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公开(公告)号:US20240428997A1
公开(公告)日:2024-12-26
申请号:US18824492
申请日:2024-09-04
Inventor: Naomi KURIHARA , Akihiro YAMAGUCHI , Mitsuhisa YOSHIMURA , Miwa OGAWA
Abstract: A film production method for producing a layer containing a metal oxide, the film production method including: a heating step of heating a metal foil containing a first metal by bringing a part of the metal foil into contact with at least one heat generator; a first contact step of letting first gas containing a second metal to be in contact with both surfaces of the metal foil in a state where the part of the metal foil is supported; and a second contact step of letting second gas containing an oxidant to be in contact with the both surfaces of the metal foil in a state where the part of the metal foil is supported.
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公开(公告)号:US20230360864A1
公开(公告)日:2023-11-09
申请号:US18246091
申请日:2021-09-27
Inventor: Mitsuhisa YOSHIMURA , Naomi KURIHARA , Miwa OGAWA , Akihiro YAMAGUCHI
CPC classification number: H01G13/00 , H01G9/07 , H01G9/0032
Abstract: A film-forming device disclosed is a film-forming device for forming a film on a metal foil having a porous portion on a main surface thereof by a gas phase method, and includes a film-forming region in which the film is formed on the metal foil, conveyors to provided downstream of the film-forming region and drawing the metal foil from the film-forming region, and a control unit that controls the stress applied to the metal foil from the conveyors to 21 N/mm2 or less. This provides a film-forming device which does not cause defects easily on a film-forming target metal foil.
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