公开(公告)号：US20190203061A1

公开(公告)日：2019-07-04

申请号：US16323697

申请日：2017-08-08

Applicant: Osaka Soda Co., Ltd.

Inventor： Yuna HONMURA ,  Satoshi INOUE ,  Shinichiro OHASHI ,  Katsutoshi YOKOYAMA

IPC: C09D11/101 ,  C09D11/107 ,  C09D11/54

CPC classification number: C09D11/101 ,  C08F2/50 ,  C08F26/06 ,  C08F271/02 ,  C09D4/00 ,  C09D11/107 ,  C09D11/54 ,  C09D139/04

Abstract: The present invention provides a photocurable resin composition containing a polymer (A) which has excellent adhesion to plastic substrates. The present invention relates to a photocurable resin composition that contains a polymer (A) produced by polymerization of a compound represented by the following formula [I]: wherein each R1 may be the same or different and represents a hydrogen atom, a C1-C5 alkyl group, a glycidyl group, or the group —CH2—CR3═CHR2 wherein R2 and R3 each represent H or CH3, provided that at least one R1 is the group —CH2—CR3═CHR2.

公开(公告)号：US20170313795A1

公开(公告)日：2017-11-02

申请号：US15517850

申请日：2016-01-27

Applicant: Osaka Soda Co., Ltd.

Inventor： Katsutoshi YOKOYAMA ,  Shinichiro OHASHI ,  Satoshi INOUE

IPC: C08F20/40 ,  C09D129/06 ,  C08F2/48

CPC classification number: C08F20/40 ,  C08F2/44 ,  C08F2/48 ,  C08F118/16 ,  C08F120/40 ,  C08F122/26 ,  C09D4/06 ,  C09D11/101 ,  C09D11/106 ,  C09D129/06 ,  C09D131/06 ,  C08F267/06

Abstract: Provided is a photocurable resin composition containing an allylic polymer (A) which has excellent adhesion to plastic substrates. The present invention relates to a photocurable resin composition containing an allylic polymer (A), the allylic polymer (A) being produced by polymerization of an allylic compound represented by the following formula (I):

公开(公告)号：US20170313796A1

公开(公告)日：2017-11-02

申请号：US15517868

申请日：2016-01-27

Applicant: Osaka Soda Co., Ltd.

Inventor： Katsutoshi YOKOYAMA ,  Shinichiro OHASHI ,  Masahiro KOHARA ,  Satoshi INOUE

IPC: C08F20/40 ,  C09D129/06 ,  C08F2/48

CPC classification number: C08F20/40 ,  C08F2/44 ,  C08F2/48 ,  C08F222/26 ,  C08F263/06 ,  C08F291/00 ,  C09D7/40 ,  C09D11/101 ,  C09D11/106 ,  C09D129/06 ,  C09J131/02 ,  C08F2222/104 ,  C09D4/06 ,  C08L35/02 ,  C08L25/14 ,  C08L35/06

Abstract: An object of the present invention is to provide a photocurable resin composition that has excellent adhesion to plastic substrates and can form a composition with good compatibility. The present invention relates to a photocurable resin composition containing: an allylic polymer (A) produced by polymerization of an allylic compound represented by the formula (I) below; and a tackifier resin (B),

公开(公告)号：US20190135955A1

公开(公告)日：2019-05-09

申请号：US16204757

申请日：2018-11-29

Applicant: OSAKA SODA CO., LTD.

Inventor： Katsutoshi YOKOYAMA ,  Shinichiro OHASHI ,  Satoshi INOUE

IPC: C08F20/40 ,  C09D4/06 ,  C08F122/26 ,  C09D129/06 ,  C08F2/44 ,  C09D131/06 ,  C09D11/106 ,  C09D11/101 ,  C08F2/48

Abstract: Provided is a photocurable resin composition containing an allylic polymer (A) which has excellent adhesion to plastic substrates. The present invention relates to a photocurable resin composition containing an allylic polymer (A), the allylic polymer (A) being produced by polymerization of an allylic compound represented by the following formula (I):

公开(公告)号：US20190085111A1

公开(公告)日：2019-03-21

申请号：US16085432

申请日：2017-03-27

Applicant: OSAKA SODA CO., LTD.

Inventor： Shinichiro OHASHI ,  Katsutoshi YOKOYAMA ,  Satoshi INOUE

IPC: C08F222/26 ,  C08F2/44 ,  C08K5/14 ,  C08K5/23 ,  C08K5/56 ,  C08L33/14 ,  C09D11/101 ,  C09D11/106 ,  C09D7/40 ,  C09D129/06

Abstract: The present invention aims to provide a photocurable resin composition capable of constituting a composition having high printability. The present invention relates to a photocurable resin composition containing (A) an allylic polymer produced by polymerization of an allylic compound represented by the following formula (I), and (B) a gelling agent, wherein R1 and R2 each represent H or CH3; X represents an a-valent group having an unsubstituted saturated or partially unsaturated four- to eight-membered cyclic structure; and a represents 2 or 3.