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公开(公告)号：US6133178A
公开(公告)日：2000-10-17
申请号：US204160
申请日：1998-12-03
申请人： Nobusuke Yamada , Shinkichi Hashimoto , Koji Tsukuma , Tomoyuki Akiyama , Yoshikazu Kikuchi , Hideaki Segawa
发明人： Nobusuke Yamada , Shinkichi Hashimoto , Koji Tsukuma , Tomoyuki Akiyama , Yoshikazu Kikuchi , Hideaki Segawa
CPC分类号： C03C3/06 , C03B19/06 , C03B19/066 , C03B20/00 , C03C2201/23 , C03C2201/30 , C03C2201/50 , C03C2203/10
摘要： A high-purity transparent silica glass containing Fe, Na and K impurities each in an amount of 0.01-0.3 ppm, and an OH group in an amount of 0-3 ppm; among the Fe impurities, the content of metallic Fe having a valency of +0 being not larger than 0.1 ppm. This transparent silica glass exhibits, even when it is maintained at 900-1,400.degree. C. for at least 20 hours, an extinction coefficient of not larger than 0.009 at a wavelength of 400 nm, and does not become colored as visually examined. The silica glass is made by a process wherein powdery silica filled in a mold cavity is melted at 1,700.degree. C. or higher, characterized in that the melting is conducted in a graphite mold having a porous high-purity graphite layer provided on the mold inner surface so that the filled silica is not contacted with the mold; said porous layer having a bulk density of 0.1-1.5 g/cm.sup.3, and the content of each of Fe, Na and K impurities in the porous layer being not larger than 1 ppm.
摘要翻译： 含有0.01-0.3ppm的Fe，Na和K杂质的高纯度透明石英玻璃，0-3ppm的OH基; 在Fe杂质中，化合价为+0的金属Fe的含量不大于0.1ppm。 该透明石英玻璃即使在900-1400℃保持至少20小时，在波长400nm下的消光系数不大于0.009，并且在目视检查中不会着色。 二氧化硅玻璃是通过将填充在模腔中的粉状二氧化硅在1700℃以上熔融的方法制造的，其特征在于，熔融在具有设置在模具内部的多孔高纯度石墨层的石墨模具中进行 使填充的二氧化硅不与模具接触; 所述多孔层的堆积密度为0.1〜1.5g / cm 3，多孔层中的Fe，Na，K杂质的含量不大于1ppm。
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公开(公告)号：US5028967A
公开(公告)日：1991-07-02
申请号：US494393
申请日：1990-03-16
申请人： Nobusuke Yamada , Koji Tsukuma , Tetsuo Fujii , Hideaki Segawa , Shinichi Kondo , Keishi Honta
发明人： Nobusuke Yamada , Koji Tsukuma , Tetsuo Fujii , Hideaki Segawa , Shinichi Kondo , Keishi Honta
CPC分类号： C03C3/076 , C03C3/06 , C03C3/089 , G02B1/00 , G02B13/143 , C03C2201/10 , C03C2201/12 , C03C2201/31
摘要： An achromatic lens for ultraviolet rays constituted by (A) high-purity silica glass having a purity of 99.9% or more, or fluorine-containing, high-purity silica glass having a purity of 99.9% or more; and (B) silica glass containing germanium dioxide or silica glass containing germanium dioxide and boron oxide.
摘要翻译： 由（A）纯度为99.9％以上的高纯度二氧化硅玻璃或纯度为99.9％以上的含氟高纯度二氧化硅玻璃构成的紫外线消色差透镜; 和（B）含有二氧化锗或含有二氧化锗和氧化硼的二氧化硅玻璃的二氧化硅玻璃。
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公开(公告)号：US4938788A
公开(公告)日：1990-07-03
申请号：US291258
申请日：1988-12-28
申请人： Hideaki Segawa , Koji Tsukuma , Shinichi Kondo , Keishi Honta
发明人： Hideaki Segawa , Koji Tsukuma , Shinichi Kondo , Keishi Honta
IPC分类号： C03B20/00 , C03B19/06 , C03B19/09 , C03B32/00 , C03B37/012
CPC分类号： C03B37/01297 , C03B19/06 , C03B19/066 , C03B19/09 , C03B20/00 , C03B32/00 , C03B37/01282 , C03B2201/04 , Y10S65/90
摘要： A method of producing a uniform silica glass block comprising using silica powder as a raw material, and treating it at high temperature and pressure by a hot press and/or a hot isostatic press in vacuum or in an inert gas atmosphere, preferably with a capsule of silica glass or a high-melting point metal. By conducting calcination in fluorine, chlorine or their compound gas and then in oxygen, the OH group content of the silica glass can be reduced dramatically.
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公开(公告)号：US4981503A
公开(公告)日：1991-01-01
申请号：US488448
申请日：1990-02-27
CPC分类号： C03C23/007 , C03B32/00 , C03C17/22 , C03C17/225 , C03C2217/281 , C03C2217/282 , C03C2218/17
摘要： High-hardness silica glass having transparency substantially on the same level as silica glass and a Vickers hardness of 12-20 GPa is produced by covering silica glass with powder and treating the silica glass at a temperature of 1400.degree.-2500.degree. C. and a pressure of 10-300 MPa in an atmosphere of an inert gas or a nitrogen gas.
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