公开(公告)号：US20240199898A1

公开(公告)日：2024-06-20

申请号：US18413284

申请日：2024-01-16

Applicant: CELGARD, LLC

Inventor： Michael B. Lane ,  Insik Jeon ,  Edward Kruger ,  Xiang Yu ,  Ronnie E. Smith ,  Stefan Reinartz ,  Junqing Ma

IPC: C09D7/65 ,  C09D5/18 ,  C09D7/20 ,  C09D129/04 ,  C09D133/04 ,  C09D139/04 ,  H01M10/0525 ,  H01M50/411 ,  H01M50/414 ,  H01M50/417 ,  H01M50/42 ,  H01M50/426 ,  H01M50/429 ,  H01M50/449 ,  H01M50/451 ,  H01M50/457 ,  H01M50/489

CPC classification number: C09D7/65 ,  C09D5/18 ,  C09D7/20 ,  C09D129/04 ,  C09D133/04 ,  C09D139/04 ,  H01M10/0525 ,  H01M50/411 ,  H01M50/414 ,  H01M50/417 ,  H01M50/42 ,  H01M50/426 ,  H01M50/429 ,  H01M50/449 ,  H01M50/451 ,  H01M50/457 ,  H01M50/489 ,  H01M2220/20

Abstract: New and/or improved coatings for porous substrates, including battery separators or separator membranes, and/or coated porous substrates, including coated battery separators, and/or batteries or cells including such coatings or coated separators, and/or related methods including methods of manufacture and/or of use thereof are disclosed. Also, new or improved coatings for porous substrates, including battery separators, which comprise at least a polymeric binder and heat-resistant particles with or without additional additives, materials or components, and/or to new or improved coated porous substrates, including battery separators, where the coating comprises at least a polymeric binder and heat-resistant particles with or without additional additives, materials or components are disclosed. Further, new or improved coatings for porous substrates, including battery separators, and new and/or improved coated porous substrates, including battery separators, new or improved coatings for porous substrates, including battery separators, which comprise at least (i) a polymeric binder, (ii) heat-resistant particles, and (iii) at least one component selected from the group consisting of a cross-linker, a low-temperature shutdown agent, an adhesion agent, and a thickener, and new and/or improved coated porous substrates, including battery separators, where the coating comprises at least (i) a polymeric binder, (ii) heat-resistant particles, and (iii) at least one component selected from the group consisting of a cross-linker, a low-temperature shutdown agent, an adhesion agent, a thickener, a friction-reducing agent, a high-temperature shutdown agent are disclosed.

公开(公告)号：US11884836B2

公开(公告)日：2024-01-30

申请号：US16651082

申请日：2019-02-28

Applicant: LG Chem, Ltd.

Inventor： Esder Kang ,  Jinseck Kim ,  Jaesoon Bae ,  Jaechol Lee ,  Hwakyung Kim ,  Daeho Kim

IPC: H01L51/00 ,  C09D139/04 ,  C08F126/12 ,  C08F112/14 ,  C09D125/18 ,  C08F112/32 ,  C08F12/32 ,  H10K85/10 ,  H10K50/11 ,  H10K50/15 ,  H10K50/17 ,  H10K71/00 ,  H10K71/15 ,  H10K71/40

CPC classification number: C09D139/04 ,  C08F12/32 ,  C08F112/26 ,  C08F112/32 ,  C08F126/12 ,  C09D125/18 ,  H10K85/111 ,  H10K50/11 ,  H10K50/15 ,  H10K50/17 ,  H10K71/00 ,  H10K71/15 ,  H10K71/441

Abstract: The present specification relates to a polymer including a unit represented by Formula 1, a coating composition including the same, and an organic light emitting device formed by using the same.

公开(公告)号：US20230295457A1

公开(公告)日：2023-09-21

申请号：US18042828

申请日：2021-07-28

Applicant: TOKYO OHKA KOGYO CO., LTD.

