公开(公告)号：US20210223507A1

公开(公告)日：2021-07-22

申请号：US17153433

申请日：2021-01-20

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Young Heum EOM ,  Sin Seok HAN

IPC: G02B7/182 ,  G03F7/20 ,  G02B5/10 ,  G02B5/00 ,  G02B27/30

Abstract: Light emission apparatus for an exposure machine is proposed. The light emission apparatus includes: a supporter; a plurality of light emission units individually installed on a first surface of the supporter and each having a plurality of light emitters generating light; and a plurality of reflectors individually installed on the first surface of the supporter to correspond to the light emission units, respectively, in which the reflectors are divided into a first reflective group in which reference axes of reflective beams are horizontal and a second reflective group in which reference axes of reflective beams are inclined.

公开(公告)号：US20240118335A1

公开(公告)日：2024-04-11

申请号：US18485252

申请日：2023-10-11

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Seung Ho PARK ,  Young Heum EOM

IPC: G01R31/26 ,  G01R1/04 ,  H05K1/11

CPC classification number: G01R31/2635 ,  G01R1/0416 ,  H05K1/118 ,  H05K2201/10106

Abstract: Proposed are a test device and a manufacturing method of the test device capable of testing a test object that is provided with an electrode which has a size and/or a pitch distance ranging from 1 to 100 micrometers (μm).

公开(公告)号：US20250044321A1

公开(公告)日：2025-02-06

申请号：US18717410

申请日：2022-12-05

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Young Heum EOM ,  Sin Seok HAN

IPC: G01R1/067 ,  G01R1/073

Abstract: The present invention provides an electrically conductive contact pin for a Kelvin test and a test device comprising same, which can cope with the narrower pitch between electrodes of a semiconductor device.

公开(公告)号：US20250011939A1

公开(公告)日：2025-01-09

申请号：US18712704

申请日：2022-11-21

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Young Heum EOM ,  Shin Goo KANG

IPC: C23C28/00 ,  C23C14/16 ,  C25D5/02 ,  C25D7/04 ,  C25D11/24 ,  G01R1/073

Abstract: The present invention provides an anodic oxidation film structure and a manufacturing method therefor, the anodic oxidation film structure comprising: a body made of an anodic oxidization film obtained by anodic oxidation on a parent metal and then removing the parent metal; a through-hole which is formed through the body and has a larger inner width than that of a pore formed during the anodic oxidation; and a metal layer provided on the inner wall of the through-hole, and thus improving the mechanical and/or electrical characteristics of the inner wall of the through-hole.

公开(公告)号：US20220411340A1

公开(公告)日：2022-12-29

申请号：US17851061

申请日：2022-06-28

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Young Heum EOM ,  Tae Hwan SONG

IPC: C04B41/45 ,  H01L21/67 ,  C04B41/00 ,  C04B41/50 ,  C04B41/87 ,  C23C16/04 ,  C23C16/455 ,  C23C16/56

Abstract: Proposed are a part having a corrosion-resistant layer that minimizes peeling off and particle generation of a porous ceramic layer, a manufacturing process apparatus having the same, and a method of manufacturing the part.

公开(公告)号：US20240417856A1

公开(公告)日：2024-12-19

申请号：US18704378

申请日：2022-10-19

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Young Heum EOM ,  Jun Young CHOI

IPC: C23C16/458

Abstract: The present invention relates to a susceptor which seats a substrate on the upper surface thereof during a deposition process for the substrate, the susceptor comprising: a first plate; a second plate provided under the first plate; and a planar heater provided between the first and second plates, wherein the planar heater is in the form of a plane, and a heating pattern formed to have a large area corresponding to the area of the plane is provided inside the planar heater. Accordingly, the present invention provides a susceptor in which a uniform temperature is formed over the entire area thereof without the risk of disconnection.

公开(公告)号：US20240186533A1

公开(公告)日：2024-06-06

申请号：US18285852

申请日：2022-04-07

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Young Heum EOM ,  Sin Seok HAN

IPC: H01M4/90 ,  H01M4/86 ,  H01M8/10 ,  H01M8/1004

CPC classification number: H01M4/9016 ,  H01M4/8605 ,  H01M4/8657 ,  H01M8/1004 ,  H01M2008/1095

Abstract: The present invention provides a membrane-electrode assembly for a fuel cell, and a fuel cell comprising same, wherein the cross-sectional area for reaction activation can be increased compared to the prior art, and the reaction area can be made uniform for each product compared to the prior art by making reaction gases (H2 and O2) undergo an ionization process while reacting with catalyst material, provided on the inner walls of regularly arranged pores, while moving through channels following the pores.

公开(公告)号：US20240186116A1

公开(公告)日：2024-06-06

申请号：US18373279

申请日：2023-09-27

Applicant: POINT ENGINEERING CO., LTD.

Inventor： Bum Mo AHN ,  Young Heum EOM ,  Tae Hwan SONG

IPC: H01J37/32 ,  C23C16/455 ,  C25D11/18

CPC classification number: H01J37/3244 ,  C23C16/45563 ,  C25D11/18 ,  H01J2237/3321 ,  H01J2237/3323

Abstract: Proposed are a metal part used in a display or semiconductor manufacturing process and a process chamber having the part. More particularly, proposed are a metal part that enables a film of uniform thickness to be formed on a surface of a substrate to be processed due to high emissivity thereof, and a process chamber having the same.