公开(公告)号：US20050030507A1

公开(公告)日：2005-02-10

申请号：US10892395

申请日：2004-07-16

申请人： Paulus Antonius Teunissen ,  Gerrit Nijmeijer ,  Rene Marinus Queens ,  Frank Staals ,  Robert Van Wijk ,  Roeland Nicolaas Vanneer

发明人： Paulus Antonius Teunissen ,  Gerrit Nijmeijer ,  Rene Marinus Queens ,  Frank Staals ,  Robert Van Wijk ,  Roeland Nicolaas Vanneer

IPC分类号： G03F9/00 ,  G03B27/52

CPC分类号： G03F9/7019 ,  G03F9/7034

摘要： According to one embodiment, a method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes using a first lithographic projection apparatus to measure a first set of leveling data for a reference substrate and a second set of leveling data for a substrate processed according to a selected process, and using a second lithographic projection apparatus to measure a third set of leveling data for the reference substrate and a fourth set of leveling data for the processed substrate. The method also includes calculating, based on the first, second, third and fourth sets of leveling data, a set of level sensor parameters corresponding to machine to machine level sensor differences for the selected process, wherein the machine to machine level sensor differences are measured and stored as intrafield values.

摘要翻译： 根据一个实施例，一种校准至少两个光刻投影设备的水平传感器以校正机器与机器水平传感器处理依赖性的方法包括使用第一光刻投影设备来测量参考基板和第二组的第一组调平数据 根据所选择的工艺处理的衬底的调平数据，以及使用第二光刻投影装置测量用于所述参考衬底的第三组校平数据和用于所述经处理衬底的第四组校平数据。 该方法还包括基于第一，第二，第三和第四组平整数据计算一组对于所选择的过程的机器与机器水平传感器差异的水平传感器参数，其中测量机器与机器水平传感器差异 并作为场内值存储。

公开(公告)号：US20080036988A1

公开(公告)日：2008-02-14

申请号：US11812165

申请日：2007-06-15

申请人： Paulus Antonius Teunissen ,  Petrus Johannes Broodbakker ,  Rene Marinus Johan Queens

发明人： Paulus Antonius Teunissen ,  Petrus Johannes Broodbakker ,  Rene Marinus Johan Queens

IPC分类号： G03B27/70

CPC分类号： G03F9/7034

摘要： A level sensor for a lithographic projection apparatus, the level sensor comprising a light source, a first reflector, a second reflector and a detector the first reflector being arranged to direct light from the light source towards a wafer surface, and the second reflector being arranged to direct light reflected from the wafer surface to the detector, wherein the first and second reflectors are configured to incur a minimal process dependent apparent surface depression.

摘要翻译： 一种用于光刻投影装置的液位传感器，所述液位传感器包括光源，第一反射器，第二反射器和检测器，所述第一反射器布置成将来自所述光源的光引向晶片表面，并且所述第二反射器被布置 将从晶片表面反射的光引导到检测器，其中第一和第二反射器被配置为产生最小的过程依赖的表观凹陷。