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公开(公告)号:US20070259184A1
公开(公告)日:2007-11-08
申请号:US11442804
申请日:2006-05-30
申请人: Phil Martin , Avi Bendavid , Edward Preston , Mark Gross
发明人: Phil Martin , Avi Bendavid , Edward Preston , Mark Gross
CPC分类号: C23C16/4581 , H01J37/32009 , Y10T428/30
摘要: A method of coating a surface of an article with a chemical vapour deposition coating such as a diamond like carbon by, for example, pulse DC PACVD or RF PACVD, comprising providing an active electrode, shielding the active electrode with a dielectric shield having at least one aperture to permit access to the active electrode, closing the aperture with a dielectricly shielded support post comprising an electively conductive core in electrical communication via the aperture with the active electrode, placing an article to be coated on the dielectricly shielded support post in electrical communication with the electively conductive core and applying a plasma to the article in presence of an electrical current to the article to provide a coating. The article may be, for example, a piston. A contiguous array of a plurality of similar articles may be simultaneously coated by the method.
摘要翻译: 通过例如脉冲DC PACVD或RF PACVD,通过化学气相沉积涂层(例如类金刚石碳)涂覆制品的表面的方法,包括提供有源电极,屏蔽活性电极至少具有至少 一个孔,以允许接近有源电极,用介电屏蔽的支撑柱封闭孔,该支撑柱包括经由该孔与有源电极电连通的导电芯,以电气通信的方式将待涂覆的制品放置在电介质屏蔽的支撑柱上 使用导电芯并且在存在电流的情况下向制品施加等离子体以提供涂层。 制品可以是例如活塞。 可以通过该方法同时涂覆多个类似物品的连续阵列。
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公开(公告)号:US20090109387A1
公开(公告)日:2009-04-30
申请号:US12295692
申请日:2007-11-29
申请人: Akira Sakai , Hirokatsu Miyata , Yasufumi Asao , Yohei Ishida , Philip J. Martin , Avi Bendavid
发明人: Akira Sakai , Hirokatsu Miyata , Yasufumi Asao , Yohei Ishida , Philip J. Martin , Avi Bendavid
IPC分类号: G02F1/1337
CPC分类号: G02F1/133734
摘要: A manufacturing method of a liquid crystal optical device is provided including an alignment film forming step of forming an alignment film containing silicon oxide on a substrate, and a liquid crystal cell forming step of disposing a pair of substrates at least one of which the alignment film has been formed on, opposite to each other interposing a liquid crystal therebetween. In the alignment film forming step, the substrate surface is bombarded with a plasma beam generated by vacuum arc discharge using a cathode containing silicon, where the substrate is disposed on the course of the plasma beam obliquely with an angle. When the plasma beam bombards the substrate surface, plasma ions in the plasma beam have higher kinetic energy or higher flux density than plasma ions in a plasma beam which, if bombarding the substrate obliquely at the angle, form a film having a column structure.
摘要翻译: 提供了一种液晶光学器件的制造方法,包括:在基板上形成含有氧化硅的取向膜的取向膜形成工序;以及液晶单元形成工序,配置一对基板,至少其中一个取向膜 彼此相对地形成在其间插入液晶。 在取向膜形成步骤中,使用包含硅的阴极通过真空电弧放电产生的等离子体束来轰击衬底表面,其中衬底以等角度倾斜地设置在角度上。 当等离子体束轰击衬底表面时,等离子体束中的等离子体离子具有比等离子体束中的等离子体离子更高的动能或更高的通量密度,如果以倾斜方式以该角度轰击衬底,则其形成具有柱结构的膜。
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