公开(公告)号：US20250129514A1

公开(公告)日：2025-04-24

申请号：US18990573

申请日：2024-12-20

Applicant: PANASONIC HOLDINGS CORPORATION ,  OSAKA UNIVERSITY

Inventor： Tomio YAMASHITA ,  Yoshio OKAYAMA ,  Yusuke MORI ,  Masashi YOSHIMURA ,  Masayuki IMANISHI ,  Kousuke MURAKAMI

IPC: C30B25/20 ,  C30B29/40 ,  C30B29/66

Abstract: A method for manufacturing a Group III nitride crystal, the method including: bringing a surface of a Group III nitride seed crystal into contact with a melt including at least one Group III element selected from among gallium, aluminum, and indium and an alkali metal in an atmosphere containing nitrogen to cause the Group III element and the nitrogen to react with each other in the melt to grow a Group III nitride crystal on the Group III nitride seed crystal, the method includes: growing a plurality of island-like Group III nitride crystal nuclei on the surface of the Group III nitride seed crystal; growing a first Group III nitride crystal having an inverted triangular shape or a trapezoidal shape in section from each of the plurality of island-like Group III nitride crystal nuclei; and growing a second Group III nitride crystal such that the second Group III nitride crystal fills a depression of the first Group III nitride crystal to form the second Group III nitride crystal having a flat surface, wherein in the course of growing the plurality of island-like Group III nitride crystal nuclei, a temperature is set to 875° C. or more and a nucleation density is set to 1*106/cm2 or less, and in the course of growing the first Group III nitride crystal and growing the second Group III nitride crystal, immersion of the Group III nitride seed crystal in the melt and pulling up from the melt are repeated a plurality of times.