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公开(公告)号：US20210318270A1
公开(公告)日：2021-10-14
申请号：US17217527
申请日：2021-03-30
申请人： Onto Innovation Inc.
摘要： Systems and methods for inspecting or characterizing samples, such as by characterizing patterned features or structures of the sample. In an aspect, the technology relates to a method for characterizing a patterned structure of a sample. The method includes directing a pump beam to a first position on a surface of the sample to induce a surface acoustic wave in the sample and directing a probe beam to a second position on the sample, wherein the probe beam is affected by the surface acoustic wave when the probe beam reflects from the surface of the sample. The method also includes detecting the reflected probe beam, analyzing the detected reflected probe beam to identify a frequency mode in the reflected probe beam, and based on the identified frequency mode, determining at least one of a width or a pitch of a patterned feature in the sample.
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公开(公告)号：US20240329005A1
公开(公告)日：2024-10-03
申请号：US18612243
申请日：2024-03-21
申请人： Onto Innovation Inc.
CPC分类号： G01N29/2418 , G01N29/041 , G01N29/343 , G01N2291/0231 , G01N2291/055 , G01N2291/057
摘要： An opto-acoustic metrology device is configured to measure or inspect structures in a sample using both vertical and lateral transient perturbations. Multiple probe beams that have different locations of incidence may detect both the vertical and lateral transient perturbations produced by a pump beam, or a single probe beam may detect both the vertical and lateral transient perturbations produced by multiple pump beams that have different locations of incidence. The multiple probe beams or multiple pump beams are modulated with orthogonal waveforms, which allow the measurement of the different locations without interference from one another. The received signals are demodulated based on the orthogonal waveforms to recover the contributions to the received signals associated with each of the multiple probe beams or each of the multiple pump beams.
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公开(公告)号：US12092565B2
公开(公告)日：2024-09-17
申请号：US17613318
申请日：2020-05-22
申请人： Onto Innovation Inc.
发明人： Manjusha Mehendale , Marco Alves , Robin Mair
IPC分类号： G01N21/17
CPC分类号： G01N21/1702
摘要： Measuring or inspecting samples through non-destructive systems and methods. Multiple light pulses emitted from a light source. The light pulses are split into pump pulses and probe pulses. A first probe pulse reaches the surface of a sample after a first time duration after a first pump pulse reaches the surface. A second pump pulse reaches the surface after a time duration after the first probe pulse. When the second pump pulse reflects off the sample, the second pump pulse may be altered by an acoustic wave generated by the first probe pulse. The reflected second pump pulse may be analyzed to determine a characteristic of the sample.
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公开(公告)号：US11988641B2
公开(公告)日：2024-05-21
申请号：US17217527
申请日：2021-03-30
申请人： Onto Innovation Inc.
CPC分类号： G01N29/2418 , G01N29/06 , G01N2291/2697
摘要： Systems and methods for inspecting or characterizing samples, such as by characterizing patterned features or structures of the sample. In an aspect, the technology relates to a method for characterizing a patterned structure of a sample. The method includes directing a pump beam to a first position on a surface of the sample to induce a surface acoustic wave in the sample and directing a probe beam to a second position on the sample, where the probe beam is affected by the surface acoustic wave when the probe beam reflects from the surface of the sample. The method also includes detecting the reflected probe beam, analyzing the detected reflected probe beam to identify a frequency mode in the reflected probe beam, and based on the identified frequency mode, determining at least one of a width or a pitch of a patterned feature in the sample.
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5.发明公开公开(公告)号：US20240004311A1
公开(公告)日：2024-01-04
申请号：US18253581
申请日：2021-11-22
申请人： Onto Innovation Inc.
发明人： Manjusha Mehendale , George Andrew Antonelli , Priya Mukundhan , Robin A. Mair , Francis C. Vozzo
IPC分类号： G03F7/00
CPC分类号： G03F7/70633 , G03F7/706849
摘要： An alignment or overlay target that has an optically opaque layer disposed between the top and bottom target structure is measured using opto-acoustic metrology. A classifier library is generated for classifying whether an opto-acoustic metrology signal is on or off the bottom structure. A target may be measured by acquiring opto-acoustic measurement data for the bottom structure of the target and determining a location of the bottom structure using opto-acoustic metrology data acquired from the different locations over the bottom structure and the classifier library. Locations for acquisition of the data may be based on classification results of each measurement and a search pattern. The top structure of the target may be optically imaged. The relative position of the top structure with respect to the bottom structure is determined using the opto-acoustically determined location of the bottom structure and the image of the top structure.
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