Inventor： Takahiro SENZAKI ,  Hisato SHIMIZU

IPC: C09D139/04 ,  C09D147/00

CPC classification number: C09D139/04 ,  C09D147/00

Abstract: A surface treatment liquid which adhesiveness of a component that achieves a surface treatment effect is good, and a desired surface treatment effect is easily obtained, and a surface treatment method using the surface treatment liquid are provided.
A surface treatment liquid including a resin (A) and a solvent (S), in which the resin (A) includes a constituent unit (a1) derived form a compound having a hydrophilic group and an ethylenic double bond and a constituent unit (a2) derived from a compound a nitrogen-containing heterocyclic group, an ethylenic double bond, and a specific type of polar group is used.

公开(公告)号：US11720023B2

公开(公告)日：2023-08-08

申请号：US17089259

申请日：2020-11-04

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Daisuke Kori ,  Takayoshi Nakahara ,  Yusuke Biyajima

IPC: G03F7/11 ,  C07D209/48 ,  C07D403/14 ,  C07D487/04 ,  C08F26/06 ,  C09D139/04 ,  G03F7/09 ,  H01L21/027 ,  H01L21/033 ,  H01L21/768

CPC classification number: G03F7/11 ,  C07D209/48 ,  C07D403/14 ,  C07D487/04 ,  C08F26/06 ,  C09D139/04 ,  G03F7/094 ,  H01L21/0273 ,  H01L21/0337 ,  H01L21/76819

Abstract: The present invention provides a material for forming an organic film, containing a compound shown by the following general formula (1), and an organic solvent, where X represents an organic group having a valency of n1 and 2 to 50 carbon atoms, n1 represents an integer of 1 to 10, and R1 represents at least one or more of the following general formulae (2) to (4). This aims to provide an organic film material for forming an organic film that has all of high filling property, high planarizing property, and excellent adhesive force to a substrate.

公开(公告)号：US20180329301A1

公开(公告)日：2018-11-15

申请号：US15775661

申请日：2016-11-02

Applicant: AZ Electronic Materrials (Luxembourg) S.a.r.l.

Inventor： Xiaowei WANG

IPC: G03F7/11 ,  G03F7/16 ,  G03F7/40 ,  G03F7/038 ,  C09D139/08

CPC classification number: G03F7/11 ,  C08L2201/56 ,  C09D139/04 ,  C09D139/08 ,  G03F7/038 ,  G03F7/16 ,  G03F7/168 ,  G03F7/405

Abstract: The present invention relates to a shrink material composition for fattening a resist pattern prepared from a negative-tone lithography process, comprising at least one polymer and at least one organic solvent, wherein the at least one polymer comprises at least one structural unit of a nitrogen heteroaromatic ring system.

公开(公告)号：US09982080B2

公开(公告)日：2018-05-29

申请号：US14374233

申请日：2013-03-05

Applicant: ADEKA CORPORATION

Inventor： Tetsuo Kamimoto ,  Satoshi Masuda ,  Fumihiko Sato ,  Yosuke Ishima

IPC: C08F2/46 ,  B32B27/18 ,  C08F290/00 ,  C09D4/02 ,  C09D7/12 ,  C09D201/00 ,  C08F226/06 ,  C08F2/50 ,  C09D5/32 ,  C09D139/04 ,  C07D251/24 ,  C08K5/3492 ,  C08F265/04 ,  C08F290/06 ,  C09D201/02 ,  C08F222/10 ,  C08F222/22

CPC classification number: C08F226/06 ,  C07D251/24 ,  C08F2/50 ,  C08F222/1006 ,  C08F265/04 ,  C08F290/067 ,  C08F2222/225 ,  C08K5/3492 ,  C09D5/32 ,  C09D7/48 ,  C09D139/04 ,  C09D201/02 ,  C08F222/22

Abstract: A photocurable composition contains at least one ultraviolet absorber represented by Formula (1), and a hard coating agent including the photocurable composition. wherein R1, R2 and R3 may be the same as or different from each other and represent a branched or linear alkyl group with 1-20 carbon atoms and is substituted with a (meth)acryloyloxy group; the alkyl group may be substituted with a hydroxyl group, an alkoxy group having 1-8 carbon atoms, or an acyloxy group having 1-8 carbon atoms; the alkyl group may be interrupted by an oxygen atom, a sulfur atom, a carbonyl group, an ester group, an amide group, or an imide group; and R4, R5 and R6 may be the same as or different from each other and represent a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group having 1-12 carbon atoms, or an alkoxy group having 1-12 carbon atoms.

