公开(公告)号：US20250011939A1

公开(公告)日：2025-01-09

申请号：US18712704

申请日：2022-11-21

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Young Heum EOM ,  Shin Goo KANG

IPC: C23C28/00 ,  C23C14/16 ,  C25D5/02 ,  C25D7/04 ,  C25D11/24 ,  G01R1/073

Abstract: The present invention provides an anodic oxidation film structure and a manufacturing method therefor, the anodic oxidation film structure comprising: a body made of an anodic oxidization film obtained by anodic oxidation on a parent metal and then removing the parent metal; a through-hole which is formed through the body and has a larger inner width than that of a pore formed during the anodic oxidation; and a metal layer provided on the inner wall of the through-hole, and thus improving the mechanical and/or electrical characteristics of the inner wall of the through-hole.