a frequency of 45 Hz or less.

公开(公告)号：US07773179B2

公开(公告)日：2010-08-10

申请号：US12469841

申请日：2009-05-21

申请人： Toshihiro Matsumoto ,  Akihiko Kojima

发明人： Toshihiro Matsumoto ,  Akihiko Kojima

IPC分类号： G02F1/1335

CPC分类号： G02B5/3083 ,  G02B27/2214 ,  G02F1/13363 ,  G02F1/133753 ,  G02F1/13471 ,  G02F2413/09

摘要： First rubbing is performed on an entire surface of an alignment film provided on a substrate, and then a mask part for masking a first region and a region of an alignment mark is formed on the alignment film by using a resist layer. After performing second rubbing on the alignment film through the mask part, the mask part is removed, and a liquid crystal layer is formed on the alignment film. In this way, the alignment mark is formed as a region having an optical function different from an optical function of a region surrounding the alignment mark. Thus, it is possible to produce a substrate having an alignment mark formed without increasing processing steps at such a position as to contact the liquid crystal layer.

摘要翻译： 在设置在基板上的取向膜的整个表面上进行第一次摩擦，然后通过使用抗蚀剂层在取向膜上形成用于掩蔽第一区域和对准标记区域的掩模部分。 在通过掩模部分对取向膜进行第二次摩擦之后，除去掩模部分，并在取向膜上形成液晶层。 以这种方式，对准标记形成为具有不同于对准标记周围的区域的光学功能的光学功能的区域。 因此，可以在与液晶层接触的位置上制造具有不增加加工步骤的对准标记的基板。

公开(公告)号：US20090262268A1

公开(公告)日：2009-10-22

申请号：US12469841

申请日：2009-05-21

申请人： Toshihiro MATSUMOTO ,  Akihiko Kojima

发明人： Toshihiro MATSUMOTO ,  Akihiko Kojima

IPC分类号： G02F1/1337 ,  G02F1/13 ,  G02F1/1335

CPC分类号： G02B5/3083 ,  G02B27/2214 ,  G02F1/13363 ,  G02F1/133753 ,  G02F1/13471 ,  G02F2413/09

摘要： First rubbing is performed on an entire surface of an alignment film provided on a substrate, and then a mask part for masking a first region and a region of an alignment mark is formed on the alignment film by using a resist layer. After performing second rubbing on the alignment film through the mask part, the mask part is removed. and a liquid crystal layer is formed on the alignment film. In this way, the alignment mark is formed as a region having an optical function different from an optical function of a region surrounding the alignment mark. Thus, it is possible to produce a substrate having an alignment mark formed without increasing processing steps at such a position as to contact the liquid crystal layer.

摘要翻译： 在设置在基板上的取向膜的整个表面上进行第一次摩擦，然后通过使用抗蚀剂层在取向膜上形成用于掩蔽第一区域和对准标记区域的掩模部分。 在通过掩模部分对取向膜进行第二次摩擦之后，去除掩模部分。 并且在取向膜上形成液晶层。 以这种方式，对准标记形成为具有不同于对准标记周围的区域的光学功能的光学功能的区域。 因此，可以在与液晶层接触的位置上制造具有不增加加工步骤的对准标记的基板。

公开(公告)号：US07557871B2

公开(公告)日：2009-07-07

申请号：US10529233

申请日：2003-05-28

申请人： Toshihiro Matsumoto ,  Akihiko Kojima

发明人： Toshihiro Matsumoto ,  Akihiko Kojima

IPC分类号： G02F1/1335

CPC分类号： G02B5/3083 ,  G02B27/2214 ,  G02F1/13363 ,  G02F1/133753 ,  G02F1/13471 ,  G02F2413/09

摘要： First rubbing is performed on an entire surface of an alignment film (22) provided on a substrate (21), and then a mask part (51a) for masking a first region and a region of an alignment mark is formed on the alignment film (22) by using a resist layer (51). After performing second rubbing on the alignment film (22) through the mask part (51a), the mask part (51a) is removed, and a liquid crystal layer (23) is formed on the alignment film (22). In this way, the alignment mark is formed as a region having an optical function different from an optical function of a region surrounding the alignment mark.Thus, it is possible to produce a substrate (21) having an alignment mark formed without increasing processing steps at such a position as to contact the liquid crystal layer (23).

