Diphasic Gas/Liquid Plasma Reactor
    1.
    发明申请

    公开(公告)号:US20180369778A1

    公开(公告)日:2018-12-27

    申请号:US16060605

    申请日:2016-12-09

    IPC分类号: B01J19/00 B01J19/08 B01J19/24

    摘要: The present invention relates to a microfluidic or millifluidic device (1) comprising: —a support (2) made at least partially of a dielectric material, the support (2) comprising a first inlet (21a) adapted to be connected to a first reservoir containing gas, a second inlet (21b) adapted to be connected to a second reservoir containing liquid, an outlet (22) adapted to be connected to a receiver container containing gas and/or liquid, and a main microchannel or millichannel (3) present in the dielectric material allowing the liquid and the gas to flow from the inlets towards the outlet, —one or several ground electrode(s) (4) embedded in said dielectric material and extending along the main microchannel or millichannel (3), and —one or several high-voltage electrode(s) (5) embedded fi in said dielectric material and extending along the main microchannel or millichannel (3), wherein the high-voltage electrode(s) (5) and the ground electrode(s) (4) are located on opposite sides of the main microchannel or millichannel (3) so as to be able to generate an electric field inside the main microchannel or millichannel (3). The present invention relates also to a method for generating a plasma in a continuous manner using such a microfluidic or millifluidic device (1).

    Diphasic gas/liquid plasma reactor

    公开(公告)号:US11253835B2

    公开(公告)日:2022-02-22

    申请号:US16060605

    申请日:2016-12-09

    IPC分类号: B01J19/00 B01J19/08 B01J19/24

    摘要: The present invention relates to a microfluidic or millifluidic device (1) comprising: —a support (2) made at least partially of a dielectric material, the support (2) comprising a first inlet (21a) adapted to be connected to a first reservoir containing gas, a second inlet (21b) adapted to be connected to a second reservoir containing liquid, an outlet (22) adapted to be connected to a receiver container containing gas and/or liquid, and a main microchannel or millichannel (3) present in the dielectric material allowing the liquid and the gas to flow from the inlets towards the outlet, —one or several ground electrode(s) (4) embedded in said dielectric material and extending along the main microchannel or millichannel (3), and —one or several high-voltage electrode(s) (5) embedded in said dielectric material and extending along the main microchannel or millichannel (3), wherein the high-voltage electrode(s) (5) and the ground electrode(s) (4) are located on opposite sides of the main microchannel or millichannel (3) so as to be able to generate an electric field inside the main microchannel or millichannel (3). The present invention relates also to a method for generating a plasma in a continuous manner using such a microfluidic or millifluidic device (1).