公开(公告)号：US09821589B2

公开(公告)日：2017-11-21

申请号：US14779419

申请日：2014-03-25

Applicant: ISP INVESTMENTS INC.

Inventor： David K. Hood ,  Charles J. Wasserman ,  Karyn B. Visscher ,  Sounak Sarkar

IPC: C09D139/04 ,  B41M5/52 ,  C08F226/08 ,  C08F218/08 ,  C08F226/06 ,  C08F226/10 ,  C09D139/06 ,  C08F220/28

CPC classification number: B41M5/5254 ,  C08F218/08 ,  C08F226/06 ,  C08F226/08 ,  C08F226/10 ,  C08F2220/283 ,  C09D139/04 ,  C09D139/06

Abstract: The present invention provides coating composition for forming a toner receptive coating on a substrate containing a polymer comprising: (a) a N-vinyl amide monomer, (b) a vinyl acetate monomer, (c) a substituted or unsubstituted monomer comprising a cyclic ether, and (d) a solvent. The coating compositions may further comprise a (e) non-reactive hydrophobic monomer. The invention also provides substrates coated with the toner receptive coatings.

公开(公告)号：US09720324B2

公开(公告)日：2017-08-01

申请号：US15210025

申请日：2016-07-14

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Jun Hatakeyama ,  Koji Hasegawa

IPC: G03F7/004 ,  G03F7/30 ,  C08F18/20 ,  C08F220/28 ,  C08F220/60 ,  C08F224/00 ,  C08F226/02 ,  C08F228/02 ,  C08F228/06 ,  G03F7/039 ,  C08F222/40 ,  C08F222/20 ,  C08F216/14 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0392 ,  C08F18/20 ,  C08F216/1416 ,  C08F220/18 ,  C08F220/28 ,  C08F220/60 ,  C08F222/20 ,  C08F222/40 ,  C08F224/00 ,  C08F226/02 ,  C08F226/06 ,  C08F228/02 ,  C08F228/06 ,  C08F2222/404 ,  C08F2222/408 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/085 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/2053 ,  G03F7/30 ,  G03F7/325 ,  C08F2220/283 ,  C08F2220/1891 ,  C08F2220/1866 ,  C08F220/20 ,  C08F2220/1841 ,  C08F220/24 ,  C09D133/10 ,  C08L33/16 ,  C09D139/04 ,  C09D143/02

Abstract: A resist composition is provided comprising a polymer comprising recurring units (a) having an oxazolidinedione, thioxooxazolidinone, thiazolidinedione or thioxothiazolidinone structure and recurring unit (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group. The resist composition suppresses acid diffusion, exhibits a high resolution, and forms a pattern of satisfactory profile with low edge roughness.

公开(公告)号：US09663603B2

公开(公告)日：2017-05-30

申请号：US14123147

申请日：2012-05-31

Applicant: Tetsuya Noda ,  Fuminori Nakaya ,  Hajime Okutsu

Inventor： Tetsuya Noda ,  Fuminori Nakaya ,  Hajime Okutsu

IPC: C08F226/06 ,  C08F26/06 ,  C09D133/16 ,  C09D139/04 ,  C08F220/14 ,  C08F220/36 ,  C08F2/38 ,  C08F2/54 ,  C08F2/48 ,  C08F2/50 ,  C08F2/46