摘要翻译： 在设置在基板（21）上的取向膜（22）的整个表面进行第一次摩擦，然后在取向膜上形成用于掩蔽第一区域和对准标记区域的掩模部（51a） 22）通过使用抗蚀剂层（51）。 在通过掩模部分（51a）对取向膜（22）进行第二次摩擦之后，除去掩模部分（51a），并在取向膜（22）上形成液晶层（23）。 以这种方式，对准标记形成为具有不同于对准标记周围的区域的光学功能的光学功能的区域。 因此，可以在与液晶层（23）接触的位置处制造具有对准标记的基板（21），而不会增加处理步骤。

公开(公告)号：US20060164578A1

公开(公告)日：2006-07-27

申请号：US10529233

申请日：2003-05-28

申请人： Toshihiro Matsumoto ,  Akihiko Kojima

发明人： Toshihiro Matsumoto ,  Akihiko Kojima

IPC分类号： G02F1/1335

CPC分类号： G02B5/3083 ,  G02B27/2214 ,  G02F1/13363 ,  G02F1/133753 ,  G02F1/13471 ,  G02F2413/09

摘要： First rubbing is performed on an entire surface of an alignment film (22) provided on a substrate (21), and then a mask part (51a) for masking a first region and a region of an alignment mark is formed on the alignment film (22) by using a resist layer (51). After performing second rubbing on the alignment film (22) through the mask part (51a), the mask part (51a) is removed, and a liquid crystal layer (23) is formed on the alignment film (22). In this way, the alignment mark is formed as a region having an optical function different from an optical function of a region surrounding the alignment mark. Thus, it is possible to produce a substrate (21) having an alignment mark formed without increasing processing steps at such a position as to contact the liquid crystal layer (23).

摘要翻译： 在设置在基板（21）上的取向膜（22）的整个表面上进行第一次摩擦，然后在取向膜上形成用于掩蔽第一区域和对准标记区域的掩模部（51a） （22）通过使用抗蚀剂层（51）。 在通过掩模部分（51a）对取向膜（22）进行第二次摩擦之后，除去掩模部分（51a），并在取向膜（22）上形成液晶层（23）。 以这种方式，对准标记形成为具有不同于对准标记周围的区域的光学功能的光学功能的区域。 因此，可以在与液晶层（23）接触的位置处制造具有对准标记的基板（21），而不会增加处理步骤。

公开(公告)号：US08668784B2

公开(公告)日：2014-03-11

申请号：US13138119

申请日：2010-05-18

申请人： Yoshiyuki Watanabe ,  Kazuhiro Fukunaga ,  Akihiko Kojima ,  Ryuji Uemori ,  Rikio Chijiiwa

发明人： Yoshiyuki Watanabe ,  Kazuhiro Fukunaga ,  Akihiko Kojima ,  Ryuji Uemori ,  Rikio Chijiiwa

IPC分类号： C22C38/08 ,  C22C38/14 ,  C21D8/00

CPC分类号： C22C38/16 ,  C21D8/02 ,  C21D9/50 ,  C22C38/001 ,  C22C38/02 ,  C22C38/04 ,  C22C38/06 ,  C22C38/08 ,  C22C38/12 ,  C22C38/14

摘要： A steel for a welded structure includes the following composition: by mass %, C at a C content [C] of 0.015 to 0.045%; Si at a Si content [Si] of 0.05 to 0.20%; Mn at a Mn content [Mn] of 1.5 to 2.0%; Ni at a Ni content [Ni] of 0.10 to 1.50%; Ti at a Ti content [Ti] of 0.005 to 0.015%; O at an O content [O] of 0.0015 to 0.0035%; and N at a N content [N] of 0.002 to 0.006%, and a balance composed of Fe and unavoidable impurities. In the steel for a welded structure, the P content [P] is limited to 0.008% or less, the S content [S] is limited to 0.005% or less, the Al content [Al] is limited to 0.004% or less, the Nb content [Nb] is limited to 0.005% or less, the Cu content [Cu] is limited to 0.24% or less, the V content [V] is limited to 0.020% or less, and a steel composition parameter PCTOD is 0.065% or less, and a steel composition hardness parameter CeqH is 0.235% or less.

