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公开(公告)号:US11567069B2
公开(公告)日:2023-01-31
申请号:US17071578
申请日:2020-10-15
Inventor: Takashi Kanno , Hiroto Yanagawa
IPC: G01N33/543 , G01N21/64 , G01N33/553 , B82Y15/00 , G02B5/00
Abstract: One non-limiting and exemplary embodiment provides a metal microscopic structure capable of detecting a low-concentration analyte with high sensitivity. The metal microscopic structure includes a base member including multiple protrusions arrayed at predetermined intervals, and multiple projections made of a metal film covering the base member and configured to generate surface plasmons upon irradiation with light. A film thickness of the metal film positioned in a bottom portion of a gap between every adjacent two of the multiple projections is greater than a height of the multiple protrusions and is more than or equal to 90% and less than or equal to 100% of a film thickness of the metal film deposited on top portions of the multiple protrusions.