摘要:
The invention relates to compounds with the general formula Y1—A1—M1—A2—Y2 wherein Y1 and Y2 are different from each other and Y1 is an acrylate or methacrylate residue and Y2 is a vinyl ether, epoxy, or azide residue, A1 and A2 are identical or different residues with the general formula CnH2n in which n is a whole number from 0 to 20 and one or more methylene groups can be replaced by oxygen atoms, and M1 has the general formula —R1—X1—R2—X2—R3—X3—R4— wherein R1, R2, R3, and R4 are identical or different doubly bonded residues from the group —O—, —COO—, —CONH—, —CO—, —S—, —C≡C—, —CH═CH—, —CH═N—, —CH2—, —N═N—, and —N═N(O)—, and R2—X2—R3 can also be a C—C bond, and X1, X2, and X3 are identical or different residues from the group 1,4-phenylene, 1,4-cyclohexylene; arylalkane or heteroarylalkane with 1 to 10 carbon atoms which contains one to three heteroatoms from the group O, N, and S, substituted with B1, B2, and/or B3; and cycloalkylene with 1 to 10 carbon atoms and substituted with B1, B2, and/or B3, wherein B1, B2, and B3 can be identical or different substituents from the group —H, C1-C20-alkyl, C1-C20-alkoxy, C1-C20- alkylthio, C1-C20-alkylcarbonyl, C1-C20-alkoxycarbonyl, C1-C20-alkylthiocarbonyl, —OH, halogen (fluorine, chlorine, bromine, iodine), —CN, —NO2, cycloalkyl, formyl, acetyl, and alkyl, alkoxy, or alkylthio residues with 1-20 carbon atoms interrupted by ether oxygen, thioether sulfur, or ester groups.
摘要:
The invention relates to compounds with the general formula Y1—A1—M1—A2—Y2 wherein Y1 and Y2 are different from each other and Y1 is an acrylate or methacrylate residue and Y2 is a vinyl ether, epoxy, or azide residue, A1 and A2 are identical or different residues with the general formula CnH2n in which n is a whole number from 0 to 20 and one or more methylene groups can be replaced by oxygen atoms, and M1 has the general formula —R1—X1—R2—X2—R3—X3—R4— wherein R1, R2, R3, and R4 are identical or different doubly bonded residues from the group —O—, —COO—, —CONH—, —CO—, —S—, —C≡C—, —CH═CH—, —CH═N—, —CH2—, —N═N—, and —N═N(O)—, and R2—X2—R3 can also be a C—C bond, and X1, X2, and X3 are identical or different residues from the group 1,4-phenylene, 1,4-cyclohexylene; arylalkane or heteroarylalkane with 1 to 10 carbon atoms which contains one to three heteroatoms from the group O, N, and S, substituted with B1, B2, and/or B3; and cycloalkylene with 1 to 10 carbon atoms and substituted with B1, B2, and/or B3, wherein B1, B2, and B3 can be identical or different substituents from the group —H, C1-C20-alkyl, C1-C20-alkoxy, C1-C20-alkylthio, C1-C20-alkylcarbonyl, C1-C20-alkoxycarbonyl, C1-C20-alkylthiocarbonyl, —OH, halogen(fluorine, chlorine, bromine, iodine), —CN, —NO2, cycloalkyl, formyl, acetyl, and alkyl, alkoxy, or alkylthio residues with 1-20 carbon atoms interrupted by ether oxygen, thioether sulfur, or ester groups.
摘要:
The invention relates to compounds with the general formula Y.sup.1 --A.sup.1 --M.sup.1 --A.sup.2 --Y.sup.2 whereinY.sup.1 and Y.sup.2 are different from each other and Y.sup.1 is an acrylate or methacrylate residue and Y.sup.2 is a vinyl ether, epoxy, or azide residue,A.sup.1 and A.sup.2 are identical or different residues with the general formula C.sub.n H.sub.2n in which n is a whole number from 0 to 20 and one or more methylene groups can be replaced by oxygen atoms, andM.sup.1 has the general formula --R.sup.1 --X.sup.1 --R.sup.2 --X.sup.2 --R.sup.3 --X.sup.3 --R.sup.4 -- whereinR.sup.1, R.sup.2, R.sup.3, and R.sup.4 are identical or different doubly bonded residues from the group --O--, --COO--, --CONH--, --CO--, --S--, --C.tbd.C--, --CH.dbd.CH--, --CH.dbd.N--, --CH.sub.2 --, --N.dbd.N--, and --N.dbd.N(O)--, and R.sup.2 --X.sup.2 --R.sup.3 can also be a C--C bond, andX.sup.1, X.sup.2, and X.sup.3 are identical or different residues from the group 1,4-phenylene, 1,4-cyclohexylene; arylalkane or heteroarylalkane with 1 to 10 carbon atoms which contains one to three heteroatoms from the group O, N, and S, substituted with B.sup.1, B.sup.2, and/or B.sup.3 ; and cycloalkylene with 1 to 10 carbon atoms and substituted with B.sup.1, B.sup.2, and/or B.sup.3, wherein B.sup.1, B.sup.2, and B.sup.3 can be identical or different substituents from the group --H, C.sub.1 -C.sub.20 -alkyl, C.sub.1 -C.sub.20 -alkoxy, C.sub.1 -C.sub.20 -alkylthio, C.sub.1 -C.sub.20 -alkylcarbonyl, C.sub.1 -C.sub.20 -alkoxycarbonyl, C.sub.1 -C.sub.20 -alkylthiocarbonyl, --OH, halogen (fluorine, chlorine, bromine, iodine), --CN, --NO.sub.2, cycloalkyl, formyl, acetyl, and alkyl, alkoxy, or alkylthio residues with 1-20 carbon atoms interrupted by ether oxygen, thioether sulfur, or ester groups.
摘要:
A process for recycling composite materials that comprise fibers and a matrix includes exposing the composite material to electromagnetic waves in the form of microwaves. The electromagnetic waves induce an introduction of energy into the composite material, leading to a separation of fibers and matrix. The separation operation can be assisted by a suitable solvent.