摘要翻译： 用于焊接结构的钢包括以质量％计的C含量[C]为C = 0.015〜0.045％的组成： Si含量[Si]为0.05〜0.20％的Si; Mn含量[Mn]为1.5〜2.0％的Mn; Ni量[Ni]为0.10〜1.50％的Ni; Ti含量[Ti]为0.005〜0.015％的Ti; O的含量[O]为0.0015〜0.0035％; N为N，0.002〜0.006％，余量由Fe和不可避免的杂质构成。 在焊接结构钢中，P含量[P]限制在0.008％以下，S含量[S]限制在0.005％以下，Al含量[Al]限定在0.004％以下， 将Nb含量[Nb]限制在0.005％以下，将Cu含量[Cu]限制在0.24％以下，将V含量[V]限制在0.020％以下，钢结构参数PCTOD为0.065 ％以下，钢组合物硬度参数CeqH为0.235％以下。

公开(公告)号：US20100160335A1

公开(公告)日：2010-06-24

申请号：US12452172

申请日：2008-06-18

申请人： Yasushi Kohno ,  Koji Ochiai ,  Satoshi Takita ,  Akihiko Kojima ,  Tomohiko Eiraku ,  Tetsuya Kishi

发明人： Yasushi Kohno ,  Koji Ochiai ,  Satoshi Takita ,  Akihiko Kojima ,  Tomohiko Eiraku ,  Tetsuya Kishi

IPC分类号： A61K31/50 ,  A61K31/501 ,  C07D403/00

CPC分类号： C07D413/14 ,  C07D401/14 ,  C07D403/14 ,  C07D405/14 ,  C07D409/14 ,  C07D417/14 ,  C07D471/04

摘要： It is to provide a novel pyridazinone derivative represented by the following general formula (1), which is useful as a pharmaceutical and has a phosphodiesterase inhibitory action: wherein R1 represents H or C1-6 alkyl, each of R2 and R3 represents H, X, C1-6 alkoxy, Z represents O or S, and A represents AA or BB, wherein AA represents: and BB represents: wherein R4 represents H or C1-6 alkyl, and each of R5 and R6 represents C1-6 alkyl.

摘要翻译： 提供由以下通式（1）表示的新的哒嗪酮衍生物，其可用作药物并具有磷酸二酯酶抑制作用：其中R1表示H或C1-6烷基，R2和R3各自表示H，X C 1-6烷氧基，Z表示O或S，A表示AA或BB，其中AA表示：BB表示：其中R4表示H或C1-6烷基，R5和R6各自表示C1-6烷基。

公开(公告)号：US20100008815A1

公开(公告)日：2010-01-14

申请号：US12448582

申请日：2008-12-04

申请人： Rikio Chijiiwa ,  Ryuji Uemori ,  Yoshiyuki Watanabe ,  Kazuhiro Fukunaga ,  Akihiko Kojima ,  Yoshihide Nagai

发明人： Rikio Chijiiwa ,  Ryuji Uemori ,  Yoshiyuki Watanabe ,  Kazuhiro Fukunaga ,  Akihiko Kojima ,  Yoshihide Nagai

IPC分类号： C22C38/16 ,  B22D11/00

CPC分类号： C22C38/50 ,  B23K9/18 ,  B23K9/23 ,  B23K2103/04 ,  C21D9/50 ,  C22C38/001 ,  C22C38/02 ,  C22C38/06 ,  C22C38/48 ,  C22C38/58

摘要： The present invention provides high strength steel having unprecedentedly superior CTOD (fracture toughness) properties satisfying not only the CTOD properties of the FL zone at −60° C., but also the CTOD properties of the ICHAZ zone in small and medium heat input multilayer welding etc. and a method of production of the same.The steel of the present invention is steel superior in CTOD properties of the heat-affected zone containing, by mass %, C: 0.015 to 0.045%, Si: 0.05 to 0.2%, Mn: 1.5 to 2.0%, Cu: 0.25 to 0.5%, Ni: 0.7 to 1.5%, P: 0.008% or less, S: 0.005% or less, Al: 0.004% or less, Ti: 0.005 to 0.015%, Nb: 0.005% or less, 0: 0.0015 to 0.0035%, and N: 0.002 to 0.006%, PCTOD: 0.065 or less, CeqH: 0.235 or less and the balance consisting of Fe and unavoidable impurities.

摘要翻译： 本发明提供了具有前所未有的优异的CTOD（断裂韧性）性能的高强度钢，其不仅满足-60℃下FL区域的CTOD性能，而且满足中小型热输入多层焊接中ICHAZ区域的CTOD特性 等等及其生产方法。 本发明的钢是热影响区的CTOD特性优异的钢，以质量％计含有C：0.015〜0.045％，Si：0.05〜0.2％，Mn：1.5〜2.0％，Cu：0.25〜0.5 ％，Ni：0.7〜1.5％，P：0.008％以下，S：0.005％以下，Al：0.004％以下，Ti：0.005〜0.015％，Nb：0.005％以下，0：0.0015〜0.0035％ ，N：0.002〜0.006％，PCTOD：0.065以下，CeqH：0.235以下，余量由Fe和不可避免的杂质构成。