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公开(公告)号:USD894823S1
公开(公告)日:2020-09-01
申请号:US29658451
申请日:2018-07-31
Designer: Naoki Yoshimura , Keiichiro Masuko , Daisuke Fujishima , Masato Shigematsu
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公开(公告)号:USD894824S1
公开(公告)日:2020-09-01
申请号:US29658454
申请日:2018-07-31
Designer: Naoki Yoshimura , Keiichiro Masuko , Daisuke Fujishima , Masato Shigematsu
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公开(公告)号:USD828292S1
公开(公告)日:2018-09-11
申请号:US29588350
申请日:2016-12-20
Designer: Naoki Yoshimura , Keiichiro Masuko , Daisuke Fujishima , Masato Shigematsu
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公开(公告)号:US20190181291A1
公开(公告)日:2019-06-13
申请号:US16279359
申请日:2019-02-19
Inventor: Tsuyoshi Takahama , Wataru Shinohara , Yoshinari Ichihashi , Naoki Yoshimura
IPC: H01L31/0747 , H01L31/0216 , H01L31/0224 , H01L31/18 , H01L31/20 , H01L21/268
Abstract: A method for manufacturing a solar cell, including: a step for irradiating a semiconductor substrate to cause the surface to become amorphous and to form an intrinsic amorphous layer, a first conductivity-type layer, and a second conductivity-type layer; and a step for introducing hydrogen into the intrinsic amorphous layer, the first conductivity-type layer, and the second conductivity-type layer.
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