CPC classification number: C08F220/14 ,  C08F2/38 ,  C08F2/46 ,  C08F2/48 ,  C08F2/50 ,  C08F2/54 ,  C08F26/06 ,  C08F220/36 ,  C08F226/06 ,  C08J5/18 ,  C08J2333/12 ,  C08L2312/00 ,  C09D133/12 ,  C09D133/16 ,  C09D139/04 ,  C08F222/1006 ,  C08F220/60

Abstract: An object of the invention is to provide a curable composition having a HALS skeleton and capable of producing polymers having excellent weather resistance and outer appearance. The present invention provides a curable composition including at least a monomer component that contains a monomer (A) represented by a certain formula and a monomer (B) polymerizable with the monomer (A). In the curable composition, the content of the monomer (A) is 0.01 to 35 mol % in the monomer component, and the content of the monomer (B) is 65 to 99.99 mol % in the monomer component.

公开(公告)号：US09574106B2

公开(公告)日：2017-02-21

申请号：US14347474

申请日：2012-09-25

Applicant: MARUZEN PETROCHEMICAL CO., LTD.

Inventor： Yoshihisa Hayashida ,  Takuro Satsuka ,  Teruyo Ikeda

IPC: C09D139/04 ,  G02B1/12 ,  G02B1/10 ,  C08F2/50 ,  C08F226/12 ,  G02B1/04 ,  C08F222/10

CPC classification number: C09D139/04 ,  C08F2/50 ,  C08F222/1006 ,  C08F226/12 ,  G02B1/04 ,  G02B1/10 ,  G02B1/12 ,  C08L39/00 ,  C08L45/00 ,  C08F2220/1883 ,  C08F2222/1026 ,  C08F226/08 ,  C08F2220/301

Abstract: An optical element material which is obtained by curing a resin composition for photoimprinting containing a photocurable monomer (A) of the formula (1) and a photocurable monomer (B) of the formula (2) in a weight ratio of from 30/70 to 87/13, and containing a photopolymerization initiator (C) in a content of from 0.01 to 30 parts by weight per 100 parts by weight of the total weight of the monomer (A) and the monomer (B), and which has a shrinkage on curing of at most 4.5%, and a method for producing it: wherein R1 is —CH═CH2, —CH2CH2—O—CH═CH2, —CH2—C(CH3) ═CH2 or a glycidyl group; R2 and R3 are each independently hydrogen or a C1-4 alkyl group; R4 and R5 are each independently —O—CH═CH2, —O—CH2CH2—O—CH═CH2, —O—CO—CH═CH2, —O—CO—C(CH3)═CH2, —O—CH2CH2—O—CO—CH═CH2, —O—CH2CH2—O—CO—C(CH3)═CH2 or a glycidyl ether group; and R6 and R7 are each independently hydrogen or a C1-4 alkyl group.

Abstract translation: 本发明提供一种光学元件材料，其特征在于通过固化光密封用树脂组合物得到，其中由式（1）表示的光固化性单体（A）和式（2）表示的光固化性单体（B）的含量重量比为 30/70〜87/13，光聚合引发剂（C）的含量相对于100重量份的光固化性单体（A）和光固化性单体（B）的总计为0.01〜30重量份。 还提供了其制造方法。 式（1）中，R 1为-CH = CH 2，-CH 2 CH 2 -O-CH = CH 2，-CH 2 CH 2 -O-CO-CH = CH 2，-CH 2 CH 2 - O-CO-C（CH 3）= CH 2，-CH 2 -C（CH 3）= CH 2或缩水甘油基; R 2和R 3相同或不同，为氢或C 1-4烷基。 式（2）中，R 4和R 5相同或不同，-O-CH = CH 2，O-CH 2 CH 2 -O-CH = CH 2，-O-CO-CH = CH 2，O -CO-C（CH 3）= CH 2，-O-CH 2 CH 2 -O-CO-CH = CH 2，-O-CH 2 CH 2 -O-CO-C（CH 3）= CH 2或 缩水甘油醚基团。 R 6和R 7相同或不同，为氢或C 1-4烷基。