公开(公告)号：US20180096824A1

公开(公告)日：2018-04-05

申请号：US15700600

申请日：2017-09-11

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Tetsuhiro IWAI ,  Motoko HARA

IPC: H01J37/32 ,  B08B7/00

CPC classification number: H01J37/32495 ,  B08B7/0035 ,  H01J37/32183 ,  H01J37/32513 ,  H01J37/32715 ,  H01J2237/2007 ,  H01J2237/334

Abstract: A plasma processing apparatus comprises a base including an electrode body having a seat surface for setting a substrate held on a conveying carrier, and a platform for supporting the electrode body, and a lid configured to be moved up and down relative to the base, wherein the lid is moved down and appressed on the platform to define a closed space and a plasma is generated within the closed space to implement a plasma processing for the substrate set on the seat surface. The substrate is held on the holding sheet and set on the seat surface with the holding sheet therebetween. The plasma processing apparatus further comprises a guide being provided along a circumference of the electrode body for alignment of the frame, and a cover provided with the lid for covering at least the frame of the conveying carrier when the closed space is defined.